Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 2/20 | 0.47 |
| ▸ | TDO2 | P48775 | 2/20 | 0.47 |
| ▸ | F2 | P00734 | 1/20 | 0.44 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.44 |
| ▸ | ACP3 | P15309 | 1/20 | 0.44 |
| ▸ | KCNH2 | Q12809 | 3/20 | 0.43 |
| ▸ | SLC6A4 | P31645 | 3/20 | 0.40 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.40 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.40 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.40 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.38 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.38 |
| ▸ | CASP1 | P29466 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | ANPEP | P15144 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3482608 | 0.88 | SMN1; SMN2 (0.41) | IDO1TDO2F2PRSS1ALDH1A1 | |
| SCHEMBL28902075 | 0.83 | IDO1 (0.50) | IDO1TDO2F2PRSS1ACP3 | |
| SCHEMBL7796542 | 0.80 | IDO1 (0.47) | IDO1TDO2F2PRSS1ACP3 | |
| SCHEMBL7707362 | 0.80 | IDO1 (0.47) | IDO1TDO2F2PRSS1ACP3 | |
| SCHEMBL1520876 | 0.80 | IDO1 (0.69) | IDO1TDO2F2PRSS1ACP3 | |
| SCHEMBL3950653 | 0.80 | IDO1 (0.47) | IDO1TDO2F2PRSS1ACP3 | |
| SCHEMBL675684 | 0.79 | SLC6A2 (0.44) | ACP3KCNH2SLC6A4SLC6A2SLC6A3 | |
| Hydrochloric Acid SCHEMBL14686349 | 0.78 | IDO1 (0.71) | IDO1TDO2F2PRSS1ACP3 | |
| SCHEMBL705168 | 0.78 | AOC3 (0.42) | KCNH2SLC6A4SLC6A2SLC6A3CYP3A4 | |
| SCHEMBL715339 | 0.76 | POLB (0.41) | KCNH2SLC6A4SLC6A2SLC6A3CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11807758-B2 | Siloxane polymer and method of producing siloxane polymer | JNC CORPORATION (JP) | 2023-11-07 | — | — | US | disclosed |
| EP-4056604-B1 | METHOD FOR PRODUCING COPOLYMER OF 1,3,7-OCTATRIENE AND STYRENE | KURARAY CO (JP) | 2023-08-02 | — | — | EP | disclosed |
| EP-3564280-B1 | COPOLYMER OF 1, 3, 7-OCTATRIENE AND STYRENE AND HYDRIDE THEREOF | KURARAY CO (JP) | 2023-07-26 | — | — | EP | disclosed |
| EP-4163312-A1 | COPOLYMER OF 1,3,7-OCTATRIENE AND ISOPRENE, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID COPOLYMER | Kuraray Co., Ltd. (JP) | 2023-04-12 | — | — | EP | disclosed |
| EP-4163311-A1 | COPOLYMER OF 1,3,7-OCTATRIENE AND ISOPRENE, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID COPOLYMER | Kuraray Co., Ltd. (JP) | 2023-04-12 | — | — | EP | disclosed |
| EP-3564274-B1 | 1, 3, 7-OCTATRIENE POLYMER, HYDRIDE THEREOF, AND METHOD FOR PRODUCING SAID POLYMER | KURARAY CO (JP) | 2022-12-28 | — | — | EP | disclosed |
| EP-4056604-A1 | METHOD FOR PRODUCING COPOLYMER OF 1,3,7-OCTATRIENE AND STYRENE | Kuraray Co., Ltd. (JP) | 2022-09-14 | — | — | EP | disclosed |
| US-11332567-B2 | Copolymer of 1, 3, 7-octatriene and butadiene, hydride thereof, and method for producing said copolymer | KURARAY CO., LTD. (JP) | 2022-05-17 | — | — | US | disclosed |
| US-11198744-B2 | 1,3, 7-octatriene polymer, hydride thereof, and method for producing said polymer | KURARAY CO., LTD. (JP) | 2021-12-14 | — | — | US | disclosed |
| US-11091578-B2 | Copolymer of 1,3,7-octatriene and isoprene, hydride thereof, and method for producing said copolymer | KURARAY CO., LTD. (JP) | 2021-08-17 | — | — | US | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20130331520-A1 | STABILIZATION OF POLYMERS THAT CONTAIN A HYDROLYZABLE FUNCTIONALITY | BRIDGESTONE CORPORATION (JP) | 2013-12-12 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-6930393-B2 | hydrolyzable silicon compound or at least one product resulting from at least partial hydrolysis condensation of the silicon compound | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2005-08-16 | — | — | US | disclosed |
| CN-1536023-A | Porous membrane shaping composition, preparation method of porous membrane, porous membrane intercalation insulating film and semiconductor device | ��Խ��ѧ��ҵ��ʽ���� | 2004-10-13 | — | — | CN | disclosed |
| US-20040195660-A1 | Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. | 2004-10-07 | — | — | US | disclosed |
| EP-0478284-B1 | Organic silicon compounds and cosmetic compositions | SHINETSU CHEMICAL CO (JP) | 1995-12-06 | — | — | EP | disclosed |
| US-5254542-A | Having ultraviolet absorbing benzotriazole or benzophenone group | SHIN-ETSU CHEMICAL CO., LTD. | 1993-10-19 | — | — | US | disclosed |
| EP-0478284-A2 | Organic silicon compounds and cosmetic compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1992-04-01 | — | — | EP | disclosed |