Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | APEX1 | P27695 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10603088 | 0.91 | TSHR (0.39) | TSHRTHRBALDH1A1 | |
| SCHEMBL11571357 | 0.90 | TSHR (0.40) | TSHRTHRBALDH1A1 | |
| SCHEMBL11571353 | 0.90 | TSHR (0.43) | TSHRTHRBALDH1A1 | |
| SCHEMBL9932690 | 0.86 | TSHR (0.37) | TSHRALDH1A1 | |
| SCHEMBL9933135 | 0.86 | TSHR (0.40) | TSHRTHRBALDH1A1 | |
| SCHEMBL31348065 | 0.83 | TSHR (0.48) | TSHRTHRBALDH1A1POLBAPEX1 | |
| SCHEMBL2897495 | 0.83 | TSHR (0.40) | TSHRTHRBALDH1A1 | |
| SCHEMBL28184762 | 0.81 | TSHR (0.50) | TSHRTHRBALDH1A1POLBAPEX1 | |
| SCHEMBL9790839 | 0.81 | TSHR (0.37) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL23494007 | 0.80 | TSHR (0.53) | TSHRTHRBALDH1A1POLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 631 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3579965-B1 | POLYMER BEADS AND APPLICATION THEREOF | IXOM OPERATIONS PTY LTD (AU) | 2023-04-05 | — | — | EP | claimed |
| EP-3824055-A1 | NOVEL ORGANOLEPTIC COMPOUNDS | International Flavors & Fragrances Inc. (US) | 2021-05-26 | — | — | EP | claimed |
| US-20200030786-A1 | POLYMER BEADS AND APPLICATION THEREOF | IXOM OPERATIONS PTY LTD (AU) | 2020-01-30 | — | — | US | claimed |
| WO-2020018737-A1 | NOVEL ORGANOLEPTIC COMPOUNDS | INTERNATIONAL FLAVORS & FRAGRANCES INC. (US) | 2020-01-23 | — | — | WO | claimed |
| US-10173197-B2 | Polymer beads incorporating solid particulate material | IXOM OPERATIONS PTY LTD (AU) | 2019-01-08 | — | — | US | claimed |
| WO-2018145152-A1 | POLYMER BEADS AND APPLICATION THEREOF | IXOM OPERATIONS PTY LTD (AU) | 2018-08-16 | — | — | WO | claimed |
| EP-2890734-B1 | POLYMER BEADS INCORPORATING SOLID PARTICULATE MATERIAL | IXOM OPERATIONS PTY LTD (AU) | 2018-02-28 | — | — | EP | claimed |
| US-20150218015-A1 | Polymer beads incorporating solid particulate material | CHEMICALS AUSTRALIA OPERATIONS PTY LTD (AU) | 2015-08-06 | — | — | US | claimed |
| EP-2890734-A1 | POLYMER BEADS INCORPORATING SOLID PARTICULATE MATERIAL | Chemicals Australia Operations Pty Ltd (AU) | 2015-07-08 | — | — | EP | claimed |
| WO-2014032092-A1 | POLYMER BEADS INCORPORATING SOLID PARTICULATE MATERIAL | ORICA AUSTRALIA PTY LTD (AU) | 2014-03-06 | — | — | WO | claimed |
| US-6855480-B2 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-15 | — | — | US | claimed |
| US-20030091926-A1 | Glass transition temperature above room temperature; tack free | SHIPLEY COMPANY, L.L.C. | 2003-05-15 | — | — | US | claimed |
| US-20030059709-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. | 2003-03-27 | — | — | US | claimed |
| EP-1251399-A2 | Photoresist composition | Shipley Company LLC (US) | 2002-10-23 | — | — | EP | claimed |
| EP-1154322-A1 | Flexographic printing cylinders and sleeves with cylindrical, seamless photopolymer printing layer, photopolymer composition therefor, and method of making said cylinders and sleeves from said composition. | ERMINIO ROSSINI S.P.A. (IT) | 2001-11-14 | — | — | EP | claimed |
| EP-1098223-A1 | Dry film photopolymerizable compositions | Shipley Company LLC (US) | 2001-05-09 | — | — | EP | claimed |
| EP-0690080-A2 | Hindered-hydroxyl functional (meth) acrylate monomers containing di (meth) acrylates and compositions including same | UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) | 1996-01-03 | — | — | EP | claimed |
| US-5442023-A | Without premature crosslinking or gel formation; curable protective coatings, inks, adhesives | UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) | 1995-08-15 | — | — | US | claimed |
| US-4323636-A | THERMOPLASTIC AND ELASTOMERIC IN CONJUNCTION WITH AN ACRYLATE COMPOUND | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-04-06 | — | — | US | claimed |
| EP-4747690-A1 | RELIEF FORMING PLATE PRECURSORS | ECO3 BV (BE) | 2026-05-27 | — | — | EP | disclosed |
| US-12635688-B2 | Process and solution for preparing a surface with bacteriostatic and bactericidal activity, surface thus prepared and uses thereof | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) | 2026-05-26 | — | — | US | disclosed |
| WO-2026046963-A1 | PROCESSING APPARATUS AND PROCESSING METHOD FOR FLEXOGRAPHIC PRINTING PLATES | ECO3 BV (BE) | 2026-03-05 | — | — | WO | disclosed |
| EP-4703802-A1 | PROCESSING APPARATUS AND PROCESSING METHOD FOR FLEXOGRAPHIC PRINTING PLATES | ECO3 BV (BE) | 2026-03-04 | — | — | EP | disclosed |
| US-20260044083-A1 | FLEXOGRAPHIC PRINTING MASK WITH LASER THERMAL IMAGING FILM | MIRACLON CORPORATION (US) | 2026-02-12 | — | — | US | disclosed |
| US-12496846-B2 | Mask for low contrast printed highlights | MIRACLON CORPORATION (US) | 2025-12-16 | — | — | US | disclosed |
| US-12474639-B2 | Flexographic printing mask with laser thermal imaging film | MIRACLON CORPORATION (US) | 2025-11-18 | — | — | US | disclosed |
| US-20250312966-A1 | METHODS OF MAKING A DEFLECTION MEMBER | PROCTER & GAMBLE (US) | 2025-10-09 | — | — | US | disclosed |
| US-12365132-B2 | Methods of making a deflection member | THE PROCTER & GAMBLE COMPANY (US) | 2025-07-22 | — | — | US | disclosed |
| US-20250155808-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2025-05-15 | — | — | US | disclosed |
| WO-2025071855-A1 | RELEASABLE FLEXOGRAPHIC PRINTING MASK WITH LASER THERMAL IMAGING FILM CONTAINING LECITHIN | MIRACLON CORPORATION (US) | 2025-04-03 | — | — | WO | disclosed |
| US-20250102900-A1 | RELEASABLE FLEXOGRAPHIC PRINTING MASK WITH LASER THERMAL IMAGING FILM CONTAINING LECITHIN | MIRACLON CORPORATION (US) | 2025-03-27 | — | — | US | disclosed |
| WO-2025056496-A1 | A FLATBED LAMINATOR | ECO3 BV (BE) | 2025-03-20 | — | — | WO | disclosed |
| EP-4515333-A1 | FLEXOGRAPHIC PRINTING MASK WITH LASER THERMAL IMAGING FILM | Miraclon Corporation (US) | 2025-03-05 | — | — | EP | disclosed |
| WO-2025042400-A1 | FLEXOGRAPHIC PRINTING PLATE AND MASK FOR LOW CONTRAST PRINTED HIGHLIGHTS | MIRACLON CORPORATION (US) | 2025-02-27 | — | — | WO | disclosed |
| WO-2025017002-A1 | RELIEF FORMING PLATE PRECURSORS | ECO3 BV (BE) | 2025-01-23 | — | — | WO | disclosed |
| WO-2025017000-A1 | RELIEF FORMING PLATE PRECURSORS | ECO3 BV (BE) | 2025-01-23 | — | — | WO | disclosed |
| EP-4495691-A1 | RELIEF FORMING PLATE PRECURSORS | ECO3 BV (BE) | 2025-01-22 | — | — | EP | disclosed |
| US-20240329525-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-10-03 | — | — | US | disclosed |
| WO-2024143072-A1 | COMPOSITION AND CURED PRODUCT | 株式会社ADEKA | 2024-07-04 | — | — | WO | disclosed |
| US-20240210827-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-06-27 | — | — | US | disclosed |
| WO-2024070672-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 日本ゼオン株式会社 | 2024-04-04 | — | — | WO | disclosed |
| US-20230406023-A1 | FLEXOGRAPHIC PRINTING PLATE AND MASK FOR LOW CONTRAST PRINTED HIGHLIGHTS | MIRACLON CORPORATION (US) | 2023-12-21 | — | — | US | disclosed |
| US-20230398731-A1 | METHODS OF MAKING A DEFLECTION MEMBER | PROCTER & GAMBLE (US) | 2023-12-14 | — | — | US | disclosed |
| US-11820071-B2 | Methods of making a deflection member | THE PROCTER & GAMBLE COMPANY (US) | 2023-11-21 | — | — | US | disclosed |
| US-20230350298-A1 | FLEXOGRAPHIC PRINTING MASK WITH LASER THERMAL IMAGING FILM | MIRACLON CORPORATION (US) | 2023-11-02 | — | — | US | disclosed |
| WO-2023211573-A1 | FLEXOGRAPHIC PRINTING MASK WITH LASER THERMAL IMAGING FILM | MIRACLON CORPORATION (US) | 2023-11-02 | — | — | WO | disclosed |
| WO-2023189969-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 日本ゼオン株式会社 | 2023-10-05 | — | — | WO | disclosed |
| EP-3932906-B1 | NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, AND CURED OBJECT | ADEKA CORP (JP) | 2023-07-12 | — | — | EP | disclosed |
| EP-3976878-B1 | METHODS OF MAKING A DEFLECTION MEMBER | PROCTER & GAMBLE (US) | 2023-07-05 | — | — | EP | disclosed |
| US-20230180744-A1 | PROCESS AND SOLUTION FOR PREPARING A SURFACE WITH BACTERIOSTATIC AND BACTERICIDAL ACTIVITY, SURFACE THUS PREPARED AND USES THEREOF | INSTITUT NATIONAL DES SCIENCES ET INDUSTRIES DU VIVANT ET DE L'ENVIRONNEMENT (FR) | 2023-06-15 | — | — | US | disclosed |
| US-11667609-B2 | Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product | ADEKA CORPORATION (JP) | 2023-06-06 | — | — | US | disclosed |
| US-20230166446-A1 | METHODS OF MAKING A DEFLECTION MEMBER | PROCTER & GAMBLE (US) | 2023-06-01 | — | — | US | disclosed |
| EP-4182169-A1 | FLEXOGRAPHIC PRINTING PLATE PRECURSOR, IMAGING ASSEMBLY AND USE | Miraclon Corporation (US) | 2023-05-24 | — | — | EP | disclosed |
| EP-3579965-B1 | POLYMER BEADS AND APPLICATION THEREOF | IXOM OPERATIONS PTY LTD (AU) | 2023-04-05 | — | — | EP | disclosed |
| US-11590694-B2 | Methods of making a deflection member | THE PROCTER & GAMBLE COMPANY (US) | 2023-02-28 | — | — | US | disclosed |
| EP-4136175-A1 | PROCESS AND SOLUTION FOR PREPARING A SURFACE WITH BACTERIOSTATIC AND BACTERICIDAL ACTIVITY, SURFACE THUS PREPARED AND USES THEREOF | Commissariat à l'énergie atomique et aux énergies alternatives (FR) | 2023-02-22 | — | — | EP | disclosed |
| WO-2022245464-A1 | THERMAL IMAGING FILM HAVING PARTICULATE-TREATED PROTECTIVE TOPCOAT | MIRACLON CORPORATION (US) | 2022-11-24 | — | — | WO | disclosed |
| US-20220373879-A1 | THERMAL IMAGING FILM HAVING PARTICULATE-TREATED PROTECTIVE TOPCOAT | MIRACLON CORPORATION (US) | 2022-11-24 | — | — | US | disclosed |
| CN-115185157-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2022-10-14 | — | — | CN | disclosed |
| CN-110505914-B | Polymer beads and applications thereof | 嬴晟运营私人有限公司 | 2022-10-04 | — | — | CN | disclosed |
| US-20220153698-A1 | NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, SELF-HEALING MATERIAL, SURFACE COATING AGENT, PAINT, ADHESIVE, MATERIAL FOR BATTERY AND CURED PRODUCT | ADEKA CORPORATION (JP) | 2022-05-19 | — | — | US | disclosed |
| EP-3976878-A1 | METHODS OF MAKING A DEFLECTION MEMBER | The Procter & Gamble Company (US) | 2022-04-06 | — | — | EP | disclosed |
| WO-2022015410-A1 | FLEXOGRAPHIC PRINTING PLATE PRECURSOR, IMAGING ASSEMBLY AND USE | MIRACLON CORPORATION (US) | 2022-01-20 | — | — | WO | disclosed |
| US-20220019145-A1 | FLEXOGRAPHIC PRINTING PLATE PRECURSOR, IMAGING ASSEMBLY AND USE | MIRACLON CORPORATION | 2022-01-20 | — | — | US | disclosed |
| EP-3932906-A1 | NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, AND CURED OBJECT | ADEKA CORPORATION (JP) | 2022-01-05 | — | — | EP | disclosed |
| WO-2021234290-A1 | PROCESS AND SOLUTION FOR PREPARING A SURFACE WITH BACTERIOSTATIC AND BACTERICIDAL ACTIVITY, SURFACE THUS PREPARED AND USES THEREOF | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) | 2021-11-25 | — | — | WO | disclosed |
| EP-3511774-B1 | NEGATIVE-WORKING PHOTORESIST COMPOSITION FOR LASER ABLATION AND PROCESS USING IT | MERCK PATENT GMBH (DE) | 2021-10-27 | — | — | EP | disclosed |
| CN-108842932-B | High-adhesion polyolefin anti-adhesion film and preparation method thereof | 江苏优珀斯材料科技有限公司 | 2021-03-19 | — | — | CN | disclosed |
| CN-109021858-B | Weather-resistant release film and preparation method thereof | 江苏优珀斯材料科技有限公司 | 2021-01-01 | — | — | CN | disclosed |
| US-20200409263-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-12-31 | — | — | US | disclosed |
| US-20200378067-A1 | METHODS OF MAKING A DEFLECTION MEMBER | THE PROCTER & GAMBLE COMPANY | 2020-12-03 | — | — | US | disclosed |
| WO-2020243748-A1 | METHODS OF MAKING A DEFLECTION MEMBER | THE PROCTER & GAMBLE COMPANY (US) | 2020-12-03 | — | — | WO | disclosed |
| US-10831101-B2 | Photosensitive resin composition, method for manufacturing cured relief pattern, and semiconductor apparatus | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-11-10 | — | — | US | disclosed |
| US-10793807-B2 | Organoleptic compounds | INTERNATIONAL FLAVORS & FRAGRANCES INC (US) | 2020-10-06 | — | — | US | disclosed |
| US-10793807-B2 | Organoleptic compounds | INTERNATIONAL FLAVORS & FRAGRANCES INC (US) | 2020-10-06 | — | — | US | disclosed |
| US-10705424-B2 | Negative-working photoresist compositions for laser ablation and use thereof | MERCK PATENT GMBH (DE) | 2020-07-07 | — | — | US | disclosed |
| CN-108839416-B | High-surface-energy self-adhesive film and preparation method thereof | 江苏优珀斯材料科技有限公司 | 2020-05-22 | — | — | CN | disclosed |
| EP-3394674-B1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-05-06 | — | — | EP | disclosed |
| EP-2539072-B1 | ION EXCHANGE MEDIUM | DIONEX CORP (US) | 2020-04-29 | — | — | EP | disclosed |
| US-20200030786-A1 | POLYMER BEADS AND APPLICATION THEREOF | IXOM OPERATIONS PTY LTD (AU) | 2020-01-30 | — | — | US | disclosed |
| WO-2020018737-A1 | NOVEL ORGANOLEPTIC COMPOUNDS | INTERNATIONAL FLAVORS & FRAGRANCES INC. (US) | 2020-01-23 | — | — | WO | disclosed |
| US-20190113845-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2019-04-18 | — | — | US | disclosed |
| US-10173197-B2 | Polymer beads incorporating solid particulate material | IXOM OPERATIONS PTY LTD (AU) | 2019-01-08 | — | — | US | disclosed |
| EP-2861638-B1 | NEGATIVE-WORKING THICK FILM PHOTORESIST | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2018-11-14 | — | — | EP | disclosed |
| EP-3394674-A1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM | AZ Electronic Materials Luxembourg S.à.r.l. (LU) | 2018-10-31 | — | — | EP | disclosed |
| EP-1877864-B1 | NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF | MERCK PATENT GMBH (DE) | 2018-09-19 | — | — | EP | disclosed |
| WO-2018145152-A1 | POLYMER BEADS AND APPLICATION THEREOF | IXOM OPERATIONS PTY LTD (AU) | 2018-08-16 | — | — | WO | disclosed |
| EP-2683480-B1 | ELECTROSTATICALLY BOUND HYPERBRANCHED ANION EXCHANGE SURFACE COATING PREPARED VIA CONDENSATION POLYMERIZATION USING TERTIARY AMINE LINKERS FOR IMPROVED DIVALENT ANION SELECTIVITY | DIONEX CORP (US) | 2018-05-23 | — | — | EP | disclosed |
| EP-1840146-B1 | Polyurethane polymer having bisphenol group and photoimageable composition containing the same | ETERNAL MAT CO LTD (TW) | 2018-03-07 | — | — | EP | disclosed |
| EP-2890734-B1 | POLYMER BEADS INCORPORATING SOLID PARTICULATE MATERIAL | IXOM OPERATIONS PTY LTD (AU) | 2018-02-28 | — | — | EP | disclosed |
| EP-2182411-B1 | Method for preparing a printing form from a photopolymerizable element | DU PONT (US) | 2017-11-22 | — | — | EP | disclosed |
| US-20170285475-A1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND USE THEREOF | AZ ELECTRONIC MATERIALS S.À R.L. (LU) | 2017-10-05 | — | — | US | disclosed |
| US-20170176856-A1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND USE THEREOF | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2017-06-22 | — | — | US | disclosed |
| EP-1783548-B1 | Method of forming a patterned layer on a substrate | ROHM & HAAS ELECT MAT (US) | 2017-03-08 | — | — | EP | disclosed |
| EP-3063210-A2 | METHOD OF THIOPHENOL REMOVAL FROM POLY(ARYLENE SULFIDE) POLYMER COMPOSITIONS | SOLVAY SA (BE) | 2016-09-07 | — | — | EP | disclosed |
| US-9388282-B2 | Method of thiophenol removal from poly(arylene sulfide) polymer compositions | SOLVAY SPECIALTY POLYMERS USA, LLC. (US) | 2016-07-12 | — | — | US | disclosed |
| US-20160089672-A1 | MICROFLUIDIC DEVICE AND A METHOD FOR PREPARING THE MICROFLUIDIC DEVICE FROM A PHOTOSENSITIVE ELEMENT | DU PONT (US) | 2016-03-31 | — | — | US | disclosed |
| EP-1735664-B1 | METHOD OF PRODUCING A RELIEF IMAGE | EASTMAN KODAK CO (US) | 2016-03-16 | — | — | EP | disclosed |
| US-9132364-B2 | High capacity ion chromatography stationary phases and method of forming | DIONEX CORPORATION (US) | 2015-09-15 | — | — | US | disclosed |
| EP-1883858-B1 | MAKING RELIEF IMAGE USING REMOVABLE FILM | EASTMAN KODAK CO (US) | 2015-09-09 | — | — | EP | disclosed |
| US-20150218015-A1 | Polymer beads incorporating solid particulate material | CHEMICALS AUSTRALIA OPERATIONS PTY LTD (AU) | 2015-08-06 | — | — | US | disclosed |
| EP-2890734-A1 | POLYMER BEADS INCORPORATING SOLID PARTICULATE MATERIAL | Chemicals Australia Operations Pty Ltd (AU) | 2015-07-08 | — | — | EP | disclosed |
| US-9034447-B2 | Electrostatically bound hyperbranched anion exchange surface coating prepared via condensation polymerization using ditertiary amine linkers for improved divalent anion selectivity | DIONEX CORPORATION (US) | 2015-05-19 | — | — | US | disclosed |
| WO-2015065906-A2 | METHOD OF THIOPHENOL REMOVAL FROM POLY(ARYLENE SULFIDE) POLYMER COMPOSITIONS | CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) | 2015-05-07 | — | — | WO | disclosed |
| US-20150119550-A1 | Method of Thiophenol Removal from Poly(Arylene Sulfide) Polymer Compositions | CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) | 2015-04-30 | — | — | US | disclosed |
| EP-2861638-A1 | NEGATIVE-WORKING THICK FILM PHOTORESIST | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2015-04-22 | — | — | EP | disclosed |
| EP-1353228-B1 | Method for forming a relief image using a very thick photoresist layer on a semiconductor wafer and metal plating method | ROHM & HAAS ELECT MAT (US) | 2015-01-28 | — | — | EP | disclosed |
| US-8906594-B2 | Negative-working thick film photoresist | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2014-12-09 | — | — | US | disclosed |
| US-8889802-B2 | Polymer compositions and methods of making and using same | POLYMERIGHT, INC. (US) | 2014-11-18 | — | — | US | disclosed |
| US-8883393-B2 | Printing form precursor for use as a recording element | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-11-11 | — | — | US | disclosed |
| US-8835522-B2 | Polyurethane polymer having bisphenol group and photoimageable composition containing the same | ETERNAL CHEMICAL CO., LTD. (TW) | 2014-09-16 | — | — | US | disclosed |
| EP-1873588-B1 | Imaging element having a photoluminescent tag and method to form a recording element using it | DU PONT (US) | 2014-09-10 | — | — | EP | disclosed |
| US-8790862-B2 | Photosensitive element having reinforcing particles and method for preparing a printing form from the element | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-07-29 | — | — | US | disclosed |
| US-8715908-B2 | Process of using an imaging element having a photoluminescent tag | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-05-06 | — | — | US | disclosed |
| EP-2045660-B1 | Photosensitive element having reinforcing particles and method for preparing a printing form from the element | DU PONT (US) | 2014-03-12 | — | — | EP | disclosed |
| WO-2014032092-A1 | POLYMER BEADS INCORPORATING SOLID PARTICULATE MATERIAL | ORICA AUSTRALIA PTY LTD (AU) | 2014-03-06 | — | — | WO | disclosed |
| WO-2013185990-A1 | NEGATIVE-WORKING THICK FILM PHOTORESIST | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2013-12-19 | — | — | WO | disclosed |
| US-20130337381-A1 | NEGATIVE-WORKING THICK FILM PHOTORESIST | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2013-12-19 | — | — | US | disclosed |
| EP-2251199-B1 | Method for preparing a printing form from a sleeve | DU PONT (US) | 2013-10-02 | — | — | EP | disclosed |
| EP-2093059-B1 | Extended print sleeve and method for preparing a printing form from the sleeve | DU PONT (US) | 2013-09-11 | — | — | EP | disclosed |
| US-8530117-B2 | Method of producing a relief image for printing | EASTMAN KODAK COMPANY (US) | 2013-09-10 | — | — | US | disclosed |
| US-8470518-B2 | Photosensitive element having reinforcing particles and method for preparing a printing form from the element | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-06-25 | — | — | US | disclosed |
| US-8465904-B2 | Method for preparing a printing form from a photopolymerizable element | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-06-18 | — | — | US | disclosed |
| EP-1742107-B1 | Photoimageable composition | ETERNAL CHEMICAL CO LTD (TW) | 2013-06-05 | — | — | EP | disclosed |
| US-8455175-B2 | Photosensitive composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-06-04 | — | — | US | disclosed |
| US-20130137043-A1 | PHOTOSENSITIVE ELEMENT HAVING REINFORCING PARTICLES AND METHOD FOR PREPARING A PRINTING FORM FROM THE ELEMENT | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-05-30 | — | — | US | disclosed |
| US-20130105440-A1 | NANOCOMPOSITE NEGATIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-05-02 | — | — | US | disclosed |
| US-8409790-B2 | Method of producing a relief image for printing | EASTMAN KODAK COMPANY (US) | 2013-04-02 | — | — | US | disclosed |
| EP-1679549-B1 | Flexographic imaging element for use as a recording element and process of making a recording element | DU PONT (US) | 2013-03-27 | — | — | EP | disclosed |
| EP-2539072-A2 | HIGH CAPACITY ION CHROMATOGRAPHY STATIONARY PHASE AND METHOD OF FORMING | Dionex Corporation (US) | 2013-01-02 | — | — | EP | disclosed |
| US-20120231195-A1 | ELECTROSTATICALLY BOUND HYPERBRANCHED ANION EXCHANGE SURFACE COATING PREPARED VIA CONDENSATION POLYMERIZATION USING DITERTIARY AMINE LINKERS FOR IMPROVED DIVALENT ANION SELECTIVITY | DIONEX CORPORATION (US) | 2012-09-13 | — | — | US | disclosed |
| US-8263316-B2 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-09-11 | — | — | US | disclosed |
| US-20120135354-A1 | METHOD OF PRODUCING A RELIEF IMAGE FOR PRINTING | FPC INC. | 2012-05-31 | — | — | US | disclosed |
| US-20120127443-A1 | METHOD OF PRODUCING A RELIEF IMAGE FOR PRINTING | LASER PACIFIC MEDIA CORPORATION | 2012-05-24 | — | — | US | disclosed |
| US-20120130040-A1 | Polymer Compositions and Methods of Making and Using Same | POLYMERIGHT, INC. (US) | 2012-05-24 | — | — | US | disclosed |
| EP-2448990-A1 | POLYMER COMPOSITIONS AND METHODS OF MAKING AND USING SAME | Polymeright Inc. (US) | 2012-05-09 | — | — | EP | disclosed |
| US-8142987-B2 | Method of producing a relief image for printing | EASTMAN KODAK COMPANY (US) | 2012-03-27 | — | — | US | disclosed |
| US-8138278-B2 | Polymer compositions and methods of making and using same | POLYMERIGHT, INC. (US) | 2012-03-20 | — | — | US | disclosed |
| US-20120015294-A1 | IMAGING ELEMENT HAVING A PHOTOLUMINESCENT TAG AND PROCESS OF USING THE IMAGING ELEMENT TO FORM A RECORDING ELEMENT | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-01-19 | — | — | US | disclosed |
| US-8053160-B2 | Imaging compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-11-08 | — | — | US | disclosed |
| US-8048606-B2 | Imaging methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-11-01 | — | — | US | disclosed |
| US-20110262861-A1 | PHOTOSENSITIVE COMPOSITION | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-10-27 | — | — | US | disclosed |
| EP-1632281-B1 | Process for absorbing hydrophobic substances in polymers having an hollow structure | ROHM & HAAS (US) | 2011-09-14 | — | — | EP | disclosed |
| US-20110210055-A1 | HIGH CAPACITY ION CHROMATOGRAPHY STATIONARY PHASES AND METHOD OF FORMING | DIONEX CORPORATION (US) | 2011-09-01 | — | — | US | disclosed |
| WO-2011106720-A2 | THE INTERNATIONAL BUREAU ACKNOWLEDGES RECEIPT, ON [DATE], OF AMENDMENTS TO THE CLAIMS UNDER PCT ARTICLE 19(1). HOWEVER, THE APPLICANT IS URGENTLY REQUESTED TO SUBMIT REPLACEMENT SHEET(S) CONTAINING A COMPLETE SET OF CLAIMS IN REPLACEMENT OF ALL THE CLAIMS ORIGINALLY FILED, IN CONFORMITY WITH PCT RULE 46.5(A). HIGH CAPACITY ION CHROMATOGRAPHY STATIONARY PHASE AND METHOD OF FORMING | DIONEX CORPORATION (US) | 2011-09-01 | — | — | WO | disclosed |
| US-7977026-B2 | Imaging methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-07-12 | — | — | US | disclosed |
| US-20110152492-A1 | Polymer Compositions and Methods of Making and Using Same | POLYMERIGHT, INC. (US) | 2011-06-23 | — | — | US | disclosed |
| US-7932016-B2 | Photosensitive composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-04-26 | — | — | US | disclosed |
| WO-2011008480-A1 | POLYMER COMPOSITIONS AND METHODS OF MAKING AND USING SAME | POLYMERIGHT, INC. (US) | 2011-01-20 | — | — | WO | disclosed |
| US-7846639-B2 | Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-12-07 | — | — | US | disclosed |
| EP-2251199-A1 | Method for preparing a printing form from a sleeve | E. I. du Pont de Nemours and Company (US) | 2010-11-17 | — | — | EP | disclosed |
| US-7749685-B2 | Imaging methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-07-06 | — | — | US | disclosed |
| US-20100136483-A1 | IMAGING ELEMENT HAVING A PHOTOLUMINESCENT TAG AND PROCESS OF USING THE IMAGING ELEMENT TO FORM A RECORDING ELEMENT | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-06-03 | — | — | US | disclosed |
| US-7723850-B2 | Electronic devices having air gaps | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-05-25 | — | — | US | disclosed |
| US-20100112484-A1 | METHOD FOR PREPARING A PRINTING FORM FROM A PHOTOPOLYMERIZABLE ELEMENT | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-05-06 | — | — | US | disclosed |
| WO-2010051408-A1 | METHOD FOR PREPARING A PRINTING FORM FROM A PHOTOPOLYMERIZABLE ELEMENT | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-05-06 | — | — | WO | disclosed |
| EP-2182411-A1 | Method for preparing a printing form from a photopolymerizable element | E. I. du Pont de Nemours and Company (US) | 2010-05-05 | — | — | EP | disclosed |
| US-20100086751-A1 | IMAGING ELEMENT FOR USE AS A RECORDING ELEMENT AND PROCESS OF USING THE IMAGING ELEMENT | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-04-08 | — | — | US | disclosed |
| EP-1491331-B1 | Process for making flexographic printing plate | FUJIFILM CORP (JP) | 2010-03-17 | — | — | EP | disclosed |
| US-20090292038-A1 | Flame Retardant Photoimagable Coverlay Compositions and Methods Relating thereto | E. I. DU PONT DE NEMOURS AND COMPANY | 2009-11-26 | — | — | US | disclosed |
| US-7618766-B2 | Flame retardant photoimagable coverlay compositions and methods relating thereto | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-11-17 | — | — | US | disclosed |
| US-7615335-B2 | Imaging methods | ROHM & HAAS ELECTRONIC MATERIALS LLC (US) | 2009-11-10 | — | — | US | disclosed |
| US-7585932-B2 | Polymer compositions and processes for making and using same | CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) | 2009-09-08 | — | — | US | disclosed |
| US-20090211475-A1 | EXTENDED PRINT SLEEVE AND METHOD FOR PREPARING A PRINTING FORM FROM THE SLEEVE | E. I. DU PONT DE NEMOURS AND COMPANY | 2009-08-27 | — | — | US | disclosed |
| EP-2093059-A2 | Extended print sleeve and method for preparing a printing form from the sleeve | E. I. du Pont de Nemours and Company (US) | 2009-08-26 | — | — | EP | disclosed |
| US-20090169455-A1 | INK-JET RECORDING MATERIAL | AGFA-GEVAERT, N.V. (BE) | 2009-07-02 | — | — | US | disclosed |
| EP-1510318-B1 | Process for manufacturing polymers | ROHM & HAAS (US) | 2009-07-01 | — | — | EP | disclosed |
| US-7541003-B2 | Latex based adsorbent chip | BIO-RAD LABORATORIES, INC. (US) | 2009-06-02 | — | — | US | disclosed |
| US-7527915-B2 | Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-05-05 | — | — | US | disclosed |
| US-7517496-B2 | Latex based adsorbent chip | BIO-RAD LABORATORIES, INC. (US) | 2009-04-14 | — | — | US | disclosed |
| EP-2045660-A1 | Photosensitive element having reinforcing particles and method for preparing a printing form from the element | E. I. Du Pont de Nemours and Company (US) | 2009-04-08 | — | — | EP | disclosed |
| US-20090075199-A1 | Photosensitive element having reinforcing particles and method for preparing a printing form from the element | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-03-19 | — | — | US | disclosed |
| US-7504191-B2 | Photosensitive resin composition and method for the formation of a resin pattern using the composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-03-17 | — | — | US | disclosed |
| EP-0487086-B2 | Method of preparing volume type phase hologram member using a photosensitive recording medium | CANON KK (JP) | 2008-08-13 | — | — | EP | disclosed |
| EP-1940917-A2 | POLYMER COMPOSITIONS AND PROCESSES FOR MAKING AND USING SAME | Chevron Phillips Chemical Company LP (US) | 2008-07-09 | — | — | EP | disclosed |
| US-7344970-B2 | Plating method | SHIPLEY COMPANY, L.L.C. (US) | 2008-03-18 | — | — | US | disclosed |
| US-20080063980-A1 | Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element | E. I. DU PONT DE NEMOURS AND COMPANY | 2008-03-13 | — | — | US | disclosed |
| US-7338749-B2 | Process for making flexographic printing plate | FUJIFILM CORPORATION (JP) | 2008-03-04 | — | — | US | disclosed |
| US-20080038518-A1 | Air gap formation | SHIPLEY COMPANY, L.L.C. (US) | 2008-02-14 | — | — | US | disclosed |
| US-20080033090-A1 | Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2008-02-07 | — | — | US | disclosed |
| EP-1883858-A2 | MAKING RELIEF IMAGE USING REMOVABLE FILM | EASTMAN KODAK COMPANY (US) | 2008-02-06 | — | — | EP | disclosed |
| EP-1877864-A2 | NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF | AZ Electronic Materials USA Corp. (US) | 2008-01-16 | — | — | EP | disclosed |
| EP-1873588-A2 | Imaging element having a photoluminescent tag, apparatus containing said imaging element and method to form a recording element using it | E.I.Du pont de nemours and company (US) | 2008-01-02 | — | — | EP | disclosed |
| US-7312259-B2 | combining polymers with surfactants having hydrophilic-lipophilic balance values between 10 and 25 via spray drying, to lower or reduce the dusting levels, raise the minimum ignition energy and lower explosion strength during handling, conveying and storage | ROHM AND HAAS COMPANY (US) | 2007-12-25 | — | — | US | disclosed |
| US-7279254-B2 | Method of making an article bearing a relief image using a removable film | EASTMAN KODAK COMPANY (US) | 2007-10-09 | — | — | US | disclosed |
| EP-1840146-A1 | Polyurethane polymer having bisphenol group and photoimageable composition containing the same | Eternal Chemical Co., Ltd. (TW) | 2007-10-03 | — | — | EP | disclosed |
| US-7276381-B2 | Monomers and polymers having energy absorbing moieties of use in desorption/ionization of analytes | BIO-RAD LABORATORIES, INC. (US) | 2007-10-02 | — | — | US | disclosed |
| US-20070225467-A1 | Polyurethane polymer having bisphenol group and photoimageable composition containing the same | ETERNAL MATERIALS CO., LTD. (TW) | 2007-09-27 | — | — | US | disclosed |
| US-7270932-B2 | Imaging composition and method | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-09-18 | — | — | US | disclosed |
| US-7256127-B2 | Air gap formation | SHIPLEY COMPANY, L.L.C. (US) | 2007-08-14 | — | — | US | disclosed |
| US-7247419-B2 | Nanocomposite photosensitive composition and use thereof | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2007-07-24 | — | — | US | disclosed |
| WO-2007073498-A2 | FLAME RETARDANT PHOTOIMAGABLE COVERLAY COMPOSITIONS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-06-28 | — | — | WO | disclosed |
| US-20070149635-A1 | Flame retardant photoimagable coverlay compositions and methods relating thereto | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2007-06-28 | — | — | US | disclosed |
| US-20070141510-A1 | NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF | CHEN CHUNWEI | 2007-06-21 | — | — | US | disclosed |
| EP-1790429-A1 | Imaging methods | Rohm and Haas Electronic Materials, L.L.C. (US) | 2007-05-30 | — | — | EP | disclosed |
| US-7223519-B2 | Xanthene senstitizers that affect color or shade change upon application of low energy; oxidizers, and aminocarboxylic acid amphoteric surfactant; may be peeled from workpiece in which they are coated; boats, vehicles | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-05-29 | — | — | US | disclosed |
| US-20070117042-A1 | Imaging methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-05-24 | — | — | US | disclosed |
| US-20070105046-A1 | Photosensitive composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-05-10 | — | — | US | disclosed |
| EP-1783548-A2 | Photosensitive composition | Rohm and Haas Electronic Materials LLC (US) | 2007-05-09 | — | — | EP | disclosed |
| US-20070077596-A1 | TRACE INCORPORATION OF FLUORESCENT MONOMER FACILITATING QUALITY CONTROL OF POLYMERIZATION REACTIONS | CIPHERGEN BIOSYSTEMS, INC. | 2007-04-05 | — | — | US | disclosed |
| US-7195855-B2 | Negative-type photosensitive resin composition containing epoxy compound | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-03-27 | — | — | US | disclosed |
| EP-1092421-B1 | Method for preparing ultraviolet radiation absorbing compositions | ROHM & HAAS (US) | 2007-03-21 | — | — | EP | disclosed |
| US-7192542-B2 | Oil absorbing composition and process | ROHM AND HAAS COMPANY (US) | 2007-03-20 | — | — | US | disclosed |
| US-20070055033-A1 | POLYMER COMPOSITIONS AND PROCESSES FOR MAKING AND USING SAME | CHEVRON PHILLIPS CHEMICAL COMPANY, LP | 2007-03-08 | — | — | US | disclosed |
| WO-2007021960-A2 | POLYMER COMPOSITIONS AND PROCESSES FOR MAKING AND USING SAME | CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) | 2007-02-22 | — | — | WO | disclosed |
| US-20070028803-A1 | Opaque coatings | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-02-08 | — | — | US | disclosed |
| EP-1749862-A2 | Peelable opaque coating and method of using the same | Rohm and Haas Electronic Materials, L.L.C. (US) | 2007-02-07 | — | — | EP | disclosed |
| EP-1742107-A1 | Photoimageable composition | Eternal Chemical Co., Ltd. (TW) | 2007-01-10 | — | — | EP | disclosed |
| US-20070004888-A1 | Photoimageable composition | ETERNAL CHEMICAL CO., LTD. (TW) | 2007-01-04 | — | — | US | disclosed |
| US-20070003865-A1 | projecting a computer programmed 3-D image with a laser on a work piece at a beam scan speed in a projecting mode, applying an acrylic copolymeric photosensitive to the work piece reducing the beam scan speed of 3-D image to a beam scan speed in a image recording projection mode to form a pattern | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-01-04 | — | — | US | disclosed |
| EP-1735664-A1 | METHOD OF PRODUCING A RELIEF IMAGE | Kodak Polychrome Graphics, LLC (US) | 2006-12-27 | — | — | EP | disclosed |
| EP-1361257-B1 | Coating powders, methods of manufacture thereof, and articles formed therefrom | ROHM & HAAS (US) | 2006-12-13 | — | — | EP | disclosed |
| US-7144676-B2 | Imaging compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-12-05 | — | — | US | disclosed |
| WO-2006124279-A2 | MAKING RELIEF IMAGE USING REMOVABLE FILM | EASTMAN KODAK COMPANY (US) | 2006-11-23 | — | — | WO | disclosed |
| US-20060257780-A1 | Method of making an article bearing a relief image using a removable film | KODAK POLYCHROME GRAPHICS LLC (US) | 2006-11-16 | — | — | US | disclosed |
| WO-2006109121-A2 | NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2006-10-19 | — | — | WO | disclosed |
| US-7122585-B2 | Coating powders, methods of manufacture thereof, and articles formed therefrom | ROHM AND HAAS COMPANY (US) | 2006-10-17 | — | — | US | disclosed |
| US-20060228645-A1 | Nanocomposite photosensitive composition and use thereof | MERCK PATENT GMBH (DE) | 2006-10-12 | — | — | US | disclosed |
| US-20060223009-A1 | Imaging methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-10-05 | — | — | US | disclosed |
| US-20060223690-A1 | Photosensitive thick-film dielectric paste composition and method for making an insulating layer using same | E. I. DU PONT DE NEMOURS AND COMPANY | 2006-10-05 | — | — | US | disclosed |
| EP-1708024-A2 | Photosensitive thick-film dielectric paste composition and method for making an insulating layer using same | E.I.Du pont de nemours and company (US) | 2006-10-04 | — | — | EP | disclosed |
| US-20060199098-A1 | Negative-type photosensitive resin composition containing epoxy-containing material | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-09-07 | — | — | US | disclosed |
| US-20060199099-A1 | Negative-type photosensitive resin composition containing epoxy-containing material | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-09-07 | — | — | US | disclosed |
| EP-1698936-A2 | Negative-type photosensitive resin compositions | Rohm and Haas Electronic Materials, L.L.C. (US) | 2006-09-06 | — | — | EP | disclosed |
| EP-1698935-A2 | Negative-type photosensitive resin composition | Rohm and Haas Electronic Materials, L.L.C. (US) | 2006-09-06 | — | — | EP | disclosed |
| US-20060160024-A1 | Imaging methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-07-20 | — | — | US | disclosed |
| US-7078157-B2 | Photosensitive composition and use thereof | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-07-18 | — | — | US | disclosed |
| US-20060154180-A1 | Imaging element for use as a recording element and process of using the imaging element | E. I. DU PONT DE NEMOURS AND COMPANY | 2006-07-13 | — | — | US | disclosed |
| EP-1679549-A2 | Imaging element for use as a recording element and process of using the imaging element | E.I.Du pont de nemours and company (US) | 2006-07-12 | — | — | EP | disclosed |
| US-20060127805-A1 | Kit for making relief images | KODAK POLYCHROME GRAPHICS LLC | 2006-06-15 | — | — | US | disclosed |
| EP-1483794-A4 | LATEX BASED ADSORBENT CHIP | CIPHERGEN BIOSYSTEMS INC (US) | 2006-05-03 | — | — | EP | disclosed |
| US-7032769-B2 | Pressure vessel and process for producing the same | TORAY INDUSTRIES, INC. (JP) | 2006-04-25 | — | — | US | disclosed |
| US-20060073423-A1 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-04-06 | — | — | US | disclosed |
| US-20060073409-A1 | Imaging compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-04-06 | — | — | US | disclosed |
| EP-1632281-A1 | Process for absorbing hydrophobic substances in polymers having an hollow structure | ROHM AND HAAS COMPANY (US) | 2006-03-08 | — | — | EP | disclosed |
| US-20050282084-A1 | Imaging compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2005-12-22 | — | — | US | disclosed |
| EP-1602010-A2 | PHOTOSENSITIVE COMPOSITION AND USE THEREOF | AZ Electronic Materials USA Corp. (US) | 2005-12-07 | — | — | EP | disclosed |
| US-20050266345-A1 | Imaging compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2005-12-01 | — | — | US | disclosed |
| WO-2005101130-A1 | METHOD OF PRODUCING A RELIEF IMAGE | EASTMAN KODAK COMPANY (US) | 2005-10-27 | — | — | WO | disclosed |
| US-20050227182-A1 | Method of producing a relief image for printing | KODAK POLYCHROME GRAPHICS LLC (US) | 2005-10-13 | — | — | US | disclosed |
| US-20050208234-A1 | Ink-jet recording material | AGFA-GEVAERT (BE) | 2005-09-22 | — | — | US | disclosed |
| EP-1577351-A1 | Improved ink-jet recording material | Agfa-Gevaert (BE) | 2005-09-21 | — | — | EP | disclosed |
| US-20050203215-A1 | Polymer carriers and process | UGAZIO STEPHEN P J (FR) | 2005-09-15 | — | — | US | disclosed |
| EP-1574534-A1 | Polymer carriers and process | ROHM AND HAAS COMPANY (US) | 2005-09-14 | — | — | EP | disclosed |
| EP-1566690-A1 | Imaging methods | Rohm and Haas Electronic Materials, L.L.C. (US) | 2005-08-24 | — | — | EP | disclosed |
| US-6929898-B2 | Flexographic element having an infrared ablatable layer | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2005-08-16 | — | — | US | disclosed |
| US-20050175931-A1 | Imaging compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) | 2005-08-11 | — | — | US | disclosed |
| US-20050175929-A1 | Imaging composition and method | ROHM AND HASS ELECTRONIC MATERIALS, L.L.C. (US) | 2005-08-11 | — | — | US | disclosed |
| US-20050175941-A1 | Imaging composition and method | ROHM AND HASS ELECTRONIC MATERIALS, L.L.C. (US) | 2005-08-11 | — | — | US | disclosed |
| US-20050175229-A1 | Imaging methods | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) | 2005-08-11 | — | — | US | disclosed |
| EP-1562073-A1 | Imaging composition and method | Rohm and Haas Electronic Materials, L.L.C. (US) | 2005-08-10 | — | — | EP | disclosed |
| EP-1562074-A1 | Imaging compositions and methods | Rohm and Haas Electronic Materials, L.L.C. (US) | 2005-08-10 | — | — | EP | disclosed |
| EP-1562072-A1 | Imaging composition and method | Rohm and Haas Electronic Materials, L.L.C. (US) | 2005-08-10 | — | — | EP | disclosed |
| US-20050131143-A1 | Oil absorbing composition and process | ROHM AND HAAS FRANCE, S.A.S. (FR) | 2005-06-16 | — | — | US | disclosed |
| US-20050079442-A1 | Halo resistent, photoimagable coverlay compositions, having advantageous application and removal properties, and methods relating thereto | DUEBER THOMAS E (US) | 2005-04-14 | — | — | US | disclosed |
| EP-1514658-A1 | Process for manufacturing polymers | ROHM AND HAAS COMPANY (US) | 2005-03-16 | — | — | EP | disclosed |
| EP-1510318-A1 | Process for manufacturing polymers | ROHM AND HAAS COMPANY (US) | 2005-03-02 | — | — | EP | disclosed |
| EP-0927911-B1 | Photoimageable compositions containing photopolymerizable urethane oligomers | NICHIGO MORTON CO LTD (JP) | 2005-03-02 | — | — | EP | disclosed |
| US-20050043458-A1 | Process for manufacturing polymers | ROHM AND HAAS COMPANY | 2005-02-24 | — | — | US | disclosed |
| US-20050043453-A1 | Process for manufacturing polymers | CHANG CHING-JEN (US) | 2005-02-24 | — | — | US | disclosed |
| US-6855480-B2 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-15 | — | — | US | disclosed |
| US-20050013733-A1 | Trace incorporation of fluorescent monomer facilitating quality control of polymerization reactions | CIPHERGEN BIOSYSTEMS, INC. (US) | 2005-01-20 | — | — | US | disclosed |
| EP-1094365-B1 | Photoimageable composition containing flexible oligomer | ROHM & HAAS (US) | 2005-01-19 | — | — | EP | disclosed |
| US-20040259033-A1 | Process for making flexographic printing plate | FUJI PHOTO FILM CO., LTD. | 2004-12-23 | — | — | US | disclosed |
| WO-2004106890-A2 | TRACE INCORPORATION OF FLUORESCENT MONOMER FACILITATING QUALITY CONTROL OF POLYMERIZATION REACTIONS | CIPHERGEN BIOSYSTEMS, INC. (US) | 2004-12-09 | — | — | WO | disclosed |
| EP-1483794-A2 | LATEX BASED ADSORBENT CHIP | Ciphergen Biosystems, Inc. (US) | 2004-12-08 | — | — | EP | disclosed |
| EP-1481244-A2 | MONOMERS AND POLYMERS HAVING ENERGY ABSORBING MOIETIES OF USE IN DESORPTION/IONIZATION OF ANALYTES | Ciphergen Biosystems, Inc. (US) | 2004-12-01 | — | — | EP | disclosed |
| US-20040235984-A1 | Coating powders, methods of manufacture thereof, and articles formed therefrom | ROHM AND HAAS COMPANY | 2004-11-25 | — | — | US | disclosed |
| US-20040224253-A1 | Negative-type photosensitive resin composition containing epoxy compound | SHIPLEY COMPANY, L.L.C. | 2004-11-11 | — | — | US | disclosed |
| US-20040224252-A1 | Photosensitive resin composition and method for the formation of a resin pattern using the composition | SHIPLEY COMPANY, L.L.C. (US) | 2004-11-11 | — | — | US | disclosed |
| US-20040206762-A1 | Pressure vessel and process for producing the same | TORAY INDUSTRIES, INC. | 2004-10-21 | — | — | US | disclosed |
| WO-2004077153-A2 | PHOTOSENSITIVE COMPOSITION AND USE THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-09-10 | — | — | WO | disclosed |
| US-20040175653-A1 | Photosensitive composition and use thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2004-09-09 | — | — | US | disclosed |
| EP-0961170-B1 | Aqueous developable photoimageable composition having improved adhesion and stripping characteristics | NICHIGO MORTON CO LTD (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-20040137728-A1 | Air gap formation | SHIPLEY COMPANY, L.L.C. (US) | 2004-07-15 | — | — | US | disclosed |
| US-20040101778-A1 | Water soluble activators bonded to hydrophilic carriers selected from oligomers, polymers, plasticizers or surfactants, for use in light sensitive elements such as photoresists | SHIPLEY COMPANY, L.L.C. | 2004-05-27 | — | — | US | disclosed |
| US-20040063030-A1 | Photoresist | SHIPLEY COMPANY, L.L.C. (US) | 2004-04-01 | — | — | US | disclosed |
| EP-1403709-A2 | Photoinitiator | Shipley Co. L.L.C. (US) | 2004-03-31 | — | — | EP | disclosed |
| EP-1403708-A2 | Photoresist | Shipley Co. L.L.C. (US) | 2004-03-31 | — | — | EP | disclosed |
| US-20040058276-A1 | Halo resistent, photoimagable coverlay compositions, having, advantageous application and removal properties, and methods relating thereto | E. I. DU PONT DE NEMOURS AND COMPANY | 2004-03-25 | — | — | US | disclosed |
| EP-1400545-A2 | Halo resistant photoimagable coverlay compositions | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-03-24 | — | — | EP | disclosed |
| EP-1398831-A2 | Air gaps formation | Shipley Co. L.L.C. (US) | 2004-03-17 | — | — | EP | disclosed |
| US-20040018724-A1 | Plating method | SHIPLEY COMPANY, L.L.C (US) | 2004-01-29 | — | — | US | disclosed |
| US-20030211419-A1 | Process for making a flexographic printing plate | FAN ROXY NI (US) | 2003-11-13 | — | — | US | disclosed |
| EP-1361257-A1 | Coating powders, methods of manufacture thereof, and articles formed therefrom | ROHM AND HAAS COMPANY (US) | 2003-11-12 | — | — | EP | disclosed |
| US-20030207462-A1 | Monomers and polymers having energy absorbing moieties of use in desorption/ionization of analytes | CIPHERGEN BIOSYSTEMS, INC. | 2003-11-06 | — | — | US | disclosed |
| US-20030207460-A1 | Monomers and polymers having energy absorbing moieties of use in desorption/ionization of analytes | CIPHERGEN BIOSYSTEMS, INC. | 2003-11-06 | — | — | US | disclosed |
| US-20030194560-A1 | Coating powders, methods of manufacture thereof, and articles formed therefrom | SPERA MICHAEL L (US) | 2003-10-16 | — | — | US | disclosed |
| EP-1353228-A1 | Method for depositing a very thick photoresist layer on a substrate and metal plating method | Shipley Co. L.L.C. (US) | 2003-10-15 | — | — | EP | disclosed |
| EP-1348742-A2 | Coating powders, methods of manufacture thereof, and articles formed therefrom | ROHM AND HAAS COMPANY (US) | 2003-10-01 | — | — | EP | disclosed |
| WO-2003079402-A2 | LATEX BASED ADSORBENT CHIP | CIPHERGEN BIOSYSTEMS, INC. (US) | 2003-09-25 | — | — | WO | disclosed |
| WO-2003064594-A2 | MONOMERS AND POLYMERS HAVING ENERGY ABSORBING MOIETIES OF USE IN DESORPTION/IONIZATION OF ANALYTES | CIPHERGEN BIOSYSTEMS, INC. (US) | 2003-08-07 | — | — | WO | disclosed |
| EP-0919871-B1 | Photoimageable composition having improved flexibility, adhesion and stripping characteristics | NICHIGO MORTON CO LTD (JP) | 2003-06-18 | — | — | EP | disclosed |
| US-20030091926-A1 | Glass transition temperature above room temperature; tack free | SHIPLEY COMPANY, L.L.C. | 2003-05-15 | — | — | US | disclosed |
| US-6558876-B1 | Flexographic element having an infrared radiation ablatable layer capable of being selectively removed by a laser beam | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-05-06 | — | — | US | disclosed |
| US-20030059709-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. | 2003-03-27 | — | — | US | disclosed |
| EP-0810081-B1 | PRESSURE VESSEL AND METHOD OF MANUFACTURING SAME | TORAY INDUSTRIES (JP) | 2003-03-26 | — | — | EP | disclosed |
| US-6527904-B1 | Method of producing an optical video disc | PIONEER ELECTRONIC CORPORATION (JP) | 2003-03-04 | — | — | US | disclosed |
| US-20030032043-A1 | Latex based adsorbent chip | CIPHERGEN BIOSYSTEMS, INC. | 2003-02-13 | — | — | US | disclosed |
| CN-1100665-C | Pressure vessel and method of manufacturing same | TORAY INDUSTRIES (JP) | 2003-02-05 | — | — | CN | disclosed |
| US-20030017464-A1 | Latex based adsorbent chip | CIPHERGEN BIOSYSTEMS, INC. | 2003-01-23 | — | — | US | disclosed |
| EP-1251399-A2 | Photoresist composition | Shipley Company LLC (US) | 2002-10-23 | — | — | EP | disclosed |
| EP-0909990-B1 | Photopolymerizable compositions having improved sidewall geometry and development latitude | DU PONT (US) | 2002-10-16 | — | — | EP | disclosed |
| US-20020069777-A1 | Printing sleeves and cylinders applied with a photopolymer composition | ERMINIO ROSSINI S.P.A. | 2002-06-13 | — | — | US | disclosed |
| US-6384104-B1 | PROVIDING STORAGE STABILITY TO ULTRAVIOLET RADIATION ABSORPTION COMPOSITIONS BY ADDING LATEX POLYMER PARTICLES TO INCREASE ABSORPTION, WHEREIN PARTICLES CONTAIN VOID, HAVE SPECIFIED PARTICLE SIZE AND COMPRISE CROSSLINKED SHELL PORTION | ROHM AND HAAS COMPANY | 2002-05-07 | — | — | US | disclosed |
| US-6329123-B1 | A PHOTOPOLYMERIZABLE ACRYLATE-FUNCTIONAL URETHANE OLIGOMER, WHEREIN THE ACRYLATE FUNCTIONALITY IS SEPARATED FROM THE URETHANE LINKAGE BY AT LEAST TWO ALKYLENE OXIDE GROUPS AND AT LEAST ONE RING-OPENED LACTONE GROUP; NEGATIVE; PRINTED CIRCUIT | MORTON INTERNATIONAL INC. | 2001-12-11 | — | — | US | disclosed |
| US-6322951-B1 | PHOTOPOLYMERIZABLE COMPONENT COMPRISES A (METH)ACRYLATE FUNCTIONAL URETHANE OLIGOMER SEPARATED FROM THE URETHANE LINKAGE BY AT LEAST TWO ALKYLENE OXIDE GROUPS AND AT LEAST ONE RING-OPENED LACTONE GROUP FOR IMPROVED FLEXIBILITY | NORTON INTERNATIONAL, INC. | 2001-11-27 | — | — | US | disclosed |
| US-6319653-B1 | FOR DRY FILM PHOTORESISTS USEFUL IN THE MANUFACTURE OF PRINTED CIRCUIT BOARDS | MORTON INTERNATIONAL INC. | 2001-11-20 | — | — | US | disclosed |
| EP-1154322-A1 | Flexographic printing cylinders and sleeves with cylindrical, seamless photopolymer printing layer, photopolymer composition therefor, and method of making said cylinders and sleeves from said composition. | ERMINIO ROSSINI S.P.A. (IT) | 2001-11-14 | — | — | EP | disclosed |
| US-6294610-B1 | FOR POWDER COATING SUBSTRATES SUCH AS METALS | ROHM AND HAAS COMPANY | 2001-09-25 | — | — | US | disclosed |
| US-6268111-B1 | ACRYLATED POLYETHER, POLYESTER | ROHM AND HAAS COMPANY | 2001-07-31 | — | — | US | disclosed |
| US-6265132-B1 | HAVING TETRAACRYLATE FUNCTIONALITY WHICH PROVIDES ENHANCED FLEXIBILITY TO PHOTOIMAGEABLE COMPOSITIONS WHICH FUNCTION AS PHOTORESISTS; IMPROVED PERFORMANCE IN NICKEL/GOLD PLATING. | ROHM AND HAAS COMPANY | 2001-07-24 | — | — | US | disclosed |
| EP-1117006-A1 | Photoresist having increased photospeed | Shipley Company LLC (US) | 2001-07-18 | — | — | EP | disclosed |
| EP-1103586-A2 | Coating powders for heat-sensitive substrates | ROHM AND HAAS COMPANY (US) | 2001-05-30 | — | — | EP | disclosed |
| US-6238837-B1 | PHOTOSENSITIVE PRINTING PLATE ELEMENT COMPRISING A SUPPORT COATED WITH AN ACTINIC RADIATION-PHOTOPOLYMERIZABLE BINDER/MONOMER MIXTURE OVERCOATED WITH A TACK-FREE, RADIOPAQUE MASKING LAYER PATTERNED BY INFRARED ABLATION | E.I. DU PONT DE NEMOURS AND COMPANY | 2001-05-29 | — | — | US | disclosed |
| EP-1098223-A1 | Dry film photopolymerizable compositions | Shipley Company LLC (US) | 2001-05-09 | — | — | EP | disclosed |
| US-6228919-B1 | Solvent dispersible interpenetrating polymer networks | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-05-08 | — | — | US | disclosed |
| EP-1094365-A1 | Photoimageable composition containing flexible oligomer | ROHM AND HAAS COMPANY (US) | 2001-04-25 | — | — | EP | disclosed |
| EP-1094364-A1 | Photoimageable composition having photopolymerizeable binder oligomer | ROHM AND HAAS COMPANY (US) | 2001-04-25 | — | — | EP | disclosed |
| EP-1092421-A2 | Method for preparing ultraviolet radiation absorbing compositions | ROHM AND HAAS COMPANY (US) | 2001-04-18 | — | — | EP | disclosed |
| US-6218074-B1 | BLEND OF BROMOPOLYMER AND OTHER ADDITION POLYMER | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-04-17 | — | — | US | disclosed |
| EP-0860742-B1 | Flexible, flame-retardant, photoimageable composition for coating printing circuits | DU PONT (US) | 2001-04-04 | — | — | EP | disclosed |
| US-6207347-B1 | URETHANE BIURET OLIGOMER. | NICHIGO-MORTON CO. LTD. (JP) | 2001-03-27 | — | — | US | disclosed |
| US-6190481-B1 | Pressure vessel and process for producing the same | TORAY INDUSTRIES, INC. (JP) | 2001-02-20 | — | — | US | disclosed |
| US-6187965-B1 | Process for recovering high boiling solvents from a photolithographic waste stream comprising at least 10 percent by weight of monomeric units | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-02-13 | — | — | US | disclosed |
| US-6180323-B1 | PREPARING PHOTOPOLYMERIZABLE ELEMENT COMPRISING SUPPORT AND PHOTOPOLYMERIZABLE FORMULATION; APPLYING TO COPPER CLAD SUBSTRATE; IMAGEWISE EXPOSING TO ACTINIC RADIATION; DEVELOPING TO FORM RESIST IMAGE ON COPPER CLAD SUBSTRATE | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-01-30 | — | — | US | disclosed |
| US-6166245-A | Photoimageable compositions having improved chemical resistance and stripping ability | SHIPLEY COMPANY, L.L.C. (US) | 2000-12-26 | — | — | US | disclosed |
| EP-0822448-B1 | Flexible, flame-retardant, photoimageable composition for coating printed circuits | DU PONT (US) | 2000-11-02 | — | — | EP | disclosed |
| EP-0582538-B1 | Propylene carbonate recovery process | IBM (US) | 2000-10-11 | — | — | EP | disclosed |
| EP-0740210-B1 | Flexible, aqueous processable, photoimageable permanent coatings for printed circuits | DU PONT (US) | 2000-10-04 | — | — | EP | disclosed |
| US-6127097-A | EXPOSING PHOTORESIST FILM ON SUBSTRATE TO RADIATION TO CROSSLINK, DEVELOPING IN BENZYL ALCOHOL, FORMING COPPER CIRCUIT PATTERN, STRIPPING PHOTORESIST IN SOLUTION OF BENZYL ALCOHOL AND ADDITIONAL SOLVENT | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-10-03 | — | — | US | disclosed |
| EP-0689095-B1 | Visible light sensitizer for photopolymerizing initiator and/or photocrosslinking agent, photosensitive composition, and hologram recording medium | CANON KK (JP) | 2000-09-20 | — | — | EP | disclosed |
| EP-0740212-B1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | DU PONT (US) | 2000-09-13 | — | — | EP | disclosed |
| US-6110643-A | Method of forming a multilayer printed circuit board and product thereof | MORTON INTERNATIONAL INC (US) | 2000-08-29 | — | — | US | disclosed |
| EP-1008912-A1 | Photoimageable compositions having improved chemical resistance and stripping ability | Shipley Company LLC (US) | 2000-06-14 | — | — | EP | disclosed |
| EP-1008911-A1 | Photoimageable compositions having improved flexibility and stripping ability | Shipley Company LLC (US) | 2000-06-14 | — | — | EP | disclosed |
| EP-1008910-A1 | Photoimageable compositions having improved stripping ability and resolution | Shipley Company LLC (US) | 2000-06-14 | — | — | EP | disclosed |
| US-6054252-A | NEGATIVES; DRY FILM PHOTORESIST | MORTON INTERNATIONAL, INC. (US) | 2000-04-25 | — | — | US | disclosed |
| US-6045973-A | AN ACID-FUNCTIONAL BINDER POLYMER FOR USE IN ALKALINE DEVELOPING SOLUTIONS, ACID ETCHING SOLUTIONS, AND ACID PLATING BATHS | MORTON INTERNATIONAL, INC. (US) | 2000-04-04 | — | — | US | disclosed |
| EP-0624580-B1 | Styrylcoumarin compound, photosensitive resin composition, and hologram recording medium | CANON KK (JP) | 2000-02-09 | — | — | EP | disclosed |
| EP-0969324-A1 | One part photoimageable composition for forming solder mask | MORTON INTERNATIONAL, INC. (US) | 2000-01-05 | — | — | EP | disclosed |
| US-6004725-A | IMPROVED ADHESION AND RESOLUTION, NEGATIVE ACTING, ACRYLATE FUNCTIONAL ISOCYANATE TRIMER | MORTON INTERNATIONAL, INC. (US) | 1999-12-21 | — | — | US | disclosed |
| EP-0962827-A2 | Photoimageable composition having improved photoinitiator system | Nichigo-Morton Co Ltd (JP) | 1999-12-08 | — | — | EP | disclosed |
| EP-0961170-A1 | Aqueous developable photoimageable composition having improved adhesion and stripping characteristics | Nichigo-Morton Co Ltd (JP) | 1999-12-01 | — | — | EP | disclosed |
| EP-0961171-A1 | Photoimageable composition having improved flexibility | Nichigo-Morton Co Ltd (JP) | 1999-12-01 | — | — | EP | disclosed |
| US-5994597-A | Process for recovering high boiling solvents from a photolithographic waste stream comprising less than 10 percent by weight monomeric units | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-11-30 | — | — | US | disclosed |
| EP-0741330-B1 | Flexographic element having an infrared ablatable layer and process for making a flexographic printing plate | DU PONT (US) | 1999-11-24 | — | — | EP | disclosed |
| US-5985998-A | POLYMERS AND CROSSLINKING IN SOLVENTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-11-16 | — | — | US | disclosed |
| US-5962190-A | BINDER OF C4-10 ALKYL METHACRYLATE, C4-10 ALKYL ACRYLATE, METHYL METHACRYLATE OR ETHYL METHACRYLATE, METHACRYLIC ACID OR ACRYLIC ACID, AND STYRENE; UNSATURATED CROSSLINKING AGENT; PHOTOINITIATOR; RELIEF IMAGES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-10-05 | — | — | US | disclosed |
| EP-0943963-A2 | Photoimageable compositions having improved stripping properties in aqueous alkaline solutions | MORTON INTERNATIONAL, INC. (US) | 1999-09-22 | — | — | EP | disclosed |
| US-5952153-A | ACID FUNCTIONAL BINDER POLYMER; PHOTOPOLYMERIZABLE ETHYLENEICALLY UNSATURATED COMPOUND(S); 9-PHENYL ACRIDINE OR HOMOLOG AS PHOTOINITIATOR; AND DIPROPYLENE GLYCOL DIBENZOATE PLASTICIZER | MORTON INTERNATIONAL, INC. (US) | 1999-09-14 | — | — | US | disclosed |
| US-5952154-A | NEGATIVE-ACTING PHOTORESISTS USE IN PRINTED CIRCUITS; COMPRISING AN ADDITION-POLYMERIZEABLE, NON-GASEOUS ETHYLENICALLY UNSATURATED COMPOUNDS CAPABLE FORMING A POLYMER BY FREE-RADICAL INITIATED CHAIN-PROPAGATION | MORTON INTERNATIONAL, INC. (US) | 1999-09-14 | — | — | US | disclosed |
| EP-0740211-B1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | DU PONT (US) | 1999-08-18 | — | — | EP | disclosed |
| US-5939239-A | Photoimageable compositions containing photopolymerizable urethane oligomers and dibenzoate plasticizers | NICHIGO-MORTON CO., LTD. (JP) | 1999-08-17 | — | — | US | disclosed |
| US-5939238-A | Photoimageable composition having improved photoinitiator system | MORTON INTERNATIONAL, INC. (US) | 1999-08-17 | — | — | US | disclosed |
| EP-0935171-A1 | Photoimageable compositions having hydrophilic binder polymers and hydrophilic monomers | MORTON INTERNATIONAL, INC. (US) | 1999-08-11 | — | — | EP | disclosed |
| US-5928839-A | COATING METAL LAYERS WITH LAYERS OF CURABLE PHOTOIMAGEABLE COMPOSITION, POLYMERIZABLE ACRYLATE MONOMER, OLIGOMER FORMED BY REACTION OF AN EPOXY RESIN AND ACRYLIC OR METHACRYLIC ACID, PHOTOSENSITIVE INITIATOR, EPOXY RESIN, CURING AGENT, CURING | MORTON INTERNATIONAL, INC. (US) | 1999-07-27 | — | — | US | disclosed |
| US-5925499-A | Epoxy-containing waterborne photoimageable composition | MORTON INTERNATIONAL, INC. (US) | 1999-07-20 | — | — | US | disclosed |
| US-5922509-A | ACID-FUNCTIONAL BINDER POLYMER WHICH HAS A MULTIMODAL MOLECULAR WEIGHT DISTRIBUTION, PHOTOPOLYMERIZABLE COMPONENT, A PHOTOINITIATOR; FASTER, AQUEOUS PHOTORESIST STRIPPING WITH SMALLER PARTICLE SIZES; POLLUTION CONTROL | MORTON INTERNATIONAL, INC. (US) | 1999-07-13 | — | — | US | disclosed |
| EP-0927911-A2 | Photoimageable compositions containing photopolymerizable urethane oligomers | Nichigo-Morton Co Ltd (JP) | 1999-07-07 | — | — | EP | disclosed |
| US-5916403-A | CALENDERING MOLTEN STREAM OF PHOTOPOLYMERIZABLE MATERIAL ON MANDREL-SUPPORTED SLEEVE, ROTATING, HEATING, FORMING SEAMLESS CYLINDER SLEEVE FOR PRINTER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-06-29 | — | — | US | disclosed |
| EP-0919871-A1 | Photoimageable composition having improved flexibility, adhesion and stripping characteristics | Nichigo-Morton Co Ltd (JP) | 1999-06-02 | — | — | EP | disclosed |
| EP-0919872-A2 | Negative-acting photoimageable compositions comprising unsaturated isocyanate trimers | Nichigo-Morton Co Ltd (JP) | 1999-06-02 | — | — | EP | disclosed |
| EP-0919869-A1 | Photopolymerizable compositions containing urethane oligomers and dibenzoate plasticizers | Nichigo-Morton Co Ltd (JP) | 1999-06-02 | — | — | EP | disclosed |
| EP-0766143-B1 | Methods and apparatus for forming cylindrical photosensitive elements | DU PONT (US) | 1999-06-02 | — | — | EP | disclosed |
| EP-0487086-B1 | Volume phase hologram comprising a photosensitive recording medium and method of preparing volume type phase hologram member using same | CANON KK (JP) | 1999-04-21 | — | — | EP | disclosed |
| EP-0909990-A2 | Photopolymerizable compositions having improved sidewall geometry and development latitude | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-04-21 | — | — | EP | disclosed |
| EP-0627426-B1 | Pyran derivative, photosensitive resin composition, and hologram recording medium using it | CANON KK (JP) | 1999-03-24 | — | — | EP | disclosed |
| US-5886101-A | TWO INTERPENETRATING CROSSLINKED POLYMERS, AT LEAST ONE OF WHICH IS FORMED BY SOLVENT POLYMERIZATION; PHOTOSENSITIVE BINDERS OR SOLDER MASKS; PHOTORESISTS; PROTECTIVE AND DECORATIVE COATINGS; TOUGHNESS; FLEXIBILITY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-03-23 | — | — | US | disclosed |
| US-5879837-A | Styrylcoumarin compound, photosensitive resin composition, and hologram recording medium | CANON KABUSHIKI KAISHA (JP) | 1999-03-09 | — | — | US | disclosed |
| EP-0664486-B1 | Waterborne photoresists having non-ionic fluorocarbon surfactants | MORTON INT INC (US) | 1999-03-03 | — | — | EP | disclosed |
| US-5869210-A | Photosensitive recording medium and method of preparing volume type phase hologram member using same | CANON KABUSHIKI KAISHA (JP) | 1999-02-09 | — | — | US | disclosed |
| US-5869220-A | MIXING AND COMMINUTING A PARTIALLY NEUTRALIZED ACID FUNCTIONAL LATEX POLYMER RESIN WITH PHOTOPOLYMERIZABLE MONOMERS AND PHOTOINITIATORS UNDER CONDITIONS SUFFICIENT TO PRODUCE A STABLE EMULSION. | MACDERMID ACUMEN, INC. (US) | 1999-02-09 | — | — | US | disclosed |
| EP-0628180-B1 | PLIABLE, AQUEOUS PROCESSABLE, PHOTOIMAGEABLE PERMANENT COATINGS FOR PRINTED CIRCUITS | DU PONT (US) | 1998-09-16 | — | — | EP | disclosed |
| EP-0726499-B1 | Polymers and use in photoimageable compositions | MORTON INT INC (US) | 1998-09-16 | — | — | EP | disclosed |
| US-5805343-A | Optical element and a method for forming the same | PIONEER ELECTRONIC CORPORATION (JP) | 1998-09-08 | — | — | US | disclosed |
| EP-0860742-A1 | Flexible, flame-retardant, photoimageable composition for coating printing circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-08-26 | — | — | EP | disclosed |
| US-5798019-A | FLEXOGRAPHIC PRINTING PLATES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-08-25 | — | — | US | disclosed |
| US-5776634-A | Photosensitive recording medium and method of preparing volume type phase hologram member using same | CANON KABUSHIKI KAISHA (JP) | 1998-07-07 | — | — | US | disclosed |
| US-5773518-A | BINDER POLYMER | MORTON INTERNATIONAL, INC. (US) | 1998-06-30 | — | — | US | disclosed |
| EP-0570094-B1 | Method of forming a multilayer printed circuit board and product thereof | MORTON INT INC (US) | 1998-06-24 | — | — | EP | disclosed |
| CN-1182385-A | Pressure vessel and method of manufacturing same | TORAY INDUSTRIES (JP) | 1998-05-20 | — | — | CN | disclosed |
| US-5728505-A | FLEXIBLE PHOTOPOLYMERIZABLE COATING WITH ALKALINE DEVELOPERS FOR PROTECTIVE COATINGS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-03-17 | — | — | US | disclosed |
| EP-0664490-B1 | Waterborne photoresists having associate thickeners | MORTON INT INC (US) | 1998-03-11 | — | — | EP | disclosed |
| EP-0664488-B1 | Waterborne photoresists having binders neutralized with amino acrylates | MORTON INT INC (US) | 1998-03-11 | — | — | EP | disclosed |
| US-5723633-A | Pyran derivative, photosensitive resin composition, and hologram recording medium using it | CANON KABUSHIKI KAISHA (JP) | 1998-03-03 | — | — | US | disclosed |
| EP-0822448-A1 | Flexible, flame-retardant, photoimageable composition for coating printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-02-04 | — | — | EP | disclosed |
| EP-0664491-B1 | Waterborne photoresists having polysiloxanes | MORTON INT INC (US) | 1998-01-28 | — | — | EP | disclosed |
| US-5700607-A | HAVING PERMANENT INNERLAYERS OF LIGHT- AND HEAT-CURED PHOTORESIST COMPRISING ACRYLATE MONOMER, ACRYLATED EPOXY RESIN, CURABLE EPOXY RESIN, CURING AGENT, CROSSLINKING AGENT, FILLER | MORTON INTERNATIONAL, INC. (US) | 1997-12-23 | — | — | US | disclosed |
| US-5698376-A | BLEND OF BINDER, PHOTOPOLYMERIZABLE MATERIAL AND PHOTOINITIATOR | MORTON INTERNATIONAL, INC. (US) | 1997-12-16 | — | — | US | disclosed |
| US-5698370-A | Esterified styrene/maleic anhydride polymer and polymer-containing photoimageable composition having improved alkaline process resistance | MORTON INTERNATIONAL, INC. (US) | 1997-12-16 | — | — | US | disclosed |
| EP-0810081-A1 | PRESSURE VESSEL AND METHOD OF MANUFACTURING SAME | TORAY INDUSTRIES, INC. (JP) | 1997-12-03 | — | — | EP | disclosed |
| EP-0801328-A1 | Photoimageable composition having an acrylic-functional UV stabilizer | MORTON INTERNATIONAL, INC. (US) | 1997-10-15 | — | — | EP | disclosed |
| US-5673251-A | Two substrates bonding type optical disk and method of producing the same | PIONEER ELECTRONIC CORPORATION (JP) | 1997-09-30 | — | — | US | disclosed |
| US-5643657-A | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1997-07-01 | — | — | US | disclosed |
| EP-0676669-B1 | Pliable, aqueous processable, photoimageable permanent coatings for printed circuits | DU PONT (US) | 1997-06-18 | — | — | EP | disclosed |
| US-5637442-A | REMOVING THE FUMES THROUGH AQUEOUS ALKALINE LIQUID | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1997-06-10 | — | — | US | disclosed |
| EP-0501433-B1 | Photosensitive compositions using solvent dispersible interpenetrating polymer networks | DU PONT (US) | 1997-05-07 | — | — | EP | disclosed |
| US-5618856-A | THIOBARBITURIC ACID DERIVATIVES | CANON KABUSHIKI KAISHA (JP) | 1997-04-08 | — | — | US | disclosed |
| EP-0766143-A1 | Methods and apparatus for forming cylindrical photosensitive elements | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1997-04-02 | — | — | EP | disclosed |
| EP-0766142-A1 | An element for making a seamless relief printing sleeve | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1997-04-02 | — | — | EP | disclosed |
| EP-0584030-B1 | Process for the abatement of propylene carbonate emissions | IBM (US) | 1997-03-19 | — | — | EP | disclosed |
| EP-0762209-A1 | Epoxy-containing waterborne photoimageable composition | MORTON INTERNATIONAL, INC. (US) | 1997-03-12 | — | — | EP | disclosed |
| US-5609991-A | ESTERIFIED MALEIC ANHYDRIDE-STYRENE COPOLYMER, MONOMER, ACRYLATED EPOXY RESIN, AMINO RESINS. PRINTING PLATES, TACK FREE | MORTON INTERNATIONAL, INC. (US) | 1997-03-11 | — | — | US | disclosed |
| WO-1996041240-A1 | WATER PHOTORESIST EMULSIONS AND METHODS OF PREPARATION THEREOF | W.R. GRACE & CO.-CONN. (US) | 1996-12-19 | — | — | WO | disclosed |
| US-5576145-A | Esterified styrene/maleic anhydride polymer and polymer-containing photoimageable composition having improved alkaline process resistance | MORTON INTERNATIONAL, INC. (US) | 1996-11-19 | — | — | US | disclosed |
| EP-0741330-A1 | Flexographic element having an infrared ablatable layer and process for making a flexographic printing plate | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-11-06 | — | — | EP | disclosed |
| US-5571417-A | Method for treating photolithographic developer and stripper waste streams containing resist or solder mask and gamma butyrolactone or benzyl alcohol | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-11-05 | — | — | US | disclosed |
| EP-0740211-A1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-10-30 | — | — | EP | disclosed |
| EP-0740212-A1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-10-30 | — | — | EP | disclosed |
| EP-0740210-A1 | Flexible, aqueous processable, photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-10-30 | — | — | EP | disclosed |
| US-5552009-A | STAMPERS | U.S. PHILIPS CORPORATION (US) | 1996-09-03 | — | — | US | disclosed |
| EP-0726499-A1 | Polymers and use in photoimageable compositions | MORTON INTERNATIONAL, INC. (US) | 1996-08-14 | — | — | EP | disclosed |
| US-5536620-A | ACRYLIC, POLYURETHANE ACRYLATE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-07-16 | — | — | US | disclosed |
| EP-0720059-A2 | Method for treating photolithography developer and stripper waste streams containing resist and gamma butyrolactone or benzyl alcohol | International Business Machines Corporation (US) | 1996-07-03 | — | — | EP | disclosed |
| EP-0717318-A1 | Method of adjusting thixotropy of a photoimageable composition | MORTON INTERNATIONAL, INC. (US) | 1996-06-19 | — | — | EP | disclosed |
| EP-0708369-A1 | Solvent system for forming films of photoimageable compositions | MORTON INTERNATIONAL, INC. (US) | 1996-04-24 | — | — | EP | disclosed |
| EP-0439050-B1 | Method for making optically readable media containing embossed information | DU PONT (US) | 1996-04-03 | — | — | EP | disclosed |
| US-5492942-A | Pyran derivative, photosensitive resin composition, and hologram recording medium using it | CANON KABUSHIKI KAISHA (JP) | 1996-02-20 | — | — | US | disclosed |
| EP-0691802-A1 | Method of forming a multilayer printed circuit board and product thereof | MORTON INTERNATIONAL, INC. (US) | 1996-01-10 | — | — | EP | disclosed |
| EP-0690080-A2 | Hindered-hydroxyl functional (meth) acrylate monomers containing di (meth) acrylates and compositions including same | UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) | 1996-01-03 | — | — | EP | disclosed |
| EP-0689095-A1 | Visible light sensitizer for photopolymerizing initiator and/or photocrosslinking agent, photosensitive composition, and hologram recording medium | CANON KABUSHIKI KAISHA (JP) | 1995-12-27 | — | — | EP | disclosed |
| EP-0405568-B1 | Direct effect master/stamper for optical recording | PHILIPS ELECTRONICS NV (NL) | 1995-12-27 | — | — | EP | disclosed |
| US-5466319-A | Method for making optically readable media containing embossed information | U.S. PHILIPS CORPORATION (US) | 1995-11-14 | — | — | US | disclosed |
| US-5458921-A | Propylene glycol monomethyl ether, ethylene glycol, butyl ether acetate | MORTON INTERNATIONAL, INC. (US) | 1995-10-17 | — | — | US | disclosed |
| EP-0676669-A1 | Pliable, aqueous processable, photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-10-11 | — | — | EP | disclosed |
| US-5442023-A | Without premature crosslinking or gel formation; curable protective coatings, inks, adhesives | UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) | 1995-08-15 | — | — | US | disclosed |
| EP-0664490-A1 | Waterborne photoresists having associate thickeners | MORTON INTERNATIONAL, INC. (US) | 1995-07-26 | — | — | EP | disclosed |
| EP-0664488-A1 | Waterborne photoresists having binders neutralized with amino acrylates | MORTON INTERNATIONAL, INC. (US) | 1995-07-26 | — | — | EP | disclosed |
| EP-0664486-A1 | Waterborne photoresists having non-ionic fluorocarbon surfactants | MORTON INTERNATIONAL, INC. (US) | 1995-07-26 | — | — | EP | disclosed |
| EP-0664491-A1 | Waterborne photoresists having polysiloxanes | MORTON INTERNATIONAL, INC. (US) | 1995-07-26 | — | — | EP | disclosed |
| EP-0664489-A1 | Waterborne photoresists having binders with sulfonic acid functionality | MORTON INTERNATIONAL, INC. (US) | 1995-07-26 | — | — | EP | disclosed |
| EP-0403170-B1 | Photoimageable compositions | MORTON INT INC (US) | 1995-05-03 | — | — | EP | disclosed |
| US-5411837-A | PHOTOIMAGEABLE COMPOSITION OF A LATEX BINDER, AN UNSATURATED MONOMER, A PHOTOINITIATOR AND A NEUTRALIZING BASE AND/OR A POLYETHERURETHANE COPOLYMER THICKENER | MORTON INTERNATIONAL, INC. (US) | 1995-05-02 | — | — | US | disclosed |
| US-5407783-A | Thermostability, shelf life | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-04-18 | — | — | US | disclosed |
| EP-0345340-B1 | PHOTOIMAGEABLE COMPOSITIONS | MORTON INT INC (US) | 1995-03-08 | — | — | EP | disclosed |
| US-5393643-A | Waterborne photoresists having binders neutralized with amino acrylates | MORTON INTERNATIONAL, INC. (US) | 1995-02-28 | — | — | US | disclosed |
| US-5389495-A | Fluoroaliphatic oxyethylene adduct surfactant; nondewetting, nonfoaming | MORTON INTERNATIONAL, INC. (US) | 1995-02-14 | — | — | US | disclosed |
| US-5387494-A | Includes a latex binder polymer having carboxylic acid functionality, a photopolymerizable monomer fraction and a photoinitiator | MORTON INTERNATIONAL, INC. (US) | 1995-02-07 | — | — | US | disclosed |
| EP-0628180-A1 | PLIABLE, AQUEOUS PROCESSABLE, PHOTOIMAGEABLE PERMANENT COATINGS FOR PRINTED CIRCUITS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-12-14 | — | — | EP | disclosed |
| EP-0627426-A1 | Pyran derivative, photosensitive resin composition, and hologram recording medium using it | CANON KABUSHIKI KAISHA (JP) | 1994-12-07 | — | — | EP | disclosed |
| EP-0624580-A1 | Styrylcoumarin compound, photosensitive resin composition, and hologram recording medium | CANON KABUSHIKI KAISHA (JP) | 1994-11-17 | — | — | EP | disclosed |
| US-5364736-A | Solder masks for printed circuits | MORTON INTERNATIONAL, INC. (US) | 1994-11-15 | — | — | US | disclosed |
| US-5364737-A | Latex binder polymer with carboxylic acid and unsaturated monomers, photoinitiators and polyether polyurethane thickener | MORTON INTERNATIONAL, INC. (US) | 1994-11-15 | — | — | US | disclosed |
| EP-0605350-A1 | Solvent stabilization process and method of recovering solvent | International Business Machines Corporation (US) | 1994-07-06 | — | — | EP | disclosed |
| US-5320933-A | Amide-type promoter | MORTON INTERNATIONAL, INC. (US) | 1994-06-14 | — | — | US | disclosed |
| US-5310428-A | Adding quinone thermal polymerization inhibitor | INERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-05-10 | — | — | US | disclosed |
| EP-0324480-B1 | Photopolymerizable compositions and elements for refractive index imaging | DU PONT (US) | 1994-04-13 | — | — | EP | disclosed |
| EP-0584030-A1 | Process for the abatement of propylene carbonate emissions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-02-23 | — | — | EP | disclosed |
| EP-0582538-A2 | Propylene carbonate recovery process | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-02-09 | — | — | EP | disclosed |
| EP-0582539-A1 | Chemical pre-treatment and biological destruction of propylene carbonate waste effluent streams to reduce the biological oxygen demand thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-02-09 | — | — | EP | disclosed |
| US-5281723-A | Propylene carbonate recovery process | INTERNATIONAL BUSINESS MACHINES (US) | 1994-01-25 | — | — | US | disclosed |
| US-5279689-A | Laminating film to dimensionally stable transparent substrate; embossing in relief image; applying actinic radiation | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-01-18 | — | — | US | disclosed |
| US-5275734-A | Chemical pre-treatment and biological destruction of propylene carbonate waste streams effluent streams to reduce the biological oxygen demand thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-01-04 | — | — | US | disclosed |
| EP-0573609-A1 | PHOTOSENSITIVE COMPOSITIONS CONTAINING COMB POLYMER BINDERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-12-15 | — | — | EP | disclosed |
| EP-0260590-B1 | Lamination of photopolymerizable film onto a substrate employing an intermediate nonphotosensitive liquid layer | DU PONT (US) | 1993-12-15 | — | — | EP | disclosed |
| US-5268260-A | Free radical initiated addition polymerizable acrylate monomer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1993-12-07 | — | — | US | disclosed |
| EP-0570094-A2 | Method of forming a multilayer printed circuit board and product thereof | MORTON INTERNATIONAL, INC. (US) | 1993-11-18 | — | — | EP | disclosed |
| US-5260149-A | Exposing first to a modulated coherent radiation to form hologram, and then to actinic radiation to fix it | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-11-09 | — | — | US | disclosed |
| WO-1993017368-A1 | PLIABLE, AQUEOUS PROCESSABLE, PHOTOIMAGEABLE PERMANENT COATINGS FOR PRINTED CIRCUITS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-09-02 | — | — | WO | disclosed |
| US-5229252-A | Solder mask for printed circuit board | MORTON INTERNATIONAL, INC. (US) | 1993-07-20 | — | — | US | disclosed |
| EP-0084851-B2 | PROCESS FOR PREPARING AN OVERCOATED PHOTOPOLYMER PRINTING PLATE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-07-14 | — | — | EP | disclosed |
| EP-0237985-B1 | IMPROVED SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION AND PROCESS OF USE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-06-09 | — | — | EP | disclosed |
| EP-0324482-B1 | PROCESS OF FORMING REFLECTION HOLOGRAMS IN PHOTOPOLYMERIZABLE LAYERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-03-31 | — | — | EP | disclosed |
| US-5188863-A | Direct effect master/stamper for optical recording | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-02-23 | — | — | US | disclosed |
| WO-1992015628-A1 | PHOTOSENSITIVE COMPOSITIONS CONTAINING COMB POLYMER BINDERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-09-17 | — | — | WO | disclosed |
| EP-0501433-A1 | Solvent dispersible interpenetrating polymer networks | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-09-02 | — | — | EP | disclosed |
| EP-0236950-B1 | ADHESION PROMOTION IN PHOTORESIST LAMINATION AND PROCESSING | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-06-03 | — | — | EP | disclosed |
| EP-0487086-A1 | Photosensitive recording medium and method of preparing volume type phase hologram member using same | CANON KABUSHIKI KAISHA (JP) | 1992-05-27 | — | — | EP | disclosed |
| EP-0217137-B1 | PHOTOPOLYMERIZABLE COMPOSITION OF ACRYLIC COPOLYMER CONTAINING DICYCLOPENTENYL ACRYLATE OR METHACRYLATE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-04-08 | — | — | EP | disclosed |
| US-5098803-A | Photopolymerization of a composition for holographic multilayer element | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-03-24 | — | — | US | disclosed |
| EP-0227337-B1 | PROCESS FOR MANUFACTURING PHOTOCHROMIC ARTICLES | PILKINGTON PLC (GB) | 1992-03-18 | — | — | EP | disclosed |
| EP-0247549-B1 | PHOTOPOLYMERIZABLE COMPOSITION CONTAINING CARBOXY BENZOTRIAZOLE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-11-27 | — | — | EP | disclosed |
| EP-0245020-B1 | PHOTOCHROMIC ARTICLES | PILKINGTON PLC (GB) | 1991-10-02 | — | — | EP | disclosed |
| EP-0210637-B1 | OPTICAL COATING COMPOSITION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-09-11 | — | — | EP | disclosed |
| EP-0439050-A2 | Method for making optically readable media containing embossed information | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-07-31 | — | — | EP | disclosed |
| EP-0427249-A2 | Aqueous processible photopolymerizable compositions capable of photolytically generating metal ions | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-05-15 | — | — | EP | disclosed |
| EP-0185337-B1 | PROCESS FOR PREPARING PHOTOPOLYMER FLEXOGRAPHIC ELEMENT WITH MELT EXTRUSION COATED ELASTOMERIC SURFACE LAYER | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-03-06 | — | — | EP | disclosed |
| EP-0405568-A2 | Direct effect master/stamper for optical recording | Koninklijke Philips Electronics N.V. (NL) | 1991-01-02 | — | — | EP | disclosed |
| EP-0404099-A2 | Improved holographic optical combiners for head-up displays | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-12-27 | — | — | EP | disclosed |
| EP-0404098-A2 | Holographic optical elements having a reflection hologram formed in a photopolymer | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-12-27 | — | — | EP | disclosed |
| EP-0403170-A2 | Photoimageable compositions | MORTON INTERNATIONAL, INC. (US) | 1990-12-19 | — | — | EP | disclosed |
| EP-0230936-B1 | PHOTOSENSITIVE COMPOSITIONS CONTAINING MICROGELS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-10-24 | — | — | EP | disclosed |
| EP-0382936-A2 | Elimination of voids in vacuum-laminated solder mask-coated printed-circuit boards by fluid pressurizing | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-08-22 | — | — | EP | disclosed |
| US-4950567-A | Holographic optical combiners for head-up displays | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-08-21 | — | — | US | disclosed |
| EP-0223114-B1 | COMPOSITIONS RETICULATED BY PHOTOPOLYMERIZATION | BASF Aktiengesellschaft (DE) | 1990-08-08 | — | — | EP | disclosed |
| US-4942112-A | HOLOGRAPHY, BINDERS, MONOMERS AND PHOTOINITIATORS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-07-17 | — | — | US | disclosed |
| US-4942102-A | MULTILAYER OPTICAL ELEMENT, BINDER OF POLYVINYL ACETAL, AN UNSATURATED MONOMER AND A PHOTOINITIATOR | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-07-17 | — | — | US | disclosed |
| EP-0374876-A2 | Bubble free liquid solder mask-coated printed circuit boards by fluid pressurizing | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-06-27 | — | — | EP | disclosed |
| EP-0374809-A2 | Bubble free film/liquid solder mask-coated printed circuit boards by fluid pressurizing | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-06-27 | — | — | EP | disclosed |
| EP-0214103-B1 | ADHESIVELY BONDED PHOTOSTRUCTURABLE POLYIMIDE FOIL | CIBA-GEIGY AG (CH) | 1990-06-27 | — | — | EP | disclosed |
| US-4935320-A | Substrate, thermostable adhesive, self-supporting, photocrosslinkable polyimide film | CIBA-GEIGY CORPORATION (US) | 1990-06-19 | — | — | US | disclosed |
| US-4927733-A | Conformation of vacuum - laminated solder mask coated printed circuit boards by fluid pressurizing | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-05-22 | — | — | US | disclosed |
| US-4913544-A | WINDOWS, OPTICAL GLASS | PILKINGTON PLC (GB) | 1990-04-03 | — | — | US | disclosed |
| EP-0356952-A2 | Process for making flexographic plates with increased flexibility | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-03-07 | — | — | EP | disclosed |
| US-4894315-A | RELIEF IMAGES, EXPOSURE, PHOTOPOLYMERIZATION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-01-16 | — | — | US | disclosed |
| EP-0096861-B1 | PROCESS AND APPARATUS FOR AUTOMATIC REPETITIVE REGISTRATION AND IMAGEWISE EXPOSURE OF SHEET SUBSTRATES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-01-03 | — | — | EP | disclosed |
| EP-0131299-B1 | CONTROLLED ROUGHENING OF PHOTOSENSITIVE COMPOSITION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-12-13 | — | — | EP | disclosed |
| US-4877818-A | PHOTORESISTS | ROHM AND HAAS COMPANY (US) | 1989-10-31 | — | — | US | disclosed |
| US-4877715-A | STORAGE STABLE, NONTACKY, FLEXIBLE | BASF AKTIENGESELLSCHAFT (DE) | 1989-10-31 | — | — | US | disclosed |
| US-4851471-A | MOLDING AND CURING MIXTURE OF SPIROOXAZINE DYE, REACTIVE POLYF UNCTIONAL ACRYLATE LOW AMOUNT OF CATALYST | PILKINGTON BROTHERS P.L.C. (GB) | 1989-07-25 | — | — | US | disclosed |
| EP-0324480-A2 | Photopolymerizable compositions and elements for refractive index imaging | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-07-19 | — | — | EP | disclosed |
| EP-0324482-A2 | Process of forming reflection holograms in photopolymerizable layers | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-07-19 | — | — | EP | disclosed |
| EP-0202690-B1 | PHOTOIMAGING COMPOSITIONS CONTAINING SUBSTITUTED CYCLOHEXADIENONE COMPOUNDS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-04-26 | — | — | EP | disclosed |
| US-4814257-A | PHOTOHARDENING ACRYLATE ESTER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-03-21 | — | — | US | disclosed |
| US-4786569-A | Adhesively bonded photostructurable polyimide film | CIBA-GEIGY CORPORATION (US) | 1988-11-22 | — | — | US | disclosed |
| US-4777115-A | PHOTOINITIATOR, UNSATURATED MONOMERS; LIGHT SENSITIVE ELEMENTS | BASF AKTIENGESELLSCHAFT (DE) | 1988-10-11 | — | — | US | disclosed |
| EP-0284642-A2 | Increased photopolymer photospeed employing yellow light preexposure | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-10-05 | — | — | EP | disclosed |
| US-4753865-A | PHOTORESISTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-06-28 | — | — | US | disclosed |
| EP-0260590-A2 | Lamination of photopolymerizable film onto a substrate employing an intermediate nonphotosensitive liquid layer | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-03-23 | — | — | EP | disclosed |
| EP-0259853-A2 | Lamination of photopolymerizable film onto a substrate employing an intermediate photosensitive layer | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-03-16 | — | — | EP | disclosed |
| EP-0259812-A2 | Photopolymerizable compositions containing inorganic fillers | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-03-16 | — | — | EP | disclosed |
| US-4726877-A | ADDITION POLYMERIZABLE ETHYLENICALLY UNSATURATED MONOMER, INITIATING SYSTEM AND POLYMER BINDER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-02-23 | — | — | US | disclosed |
| US-4716097-A | TRIARYLMETHANE OR XANTHENE DYE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-12-29 | — | — | US | disclosed |
| US-4716093-A | IMPROVED DEVELOPMENT AND STRIPPING | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-12-29 | — | — | US | disclosed |
| EP-0247549-A2 | Photopolymerizable composition containing carboxy benzotriazole | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-12-02 | — | — | EP | disclosed |
| US-4710262-A | PHOTORESIST FILM ADHESION PROMOTER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-12-01 | — | — | US | disclosed |
| EP-0089041-B1 | USE OF A NEGATIVE ACTING PHOTOPOLYMERIZABLE ELEMENT AS A SOLDER MASK | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-11-25 | — | — | EP | disclosed |
| EP-0245020-A2 | Photochromic articles | PILKINGTON PLC (GB) | 1987-11-11 | — | — | EP | disclosed |
| US-4698294-A | Lamination of photopolymerizable film onto a substrate employing an intermediate nonphotosensitive liquid layer | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-10-06 | — | — | US | disclosed |
| EP-0117483-B1 | LAMINATING AND TRIMMING PROCESS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-09-30 | — | — | EP | disclosed |
| EP-0237985-A2 | Improved solvent developable photoresist composition and process of use | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-09-23 | — | — | EP | disclosed |
| EP-0236950-A2 | Adhesion promotion in photoresist lamination and processing | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-09-16 | — | — | EP | disclosed |
| US-4693959-A | INCLUDING AN AMINO RESIN OF MELAMINE OR HYDANTOIN, FORMALDEHYDE AND A TOLUENESULFONAMIDE IN THE PHOTOSENSITIVE LAYER | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-09-15 | — | — | US | disclosed |
| EP-0135059-B1 | PHOTOIMAGING COMPOSITIONS CONTAINING SUBSTITUTED CYCLOHEXADIENONE COMPOUNDS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-09-09 | — | — | EP | disclosed |
| EP-0041642-B2 | INTEGRATED LAMINATING PROCESS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-09-02 | — | — | EP | disclosed |
| EP-0107065-B1 | PRECURLED FLEXOGRAPHIC PRINTING PLATE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-08-19 | — | — | EP | disclosed |
| EP-0230936-A2 | Photosensitive compositions containing microgels | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-08-05 | — | — | EP | disclosed |
| US-4680249-A | Photopolymerizable composition containing carboxy benzotriazole | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-07-14 | — | — | US | disclosed |
| EP-0227337-A2 | Process for manufacturing photochromic articles | PILKINGTON PLC (GB) | 1987-07-01 | — | — | EP | disclosed |
| EP-0223114-A2 | Compositions reticulated by photopolymerization | BASF Aktiengesellschaft (DE) | 1987-05-27 | — | — | EP | disclosed |
| US-4668607-A | Multilevel imaging of photopolymer relief layer for the preparation of casting molds | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-05-26 | — | — | US | disclosed |
| EP-0217137-A2 | Photopolymerizable composition of acrylic copolymer containing dicyclopentenyl acrylate or methacrylate | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-04-08 | — | — | EP | disclosed |
| US-4650743-A | PHOTOPOLYMERIZED HYDROZYALKYL ACRYLATE AND OLIGOMER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-03-17 | — | — | US | disclosed |
| EP-0214103-A2 | Adhesively bonded photostructurable polyimide foil | CIBA-GEIGY AG (CH) | 1987-03-11 | — | — | EP | disclosed |
| EP-0210638-A2 | Optical coating composition | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-02-04 | — | — | EP | disclosed |
| EP-0210637-A2 | Optical coating composition | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-02-04 | — | — | EP | disclosed |
| EP-0115354-B1 | STORAGE STABLE PHOTOPOLYMERIZABLE COMPOSITION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-01-21 | — | — | EP | disclosed |
| US-4634657-A | AND A LEEVCO DYE, MONOMERIC COMPOUND AND PHOTOINIATOR; IMPROVED PRINTOUT CAPABILITIES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-01-06 | — | — | US | disclosed |
| US-4631246-A | Uniform cover sheet with rough surface in a photosensitive element | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-12-23 | — | — | US | disclosed |
| EP-0084851-B1 | PROCESS FOR PREPARING AN OVERCOATED PHOTOPOLYMER PRINTING PLATE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-12-03 | — | — | EP | disclosed |
| EP-0202690-A2 | Photoimaging compositions containing substituted cyclohexadienone compounds | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-11-26 | — | — | EP | disclosed |
| US-4622088-A | PRINTING PLATES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-11-11 | — | — | US | disclosed |
| US-4621043-A | Storage stable photopolymerizable composition | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-11-04 | — | — | US | disclosed |
| EP-0198392-A1 | Partial neutralization of aqueous developable photoresist | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-10-22 | — | — | EP | disclosed |
| EP-0196033-A2 | Multilevel imaging of photopolymer relief layer for the preparation of casting molds | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-10-01 | — | — | EP | disclosed |
| EP-0193621-A1 | Photopolymerizable compositions and elements containing acid to reduce scum and stain formation | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-09-10 | — | — | EP | disclosed |
| EP-0185337-A2 | Process for preparing photopolymer flexographic element with melt extrusion coated elastomeric surface layer | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-06-25 | — | — | EP | disclosed |
| US-4592816-A | Forming negative images on conductive surfaces | ROHM AND HAAS COMPANY (US) | 1986-06-03 | — | — | US | disclosed |
| US-4587199-A | FLEXIBLE SUPPORT, REMOVABLE COVER SHEET; PRINTED CIRCUITS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-05-06 | — | — | US | disclosed |
| US-4584261-A | Process for etching nonphotosensitive layer under washoff photopolymer layer | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-04-22 | — | — | US | disclosed |
| EP-0176356-A2 | Photosensitive polymer compositions, electrophoretic deposition processes using same, and the use of same in forming films on substrates | ROHM AND HAAS COMPANY (US) | 1986-04-02 | — | — | EP | disclosed |
| EP-0041639-B1 | LAMINATING PROCESS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-03-05 | — | — | EP | disclosed |
| US-4567129-A | Process for image formation utilizing chemically soluble pigments | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-01-28 | — | — | US | disclosed |
| US-4567130-A | PHOTOLITHOGRAPHIC FILMS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-01-28 | — | — | US | disclosed |
| US-4567128-A | Cover sheet in a photosensitive element | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-01-28 | — | — | US | disclosed |
| US-4565770-A | PHOTOLITHOGRAPHIC FILMS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-01-21 | — | — | US | disclosed |
| EP-0066870-B1 | PHOTOIMAGING COMPOSITIONS CONTAINING SUBSTITUTED CYCLOHEXADIENONE COMPOUNDS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-11-21 | — | — | EP | disclosed |
| US-4548884-A | APPLYING PHOTOSENSITIVE LIQUID BETWEEN SUBSTRATE AND PHOTOMASK WHICH ARE HINGED TOGETHER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-10-22 | — | — | US | disclosed |
| EP-0064565-B1 | PROCESS FOR BROMINE SURFACE TREATMENT OF PHOTOSENSITIVE ELASTOMERIC FLEXOGRAPHIC PRINTING PLATES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-09-11 | — | — | EP | disclosed |
| EP-0064564-B1 | PROCESS FOR SURFACE TREATMENT OF FLEXOGRAPHIC PRINTING PLATES CONTAINING BUTADIENE/ACRYLONITRILE COPOLYMERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-08-28 | — | — | EP | disclosed |
| EP-0041640-B1 | PHOTOPOLYMERIZABLE COMPOSITION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-08-28 | — | — | EP | disclosed |
| US-4528261-A | Prelamination, imagewise exposure of photohardenable layer in process for sensitizing, registering and exposing circuit boards | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-07-09 | — | — | US | disclosed |
| US-4527890-A | Automatic repetitive registration and imagewise exposure of sheet substrates | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-07-09 | — | — | US | disclosed |
| US-4518667-A | Automatic repetitive registration and image wise exposure of sheet substrates | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-05-21 | — | — | US | disclosed |
| EP-0058737-B1 | Flexographic printing plates containing blended adhesives | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-05-15 | — | — | EP | disclosed |
| US-4517281-A | UNSATURATED MONOMER, POLYMER BINDER DEVELOPERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-05-14 | — | — | US | disclosed |
| US-4510230-A | AQUEOUS PROCESSABLE RESIST ON COPPER SUBSTRATE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-04-09 | — | — | US | disclosed |
| EP-0135059-A1 | Photoimaging compositions containing substituted cyclohexadienone compounds | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-03-27 | — | — | EP | disclosed |
| EP-0049504-B1 | IMPROVED AQUEOUS DEVELOPABLE PHOTOPOLYMERIZABLE ELEMENTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-03-27 | — | — | EP | disclosed |
| US-4497889-A | Release compound in negative acting photopolymerizable element | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-02-05 | — | — | US | disclosed |
| US-4495014-A | LAMINATION OF PHOTOSENSITIVE LAYER TO MOVING SHEET SUBSTRATE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-01-22 | — | — | US | disclosed |
| EP-0131299-A2 | Controlled roughening of photosensitive composition | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-01-16 | — | — | EP | disclosed |
| US-4485167-A | UNSATURATED MONOMER, BINDER, PHOTOINITIATOR AND NITROGEN CONTAINING COMPOUND | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-11-27 | — | — | US | disclosed |
| EP-0123158-A2 | Prelamination, imagewise exposure of photohardenable layer in process for sensitizing, registering and exposing circuit boards | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-10-31 | — | — | EP | disclosed |
| US-4478931-A | POSTEXPOSURE OF ELASTOMER TO ACTINIC RADIATION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-10-23 | — | — | US | disclosed |
| EP-0041642-B1 | INTEGRATED LAMINATING PROCESS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-09-12 | — | — | EP | disclosed |
| EP-0117483-A1 | Laminating and trimming process | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-09-05 | — | — | EP | disclosed |
| EP-0040842-B1 | LAMINATING PROCESS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-08-15 | — | — | EP | disclosed |
| EP-0115354-A2 | Storage stable photopolymerizable composition | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-08-08 | — | — | EP | disclosed |
| US-4460675-A | CALENDERING A COMPOSITION OF BINDER, MONOMER, AND PHOTOINITIATOR BETWEEN SUPPORTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-07-17 | — | — | US | disclosed |
| US-4460427-A | Process for the preparation of flexible circuits | E. I. DUPONT DE NEMOURS AND COMPANY (US) | 1984-07-17 | — | — | US | disclosed |
| US-4454168-A | Printed circuits prepared from metallized photoadhesive layers | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-06-12 | — | — | US | disclosed |
| EP-0040843-B1 | LAMINATING PROCESS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-05-02 | — | — | EP | disclosed |
| EP-0107065-A2 | Precurled flexographic printing plate | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-05-02 | — | — | EP | disclosed |
| US-4446220-A | MERCAPTOCARBOXYLIC ACID MODIFIED DIENE POLYMER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-05-01 | — | — | US | disclosed |
| US-4431723-A | MERCAPTOCARBOXYLIC ACID MODIFIED BUTADIENE OR ISOPRENE POLYMER, UNSATURATED COMPOUND AND FREE RADICAL CATALYST ACTIVATED BY ACTINIC RADIATION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-02-14 | — | — | US | disclosed |
| US-4427759-A | CALENDERING, ELASTOMERIC BINDER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-01-24 | — | — | US | disclosed |
| EP-0096863-A2 | Process of registering and exposing sheet substrates using photosensitive liquid | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-12-28 | — | — | EP | disclosed |
| EP-0096861-A2 | Process and apparatus for automatic repetitive registration and imagewise exposure of sheet substrates | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-12-28 | — | — | EP | disclosed |
| US-4423135-A | THERMOPLASTIC BLOCK COPOLYMER, ETHYLENICALLY UNSATURATED COMPOUND, AND PHOTOINITIATOR | E. I. DU PONT DE NEMOURS & CO. (US) | 1983-12-27 | — | — | US | disclosed |
| US-4415649-A | ACRYLONITRILE-BUTADIENE COPOLYMER, UNSATURATED COMPOUND, AND FREE RADICAL CATALYST BONDED TO SUPPORT BY BLEND OF POLYESTER,-URETHANE OR -AMIDE | E. I. DU PONT DE NEMOURS & CO. (US) | 1983-11-15 | — | — | US | disclosed |
| US-4414278-A | NONAGGLOMERATING, NONSWELLING | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-11-08 | — | — | US | disclosed |
| US-4411980-A | EXPOSE TO IMAGES, APPLYING CONDUCTIVE METAL, HEATING, THEN ELECTROLESS PLATING OR SOLDERING METAL AREAS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-10-25 | — | — | US | disclosed |
| EP-0091693-A2 | Improved cover sheet in a photosensitive element | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-10-19 | — | — | EP | disclosed |
| EP-0089041-A1 | Use of a negative acting photopolymerizable element as a solder mask | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-09-21 | — | — | EP | disclosed |
| US-4405394-A | USING A THIN FILM INTERFACE BETWEEN THE CLEANED COPPER OR ALUMINUM SUBSTRATE AND PHOTOSENSITIVE FILM | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-09-20 | — | — | US | disclosed |
| US-4400459-A | Process for bromine surface treatment of photosensitive elastomeric flexographic printing plates | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-08-23 | — | — | US | disclosed |
| US-4400460-A | Process for surface treatment of flexographic printing plates containing butadiene/acrylonitrile copolymers | E. I. DU PONT DE NEMOURS AND COMPAMY (US) | 1983-08-23 | — | — | US | disclosed |
| EP-0076473-A1 | Aqueous developable photopolymer compositions containing terpolymer binder | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-04-13 | — | — | EP | disclosed |
| EP-0076028-A2 | Aqueous processible, alcohol resistant flexographic printing plates | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-04-06 | — | — | EP | disclosed |
| EP-0075299-A2 | Process for the preparation of flexible circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-03-30 | — | — | EP | disclosed |
| US-4378264-A | FOR A PHOTOSENSITIVE POLYMERIC COMPOSITION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-03-29 | — | — | US | disclosed |
| US-4369246-A | ETHYLENICALLY UNSATURATED COMPOUND | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-01-18 | — | — | US | disclosed |
| EP-0066870-A2 | Photoimaging compositions containing substituted cyclohexadienone compounds | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-12-15 | — | — | EP | disclosed |
| US-4361640-A | ADDITION-CONDENSATION COPOLYMER; PRINTING PLATES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-11-30 | — | — | US | disclosed |
| EP-0064564-A1 | Process for surface treatment of flexographic printing plates containing butadiene/acrylonitrile copolymers | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-11-17 | — | — | EP | disclosed |
| EP-0064565-A1 | Process for bromine surface treatment of photosensitive elastomeric flexographic printing plates | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-11-17 | — | — | EP | disclosed |
| EP-0058737-A1 | Flexographic printing plates containing blended adhesives | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-09-01 | — | — | EP | disclosed |
| US-4341860-A | A P-DI-OR TRICHLOROCYCLOHEXADIENONE OXIDIZER AND A LEUCO DYE OR UNSATURATED MONOMER; PHOTORESISTS; PHOTOPRINTOUT ELEMENTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-07-27 | — | — | US | disclosed |
| EP-0049504-A1 | Improved aqueous developable photopolymerizable elements | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-04-14 | — | — | EP | disclosed |
| US-4323636-A | THERMOPLASTIC AND ELASTOMERIC IN CONJUNCTION WITH AN ACRYLATE COMPOUND | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-04-06 | — | — | US | disclosed |
| US-4323637-A | THERMOPLASTIC ELASTOMERIC LAYER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-04-06 | — | — | US | disclosed |
| US-4308338-A | PRODUCTION OF WEAR-RESISTANT PRINTING PLATES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-12-29 | — | — | US | disclosed |
| EP-0041643-A2 | Self-trimming photosensitive layer | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-12-16 | — | — | EP | disclosed |
| EP-0041640-A2 | Photopolymerizable composition | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-12-16 | — | — | EP | disclosed |
| EP-0041639-A2 | Laminating process | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-12-16 | — | — | EP | disclosed |
| EP-0040843-A1 | Laminating process | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-12-02 | — | — | EP | disclosed |
| EP-0040842-A1 | Laminating process | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-12-02 | — | — | EP | disclosed |
| US-4293635-A | N-ALKYLACRYLAMIDE-UNSATURATED ACID-ACRYLATE INTERPOLYMER, AMPHOTERIC | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-10-06 | — | — | US | disclosed |
| US-4278752-A | SOLDERS, MASKING | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-07-14 | — | — | US | disclosed |
| US-4272608-A | CARBOXYLATED BUTADIENE-ACRYLONITRILE COPOLYMER, AN ETHYLENICALLY UNSATURATED COMPOUND, AND A FREE RADICAL GENERATING SYSTEM | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-06-09 | — | — | US | disclosed |
| US-4264708-A | COMPRISING AN EPOXY RESIN OR UNSATURATED DIESTER POLYHYDROXYPOLYETHER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-04-28 | — | — | US | disclosed |
| US-4257915-A | USE IN PHOTOPOLYMERIZATION OF ETHYLENICALLY UNSATURATED MONOMERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-03-24 | — | — | US | disclosed |
| US-4195997-A | COLD FLOW RESISTANCE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1980-04-01 | — | — | US | disclosed |
| US-4177074-A | HIGH AND LOW MOLECULAR WEIGHT POLYMERS CONTAINING CARBOXYL GROUPS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1979-12-04 | — | — | US | disclosed |
| US-4127436-A | PHOTORESIST | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1978-11-28 | — | — | US | disclosed |
| US-4071367-A | PRINTED CIRCUITS, GROOVES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1978-01-31 | — | — | US | disclosed |
| US-4054483-A | Additives process for producing plated holes in printed circuit elements | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-10-18 | — | — | US | disclosed |
| US-4054479-A | Additive process for producing printed circuit elements using a self-supported photosensitive sheet | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-10-18 | — | — | US | disclosed |
| US-3984244-A | Process for laminating a channeled photosensitive layer on an irregular surface | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1976-10-05 | — | — | US | disclosed |
| US-3984244-A | Process for laminating a channeled photosensitive layer on an irregular surface | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1976-10-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230180744-A1 | PROCESS AND SOLUTION FOR PREPARING A SURFACE WITH BACTERIOSTATIC AND BACTERICIDAL ACTIVITY, SURFACE THUS PREPARED AND USES THEREOF | PCNA, LPO, CUTA | TSHR 2602/4885THRB 3628/4885ALDH1A1 3216/4885 |
| US-20260044083-A1 | FLEXOGRAPHIC PRINTING MASK WITH LASER THERMAL IMAGING FILM | VCL, FSCN1, FLNA | TSHR 1449/4885THRB 2038/4885ALDH1A1 1115/4885 |
| US-11667609-B2 | Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product | H1-0, H1-10, RAD51 | TSHR 4534/4885THRB 3173/4885ALDH1A1 323/4885 |
| US-20220153698-A1 | NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, SELF-HEALING MATERIAL, SURFACE COATING AGENT, PAINT, ADHESIVE, MATERIAL FOR BATTERY AND CURED PRODUCT | H1-0, H1-10, RAD51 | TSHR 4592/4885THRB 3284/4885ALDH1A1 367/4885 |
| US-12635688-B2 | Process and solution for preparing a surface with bacteriostatic and bactericidal activity, surface thus prepared and uses thereof | LPO, C9, MSR1 | TSHR 543/4885THRB 1319/4885ALDH1A1 1274/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.