SCHEMBL347964

SCHEMBL347964

C=C(C)COCCOCCOCC(=C)C

nearest known ligand 0.35

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
HSD17B10 Q99714 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
THRB P10828 1/20 0.34
CES2 O00748 1/20 0.31
TSHR P16473 1/20 0.30
MAPK1 P28482 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29488236 1.00 MEN1 (0.35) MEN1KMT2AHSD17B10TDP1THRB
SCHEMBL631462 0.97 HSD17B10 (0.37) MEN1KMT2AHSD17B10TDP1THRB
SCHEMBL30054587 0.92 CES2 (0.37) MEN1KMT2AHSD17B10TDP1THRB
SCHEMBL8072378 0.89 MEN1 (0.55) MEN1KMT2ATHRBTSHRMAPK1
SCHEMBL22042688 0.89 THRB (0.30) THRB
SCHEMBL8536736 0.89 MEN1 (0.55) MEN1KMT2ATHRBTSHRMAPK1
SCHEMBL18843006 0.89 MEN1 (0.55) MEN1KMT2ATHRBTSHRMAPK1
SCHEMBL12541324 0.89 CA2 (0.32) THRB
SCHEMBL26927712 0.89 CA2 (0.32) THRB
SCHEMBL8076735 0.89 MEN1 (0.55) MEN1KMT2ATHRBTSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 478 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5225473-A For bioelectrodes MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1993-07-06 US claimed
US-5153284-A Suspension polymerization using dispersant which is mixture of partially saponified polyvinyl alcohol, cellulose ethers and crosslinked carboxylic polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 1992-10-06 US claimed
US-4536206-A CROSSLINKED HIGH MOLECULAR WEIGHT CARBOXYLIC CONTAINING POLYMER AND WATER, NONPHYTOTOXIC, NONTOXIC WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1985-08-20 US claimed
US-20250312966-A1 METHODS OF MAKING A DEFLECTION MEMBER PROCTER & GAMBLE (US) 2025-10-09 US disclosed
US-12365132-B2 Methods of making a deflection member THE PROCTER & GAMBLE COMPANY (US) 2025-07-22 US disclosed
US-20230398731-A1 METHODS OF MAKING A DEFLECTION MEMBER PROCTER & GAMBLE (US) 2023-12-14 US disclosed
US-11820071-B2 Methods of making a deflection member THE PROCTER & GAMBLE COMPANY (US) 2023-11-21 US disclosed
EP-3976878-B1 METHODS OF MAKING A DEFLECTION MEMBER PROCTER & GAMBLE (US) 2023-07-05 EP disclosed
US-20230166446-A1 METHODS OF MAKING A DEFLECTION MEMBER PROCTER & GAMBLE (US) 2023-06-01 US disclosed
US-11590694-B2 Methods of making a deflection member THE PROCTER & GAMBLE COMPANY (US) 2023-02-28 US disclosed
EP-3976878-A1 METHODS OF MAKING A DEFLECTION MEMBER The Procter & Gamble Company (US) 2022-04-06 EP disclosed
EP-0041643-A2 Self-trimming photosensitive layer E.I. DU PONT DE NEMOURS AND COMPANY (US) 1981-12-16 EP disclosed
EP-0041642-A2 Integrated laminating process E.I. DU PONT DE NEMOURS AND COMPANY (US) 1981-12-16 EP disclosed
EP-0041640-A2 Photopolymerizable composition E.I. DU PONT DE NEMOURS AND COMPANY (US) 1981-12-16 EP disclosed
EP-0040842-A1 Laminating process E.I. DU PONT DE NEMOURS AND COMPANY (US) 1981-12-02 EP disclosed
EP-0040843-A1 Laminating process E.I. DU PONT DE NEMOURS AND COMPANY (US) 1981-12-02 EP disclosed
US-4293635-A N-ALKYLACRYLAMIDE-UNSATURATED ACID-ACRYLATE INTERPOLYMER, AMPHOTERIC E. I. DU PONT DE NEMOURS AND COMPANY (US) 1981-10-06 US disclosed
US-4195997-A COLD FLOW RESISTANCE E. I. DU PONT DE NEMOURS AND COMPANY (US) 1980-04-01 US disclosed
US-4054483-A Additives process for producing plated holes in printed circuit elements E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-10-18 US disclosed
US-4054479-A Additive process for producing printed circuit elements using a self-supported photosensitive sheet E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-10-18 US disclosed