SCHEMBL3481642

SCHEMBL3481642

CCCC(C)CO[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27646946 0.95 TSHR (0.40)
SCHEMBL3481536 0.84
SCHEMBL3481658 0.82 OPRM1 (0.42)
SCHEMBL4971696 0.80 ACE2 (0.44)
SCHEMBL27646908 0.78 LMNA (0.33)
SCHEMBL27626705 0.77 LMNA (0.35)
SCHEMBL9679319 0.77 TSHR (0.48)
SCHEMBL2771811 0.77
SCHEMBL19643118 0.77 TSHR (0.48)
SCHEMBL1100183 0.77 TSHR (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118063991-A Medical magnesium alloy surface antibacterial corrosion-resistant coating and preparation method thereof 金陵科技学院 2024-05-24 CN disclosed
US-10995249-B2 Tire with reduced cavity noise HANKOOK TIRE CO., LTD. 2021-05-04 US disclosed
US-10947430-B2 Tire with reduced cavity noise HANKOOK TIRE CO., LTD. 2021-03-16 US disclosed
EP-3321108-B1 TIRE WITH REDUCED CAVITY NOISE HANKOOK TIRE CO LTD (KR) 2019-05-15 EP disclosed
US-20180282600-A1 TIRE WITH REDUCED CAVITY NOISE HANKOOK TIRE CO., LTD. (KR) 2018-10-04 US disclosed
EP-3381712-A1 TIRE WITH REDUCED CAVITY NOISE Hankook Tire Co., Ltd. (KR) 2018-10-03 EP disclosed
US-20180134933-A1 TIRE WITH REDUCED CAVITY NOISE HANKOOK TIRE CO., LTD. (KR) 2018-05-17 US disclosed
EP-3321108-A1 TIRE WITH REDUCED CAVITY NOISE Hankook Tire Co., Ltd. (KR) 2018-05-16 EP disclosed
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
CN-101104579-B Preparation method of 2-ramification of methyl diol in optical purity SHANGHAI INST ORGANIC CHEM 2011-06-15 CN disclosed
CN-101104577-B Preparation method of 2-ramification of methyl diol in optical purity SHANGHAI INST ORGANIC CHEM 2011-06-15 CN disclosed
US-20100007031-A1 AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2010-01-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed
CN-101104577-A Optically pure methyl halogenated alkyl alcohol derivative SHANGHAI INST ORGANIC CHEM (CN) 2008-01-16 CN disclosed
CN-101104578-A Optically pure sulfur-containing methyl alkyl alcohol compound SHANGHAI INST ORGANIC CHEM (CN) 2008-01-16 CN disclosed
CN-101104579-A Optically pure carbonyl substituted alkyl alcohol derivative SHANGHAI INST ORGANIC CHEM (CN) 2008-01-16 CN disclosed
CN-100354319-C Hydrogenation catalyst composition and method for hydrogenating conjugate diene polymer TAIWAN RUBBER CO LTD (CN) 2007-12-12 CN disclosed
CN-1781955-A Hydrogenation catalyst composition and method for hydrogenating conjugate diene polymer TAIWAN RUBBER CO LTD (CN) 2006-06-07 CN disclosed
CN-1660741-A Optically pure 2-methyl alkyl diol derivative SHANGHAI INST ORGANIC CHEM (CN) 2005-08-31 CN disclosed