Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LPAR3 | Q9UBY5 | 4/20 | 0.42 |
| ▸ | LPAR2 | Q9HBW0 | 3/20 | 0.42 |
| ▸ | LPAR1 | Q92633 | 2/20 | 0.42 |
| ▸ | GGPS1 | O95749 | 1/20 | 0.35 |
| ▸ | FAAH | O00519 | 3/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | PLA2G4A | P47712 | 1/20 | 0.35 |
| ▸ | PAFAH1B2 | P68402 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | MGLL | Q99685 | 1/20 | 0.35 |
| ▸ | ABHD6 | Q9BV23 | 1/20 | 0.35 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.34 |
| ▸ | F7 | P08709 | 1/20 | 0.34 |
| ▸ | F3 | P13726 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3482633 | 0.85 | LPAR3 (0.40) | LPAR3LPAR2LPAR1GGPS1FAAH | |
| SCHEMBL707827 | 0.82 | — | — | |
| SCHEMBL3481785 | 0.80 | LPAR3 (0.37) | LPAR3LPAR2LPAR1FAAHALDH1A1 | |
| SCHEMBL3482219 | 0.78 | LPAR3 (0.40) | LPAR3LPAR2LPAR1GGPS1FAAH | |
| SCHEMBL28026814 | 0.78 | THRB (0.40) | LPAR3LPAR2LPAR1MEN1MAPT | |
| SCHEMBL28026817 | 0.78 | THRB (0.40) | LPAR3LPAR2LPAR1MEN1MAPT | |
| SCHEMBL15846759 | 0.78 | THRB (0.40) | LPAR3LPAR2LPAR1MEN1MAPT | |
| SCHEMBL28026816 | 0.78 | THRB (0.40) | LPAR3LPAR2LPAR1MEN1MAPT | |
| SCHEMBL28027340 | 0.78 | THRB (0.40) | LPAR3LPAR2LPAR1MEN1MAPT | |
| SCHEMBL3482732 | 0.78 | LPAR3 (0.33) | LPAR3LPAR2LPAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |