Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.37 |
| ▸ | SMPD1 | P17405 | 3/20 | 0.36 |
| ▸ | GPR84 | Q9NQS5 | 3/20 | 0.35 |
| ▸ | FDPS | P14324 | 3/20 | 0.35 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.35 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9009710 | 1.00 | LMNA (0.39) | LMNADNM1TSHRTHRBOPRM1 | |
| SCHEMBL8139611 | 1.00 | LMNA (0.39) | LMNADNM1TSHRTHRBOPRM1 | |
| SCHEMBL15846760 | 1.00 | LMNA (0.39) | LMNADNM1TSHRTHRBOPRM1 | |
| SCHEMBL27646907 | 1.00 | LMNA (0.39) | LMNADNM1TSHRTHRBOPRM1 | |
| SCHEMBL2770018 | 0.98 | OPRM1 (0.39) | LMNADNM1TSHRTHRBOPRM1 | |
| SCHEMBL7056921 | 0.90 | LMNA (0.42) | LMNADNM1TSHRTHRBOPRM1 | |
| SCHEMBL4766710 | 0.90 | LMNA (0.42) | LMNADNM1TSHRTHRBOPRM1 | |
| SCHEMBL6057209 | 0.90 | LMNA (0.42) | LMNADNM1TSHRTHRBOPRM1 | |
| SCHEMBL11207866 | 0.90 | LMNA (0.42) | LMNADNM1TSHRTHRBOPRM1 | |
| SCHEMBL3796584 | 0.90 | LMNA (0.42) | LMNADNM1TSHRTHRBOPRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |