⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8139609 | 0.90 | TSHR (0.40) | — | |
| SCHEMBL27249005 | 0.90 | TSHR (0.40) | — | |
| SCHEMBL27585951 | 0.90 | TSHR (0.40) | — | |
| SCHEMBL12898516 | 0.88 | — | — | |
| SCHEMBL2769579 | 0.82 | — | — | |
| SCHEMBL10308294 | 0.82 | — | — | |
| SCHEMBL20134677 | 0.81 | ADRB2 (0.38) | — | |
| SCHEMBL3482206 | 0.81 | ADRB2 (0.32) | — | |
| Ammonia Solution, Strong SCHEMBL28118142 | 0.80 | — | — | |
| Water SCHEMBL28106022 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4018015-A1 | MONOALKOXYSILANES AND DIALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM | Versum Materials US, LLC (US) | 2022-06-29 | — | — | EP | claimed |
| CN-114556527-A | Monoalkoxysilanes and dialkoxysilanes and dense organosilica films prepared therefrom | 弗萨姆材料美国有限责任公司 | 2022-05-27 | — | — | CN | claimed |
| WO-2021050798-A1 | MONOALKOXYSILANES AND DIALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM | VERSUM MATERIALS US, LLC (US) | 2021-03-18 | — | — | WO | claimed |
| EP-3315319-B1 | TIRE WITH REDUCED CAVITY NOISE | HANKOOK TIRE CO LTD (KR) | 2020-06-24 | — | — | EP | claimed |
| CN-107972418-A | Cavity Noise reduction tire | 韩国轮胎株式会社 | 2018-05-01 | — | — | CN | claimed |
| CN-108068561-A | Cavity Noise reduction tire | 韩国轮胎株式会社 | 2018-05-25 | — | — | CN | disclosed |
| CN-107972418-A | Cavity Noise reduction tire | 韩国轮胎株式会社 | 2018-05-01 | — | — | CN | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| CN-1102600-C | Propylene-ethylene random copolymer, process for producing the same and film thereof | SUMITOMO CHEMICAL CO (JP) | 2003-03-05 | — | — | CN | disclosed |
| CN-1159454-A | Propylene-ethylene random copolymer, process for producing the same and film thereof | SUMITOMO CHEMICAL CO (JP) | 1997-09-17 | — | — | CN | disclosed |