SCHEMBL347778

SCHEMBL347778

C=Cc1cc(C(F)(F)F)cc(C(F)(F)F)c1

nearest known ligand 0.52

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.41
RPS6KA3 P51812 1/20 0.39
JAK3 P52333 1/20 0.39
IDO1 P14902 3/20 0.37
TDO2 P48775 1/20 0.37
ALDH1A1 P00352 1/20 0.36
NFE2L2 Q16236 1/20 0.34
AHR P35869 1/20 0.33
PTGS1 P23219 1/20 0.33
ADRB1 P08588 1/20 0.33
FBP1 P09467 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20384786 0.89 GABRA1 (0.38) CES2RPS6KA3JAK3IDO1TDO2
SCHEMBL3582053 0.86 RXRA (0.33) CES2RPS6KA3JAK3IDO1TDO2
SCHEMBL27670568 0.86 RPS6KA3 (0.32) CES2RPS6KA3JAK3IDO1TDO2
SCHEMBL31736860 0.84 CES2 (0.34) CES2RPS6KA3JAK3ALDH1A1NFE2L2
SCHEMBL10316303 0.84 TP53 (0.42) CES2RPS6KA3JAK3NFE2L2
SCHEMBL22572970 0.84 TSHR (0.42) CES2RPS6KA3JAK3IDO1TDO2
SCHEMBL16951465 0.84 RPS6KA3 (0.31) CES2RPS6KA3JAK3NFE2L2
SCHEMBL1662267 0.84 NOTUM (0.40) CES2RPS6KA3JAK3IDO1TDO2
SCHEMBL13228707 0.84 AHR (0.48) CES2RPS6KA3JAK3ALDH1A1AHR
SCHEMBL15212933 0.81 IDO1 (0.38) CES2IDO1TDO2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 429 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119819370-A Preparation method of photocatalytic degradation material for treating acid chrome blue K sewage 北方工业大学 2025-04-15 CN claimed
CN-119331400-B Unsaturated polyester resin composite material and preparation method thereof 广东美亨新材料科技有限公司 2025-04-08 CN claimed
CN-119331400-A Unsaturated polyester resin composite material and preparation method thereof 广东美亨新材料科技有限公司 2025-01-21 CN claimed
CN-119265936-A Antibacterial linear stay rope material for tampons and preparation method thereof 优立美(湖北)科技有限公司 2025-01-07 CN claimed
CN-119220037-A Antistatic plastic and preparation method thereof 江西朝晖氟塑制品有限公司 2024-12-31 CN claimed
CN-119192629-A Oil shale semicoke-based weather-resistant low-cost mulching film and preparation method thereof 西北师范大学 2024-12-27 CN claimed
CN-118724934-A Mechanochemical synthesis of alpha-haloalkylboron esters 西安交通大学 2024-10-01 CN claimed
US-12057308-B2 Selective liquiphobic surface modification of substrates BREWER SCIENCE, INC. (US) 2024-08-06 US claimed
CN-117484984-A Multifunctional three-dimensional balanced thermal fabric 南通东屹高新纤维科技有限公司 2024-02-02 CN claimed
CN-116694256-A Special resin adhesive for vehicle-gauge-level power soft-package tab and preparation method thereof 浙江文壹先端新材料有限公司 2023-09-05 CN claimed
US-6872504-B2 High sensitivity X-ray photoresist MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2005-03-29 US claimed
US-6794109-B2 POLYMER CONTAINING A FLUORINATED STYRENE COPOLYMER MASSACHUSETTS INSTITUTE OF TECHNOLOGY 2004-09-21 US claimed
US-20040110091-A1 High sensitivity X-ray photoresist MASS INSTITUTE OF TECHNOLOGY (MIT) 2004-06-10 US claimed
EP-1397260-A1 POLYMERIC ANTIREFLECTIVE COATINGS DEPOSITED BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION Brewer Science, Inc. (US) 2004-03-17 EP claimed
US-20030219541-A1 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition BREWER SCIENCE, INC. 2003-11-27 US claimed
US-20030064608-A1 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition SABNIS RAM W (US) 2003-04-03 US claimed
US-20030054117-A1 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition BREWER SCIENCE, INC. 2003-03-20 US claimed
US-20020160297-A1 Low abosorbing resists for 157 nm lithography AIR FORCE, UNITED STATES 2002-10-31 US claimed
WO-2002069043-A2 LOW ABSORBING RESISTS FOR 157 NM LITHOGRAPHY MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2002-09-06 WO claimed
WO-2002062593-A1 POLYMERIC ANTIREFLECTIVE COATINGS DEPOSITED BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION BREWER SCIENCE, INC. (US) 2002-08-15 WO claimed