⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2310735 | 0.86 | CTSK (0.33) | — | |
| SCHEMBL28501155 | 0.82 | OPRM1 (0.38) | — | |
| SCHEMBL29197496 | 0.82 | OPRM1 (0.38) | — | |
| SCHEMBL29197394 | 0.82 | OPRM1 (0.38) | — | |
| SCHEMBL29197374 | 0.82 | OPRM1 (0.38) | — | |
| SCHEMBL10632090 | 0.79 | TSHR (0.32) | — | |
| SCHEMBL325595 | 0.79 | TSHR (0.32) | — | |
| SCHEMBL119152 | 0.79 | — | — | |
| SCHEMBL8846541 | 0.77 | TSHR (0.36) | — | |
| SCHEMBL27028345 | 0.77 | TSHR (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118426260-A | Photosensitive coloring composition, film, color filter, solid-state imaging element, and image display device | 爱天思株式会社 | 2024-08-02 | — | — | CN | disclosed |
| CN-117941156-A | Binder for nonaqueous secondary battery separator, resin composition for nonaqueous secondary battery separator, nonaqueous secondary battery, power storage device, binder for use in same, aqueous dispersion, resin composition, separator, and method for producing binder | 爱天思株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-112888657-B | Ketone-based solvent-dispersed silica sol and resin composition | 日产化学株式会社 | 2022-05-03 | — | — | CN | disclosed |
| WO-2021215106-A1 | POLYORGANOSILSESQUIOXANE, MULTILAYER BODY AND SURFACE-COATED MOLDED BODY | 株式会社ダイセル (JP) | 2021-10-28 | — | — | WO | disclosed |
| CN-112888657-A | Ketone-based solvent-dispersed silica sol and resin composition | 日产化学株式会社 | 2021-06-01 | — | — | CN | disclosed |
| EP-2150571-B1 | POLYALKYLSILSESQUIOXANE PARTICULATES AND A PREPARATION METHOD THEREOF | KOLON INC (KR) | 2017-11-08 | — | — | EP | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8748552-B2 | Polyalkylsilsesquioxane particulates and a preparation method thereof | KOLON INDUSTRIES, INC. (KR) | 2014-06-10 | — | — | US | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| CN-101679639-B | Polyalkylsilsesquioxane particulates and a preparation method thereof | KOLON INC | 2012-10-17 | — | — | CN | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| WO-2008147072-A1 | POLYALKYLSILSESQUIOXANE PARTICULATES AND A PREPARATION METHOD THEREOF | KOLON INDUSTRIES, INC. (KR) | 2008-12-04 | — | — | WO | disclosed |
| CN-100354319-C | Hydrogenation catalyst composition and method for hydrogenating conjugate diene polymer | TAIWAN RUBBER CO LTD (CN) | 2007-12-12 | — | — | CN | disclosed |
| CN-1781955-A | Hydrogenation catalyst composition and method for hydrogenating conjugate diene polymer | TAIWAN RUBBER CO LTD (CN) | 2006-06-07 | — | — | CN | disclosed |
| CN-1068038-C | Refrigeration lubricant composition and refrigerating system | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2001-07-04 | — | — | CN | disclosed |
| EP-0700951-B1 | Polyorganosiloxane and process for producing the same | SHOWA DENKO KK (JP) | 2000-12-27 | — | — | EP | disclosed |
| CN-1168915-A | Refrigeration lubricant composition and refrigerating system | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 1997-12-31 | — | — | CN | disclosed |
| US-5622784-A | WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM | SEIKO EPSON CORPORATION (JP) | 1997-04-22 | — | — | US | disclosed |
| EP-0700951-A1 | Polyorganosiloxane and process for producing the same | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1996-03-13 | — | — | EP | disclosed |
| US-5491203-A | COMPRISES POLYSILSESQUIOXANE STRUCTURE; HAS METHYL GROUP AND A REACTIVE GROUP ON SIDE CHAINS; SUITABLE AS POLYMER MODIFIER; CROSSLINKING; COATINGS | SHOWA DENKO K. K. (JP) | 1996-02-13 | — | — | US | disclosed |