SCHEMBL3481792

SCHEMBL3481792

C[Si](C)(O)CCCN1CCOCC1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KEAP1 Q14145 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
HPGD P15428 1/20 0.52
DUSP3 P51452 1/20 0.52
ALDH1A1 P00352 3/20 0.47
KDM4E B2RXH2 2/20 0.47
GAA P10253 1/20 0.46
LMNA P02545 3/20 0.45
MAPK1 P28482 3/20 0.42
PAOX Q6QHF9 1/20 0.42
HIF1A Q16665 1/20 0.42
GLA P06280 1/20 0.42
SIGMAR1 Q99720 2/20 0.42
CYP1A2 P05177 1/20 0.42
CHRM2 P08172 1/20 0.42
CHRM1 P11229 1/20 0.42
HTR2A P28223 1/20 0.42
SCN1A P35498 1/20 0.42
HTR2B P41595 1/20 0.42
KCNH2 Q12809 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31550574 0.88 KEAP1 (0.52) KEAP1SMN1; SMN2HPGDDUSP3ALDH1A1
SCHEMBL26668773 0.85 KEAP1 (0.54) KEAP1SMN1; SMN2HPGDDUSP3ALDH1A1
SCHEMBL13532385 0.83 KEAP1 (0.56) KEAP1SMN1; SMN2HPGDDUSP3ALDH1A1
SCHEMBL26668776 0.83 HRH3 (0.48) SMN1; SMN2ALDH1A1LMNAMAPK1HIF1A
SCHEMBL26668766 0.81 HRH3 (0.52) SMN1; SMN2ALDH1A1LMNAMAPK1HIF1A
SCHEMBL3481711 0.79 KEAP1 (0.52) KEAP1SMN1; SMN2HPGDDUSP3ALDH1A1
SCHEMBL9520262 0.79 KEAP1 (0.52) KEAP1SMN1; SMN2HPGDDUSP3ALDH1A1
SCHEMBL11647717 0.79 KEAP1 (0.52) KEAP1SMN1; SMN2HPGDDUSP3ALDH1A1
SCHEMBL26668763 0.78 CXCR4 (0.47) SMN1; SMN2ALDH1A1KDM4ESIGMAR1CHRM2
SCHEMBL29113359 0.78 KEAP1 (0.50) KEAP1SMN1; SMN2HPGDDUSP3ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250313752-A1 METHOD FOR PRODUCING AQUEOUS SOLUTION OF PURIFIED AMINOSILANOL COMPOUND AND AMINOSILOXANE COMPOUND, AND COMPOSITION FOR ETCHING SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-10-09 US disclosed
EP-4527841-A1 METHOD FOR PRODUCING AQUEOUS SOLUTION OF PURIFIED AMINOSILANOL COMPOUND AND AMINOSILOXANE COMPOUND, AND COMPOSITION FOR ETCHING SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-03-26 EP disclosed
WO-2023223803-A1 METHOD FOR PRODUCING AQUEOUS SOLUTION OF PURIFIED AMINOSILANOL COMPOUND AND AMINOSILOXANE COMPOUND, AND COMPOSITION FOR ETCHING 信越化学工業株式会社 2023-11-23 WO disclosed
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
US-20100007031-A1 AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2010-01-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed
US-4067828-A Formation of high-resilience urethane foam in the presence of morpholino-bearing polyalkylsiloxanes UNION CARBIDE CORPORATION (US) 1978-01-10 US disclosed
US-4018723-A Morpholino-modified polysiloxane-polyoxyalkylene copolymers and their use as foam stabilizers in polyurethanes UNION CARBIDE CORPORATION (US) 1977-04-19 US disclosed
US-4016163-A SURFACTANTS UNION CARBIDE CORPORATION (US) 1977-04-05 US disclosed