Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KIF11 | P52732 | 2/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.33 |
| ▸ | PDE3B | Q13370 | 2/20 | 0.32 |
| ▸ | PDE3A | Q14432 | 2/20 | 0.32 |
| ▸ | ALOX5AP | P20292 | 2/20 | 0.31 |
| ▸ | FEN1 | P39748 | 2/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | CHEK1 | O14757 | 2/20 | 0.30 |
| ▸ | GPR3 | P46089 | 1/20 | 0.30 |
| ▸ | CNR1 | P21554 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31533744 | 1.00 | KIF11 (0.38) | KIF11TDP1ALDH1A1CYP3A4TP53 | |
| SCHEMBL31533745 | 0.85 | GPR3 (0.35) | GLAPOLBGAATSHRKDM4E | |
| SCHEMBL31533767 | 0.81 | PDE3B (0.40) | TDP1ALDH1A1CYP3A4POLBTSHR | |
| SCHEMBL31533763 | 0.80 | FFAR4 (0.33) | KIF11ALDH1A1CYP3A4TP53GAA | |
| SCHEMBL31533746 | 0.78 | GLA (0.38) | GLAPOLBGAATSHRPDK2 | |
| SCHEMBL31533765 | 0.75 | KIF11 (0.35) | KIF11TDP1ALDH1A1CYP3A4TP53 | |
| SCHEMBL27902953 | 0.74 | ALOX5AP (0.41) | KIF11ALDH1A1PDE3BPDE3AALOX5AP | |
| SCHEMBL2528747 | 0.73 | CYP3A4 (0.40) | KIF11TDP1ALDH1A1CYP3A4TP53 | |
| SCHEMBL2141965 | 0.73 | GLA (0.42) | KIF11TDP1ALDH1A1CYP3A4TP53 | |
| SCHEMBL1119491 | 0.72 | TDP1 (0.41) | TDP1ALDH1A1CYP3A4TP53TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117186403-B | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-04-02 | — | — | CN | claimed |
| CN-117186403-A | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-08 | — | — | CN | claimed |
| CN-103890057-A | Aromatic polyamide film for solvent resistant flexible substrates | AKRON POLYMER SYSTEMS INC | 2014-06-25 | — | — | CN | claimed |
| US-20140084499-A1 | SOLUTION OF AROMATIC POLYAMIDE FOR PRODUCING DISPLAY ELEMENT, OPTICAL ELEMENT, OR ILLUMINATION ELEMENT | AKRON POLYMER SYSTEMS, INC. (US) | 2014-03-27 | — | — | US | claimed |
| EP-2688942-A2 | AROMATIC POLYAMIDE FILMS FOR TRANSPARENT FLEXIBLE SUBSTRATES | Akron Polymer Systems, Inc. (US) | 2014-01-29 | — | — | EP | claimed |
| EP-2092807-B1 | COMPOSITE ORGANIC ENCAPSULANTS | CDA PROC LTD LIABILITY COMPANY (US) | 2013-04-17 | — | — | EP | claimed |
| WO-2012129422-A2 | AROMATIC POLYAMIDE FILMS FOR TRANSPARENT FLEXIBLE SUBSTRATES | AKRON POLYMER SYSTEMS, INC. (US) | 2012-09-27 | — | — | WO | claimed |
| US-7745516-B2 | Composition of polyimide and sterically-hindered hydrophobic epoxy | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-06-29 | — | — | US | claimed |
| US-20090111948-A1 | Compositions comprising polyimide and hydrophobic epoxy and phenolic resins, and methods relating thereto | CDA PROCESSING LIMITED LIABILITY COMPANY | 2009-04-30 | — | — | US | claimed |
| EP-2027184-A2 | HYDROPHOBIC COMPOSITIONS FOR ELECTRONIC APPLICATIONS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-02-25 | — | — | EP | claimed |
| EP-1943311-A1 | COMPOSITIONS COMPRISING POLYIMIDE AND HYDROPHOBIC EPOXY, AND METHODS RELATING THERETO | E.I.Du pont de nemours and company (US) | 2008-07-16 | — | — | EP | claimed |
| WO-2007146382-A2 | HYDROPHOBIC COMPOSITIONS FOR ELECTRONIC APPLICATIONS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-12-21 | — | — | WO | claimed |
| US-20070290379-A1 | Hydrophobic compositions for electronic applications | E. I. DU PONT DE NEMOURS AND COMPANY | 2007-12-20 | — | — | US | claimed |
| WO-2007047384-A1 | COMPOSITIONS COMPRISING POLYIMIDE AND HYDROPHOBIC EPOXY, AND METHODS RELATING THERETO | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-04-26 | — | — | WO | claimed |
| US-20070083016-A1 | Photosensitive polyimide compositions | E. I. DUPONT DE NEMOURS AND COMPANY | 2007-04-12 | — | — | US | claimed |
| US-20070083017-A1 | Compositions comprising polyimide and hydrophobic epoxy, and methods relating thereto | CDA PROCESSING LIMITED LIABILITY COMPANY | 2007-04-12 | — | — | US | claimed |
| WO-2025100302-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND SEMICONDUCTOR DEVICE | 旭化成株式会社 | 2025-05-15 | — | — | WO | disclosed |
| US-20250138422-A1 | PHOTOSENSITIVE RESIN COMPOSITION, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | SUMITOMO BAKELITE CO., LTD. (JP) | 2025-05-01 | — | — | US | disclosed |
| US-20070083016-A1 | Photosensitive polyimide compositions | E. I. DUPONT DE NEMOURS AND COMPANY | 2007-04-12 | — | — | US | disclosed |
| US-20070083017-A1 | Compositions comprising polyimide and hydrophobic epoxy, and methods relating thereto | CDA PROCESSING LIMITED LIABILITY COMPANY | 2007-04-12 | — | — | US | disclosed |