⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8638315 | 0.83 | — | — | |
| SCHEMBL16301269 | 0.76 | ACHE (0.61) | — | |
| SCHEMBL208822 | 0.76 | ACHE (0.61) | — | |
| SCHEMBL277305 | 0.73 | ACHE (0.57) | — | |
| Hydrochloric Acid SCHEMBL28008993 | 0.73 | ACHE (0.57) | — | |
| P-Xylene SCHEMBL14874707 | 0.72 | ACHE (0.67) | — | |
| P-Xylene SCHEMBL6272681 | 0.71 | ACHE (0.80) | — | |
| P-Xylene SCHEMBL9720651 | 0.71 | ACHE (0.80) | — | |
| P-Xylene SCHEMBL28696945 | 0.71 | ACHE (0.80) | — | |
| P-Xylene SCHEMBL28540852 | 0.71 | ACHE (0.80) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113544184-B | Composition for film formation, cured film, liquid crystal alignment film, and retardation film | JSR株式会社 | 2024-05-14 | — | — | CN | disclosed |
| CN-115557983-A | Organic silanol compound containing S-S bond and preparation method thereof | 苏州照固新材料科技有限公司 | 2023-01-03 | — | — | CN | disclosed |
| CN-113544184-A | Composition for film formation, cured film, and retardation film | JSR株式会社 | 2021-10-22 | — | — | CN | disclosed |
| CN-106324911-B | Viewing angle compensation film, manufacturing method and application thereof | JSR株式会社 | 2021-03-30 | — | — | CN | disclosed |
| CN-112540423-A | Circularly polarizing plate, method for producing same, composition for forming resin layer, and display device | JSR株式会社 | 2021-03-23 | — | — | CN | disclosed |
| CN-104845642-B | Liquid crystal aligning agent, liquid crystal alignment film, liquid crystal display element, phase difference film and method for producing same, polymer and compound | JSR株式会社 | 2020-11-24 | — | — | CN | disclosed |
| CN-111830749-A | Laminate and method for producing same, method for forming optical film layer, polarizing film and method for producing same, and method for producing liquid crystal display element | JSR株式会社 | 2020-10-27 | — | — | CN | disclosed |
| CN-111812763-A | Laminate and method for producing same, method for forming optical film, polarizing film and method for producing same, circularly polarizing plate, and method for producing liquid crystal display element | JSR株式会社 | 2020-10-23 | — | — | CN | disclosed |
| WO-2020208884-A1 | FILM-FORMING COMPOSITION, CURED FILM, AND RETARDATION FILM | JSR株式会社 | 2020-10-15 | — | — | WO | disclosed |
| CN-108139532-B | Composition for photo-alignment film, optical laminate, and image display device | 富士胶片株式会社 | 2020-06-16 | — | — | CN | disclosed |
| CN-103834415-A | Liquid crystal aligning agent, phase difference film and manufacturing method for the phase difference film | JSR CORP | 2014-06-04 | — | — | CN | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| CN-103509562-A | Liquid crystal aligning agent, liquid crystal alignment film, phase difference film, method for forming phase difference film, liquid crystal display device, and polymer | JSR CORP | 2014-01-15 | — | — | CN | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-7402688-B2 | 2,2-Di-substituted 1alpha,25-dihydroxy-19-norvitamin D derivative | WISCONSIN ALUMNI RESEARCH FOUNDATION (US) | 2008-07-22 | — | — | US | disclosed |
| US-20060160779-A1 | 2,2-Di-substituted 1alpha,25-dihydroxy-19-norvitamin d derivative | WISCONSIN ALUMNI RESEARCH FOUNDATION | 2006-07-20 | — | — | US | disclosed |
| EP-1559708-A1 | 2,2-DI-SUBSTITUTED 1a,25-DIHYDROXY-19-NORVITAMIN D DERIVATIVE | Shimizu, Masato (JP) | 2005-08-03 | — | — | EP | disclosed |
| EP-0817764-A1 | PREPARATION OF CIS-4-O-PROTECTED-2-CYCLOPENTENOL DERIVATIVES | HOECHST MARION ROUSSEL, INC. (US) | 1998-01-14 | — | — | EP | disclosed |
| WO-1996030320-A1 | PREPARATION OF CIS-4-O-PROTECTED-2-CYCLOPENTENOL DERIVATIVES | HOECHST MARION ROUSSEL, INC. (US) | 1996-10-03 | — | — | WO | disclosed |