Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PCSK9 | Q8NBP7 | 1/20 | 0.37 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.36 |
| ▸ | NAAA | Q02083 | 1/20 | 0.36 |
| ▸ | AR | P10275 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | CES2 | O00748 | 2/20 | 0.35 |
| ▸ | CES1 | P23141 | 2/20 | 0.35 |
| ▸ | HTT | P42858 | 2/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 3/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3481615 | 0.88 | ESR1 (0.34) | PCSK9PTGS2NAAACES2CES1 | |
| SCHEMBL3482551 | 0.79 | PCSK9 (0.39) | PCSK9PTGS2NAAAARTSHR | |
| SCHEMBL273784 | 0.79 | PCSK9 (0.39) | PCSK9PTGS2NAAAARTSHR | |
| SCHEMBL272398 | 0.79 | PCSK9 (0.39) | PCSK9PTGS2NAAAARTSHR | |
| SCHEMBL271811 | 0.78 | NR1H2 (0.39) | PCSK9PTGS2NAAAARTSHR | |
| SCHEMBL27827259 | 0.77 | PCSK9 (0.35) | PCSK9PTGS2NAAAARTSHR | |
| SCHEMBL3481932 | 0.76 | PCSK9 (0.37) | PCSK9PTGS2NAAAARTSHR | |
| SCHEMBL273717 | 0.76 | PCSK9 (0.37) | PCSK9PTGS2NAAAARTSHR | |
| SCHEMBL121702 | 0.75 | SMN1; SMN2 (0.37) | PCSK9PTGS2NAAAARTSHR | |
| SCHEMBL3886636 | 0.74 | TSHR (0.38) | PCSK9PTGS2NAAAARTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |