⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL276455 | 0.69 | PIK3CD (0.35) | — | |
| SCHEMBL4579169 | 0.67 | — | — | |
| SCHEMBL178547 | 0.67 | — | — | |
| SCHEMBL2921685 | 0.64 | — | — | |
| SCHEMBL3184787 | 0.64 | — | — | |
| SCHEMBL104118 | 0.64 | PIK3CD (0.32) | — | |
| SCHEMBL458834 | 0.64 | — | — | |
| SCHEMBL1779618 | 0.64 | — | — | |
| SCHEMBL22388730 | 0.64 | — | — | |
| SCHEMBL28382008 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080090985-A1 | PROCESS FOR PRODUCING CONTROLLED VISCOSITY FLUOROSILICONE POLYMERS | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-04-17 | — | — | US | claimed |
| US-20080090987-A1 | PROCESS FOR PRODUCING CONTROLLED VISCOSITY FLUOROSILICONE POLYMERS | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-04-17 | — | — | US | claimed |
| CN-114316100-B | Boron trifluoride modified silica gel, preparation method and application thereof, supported catalyst, preparation method and application thereof | 岳阳兴长石化股份有限公司 | 2023-11-03 | — | — | CN | disclosed |
| CN-101087766-B | Pyridazine compounds, compositions, and methods | UNIV NORTHWESTERN | 2011-09-07 | — | — | CN | disclosed |
| US-7671161-B2 | Process for producing controlled viscosity fluorosilicone polymers | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2010-03-02 | — | — | US | disclosed |
| US-7361722-B2 | Methods of making high fluorine content fluoro-silicone copolymers | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2008-04-22 | — | — | US | disclosed |
| US-20080090985-A1 | PROCESS FOR PRODUCING CONTROLLED VISCOSITY FLUOROSILICONE POLYMERS | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-04-17 | — | — | US | disclosed |
| US-20080090987-A1 | PROCESS FOR PRODUCING CONTROLLED VISCOSITY FLUOROSILICONE POLYMERS | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-04-17 | — | — | US | disclosed |
| CN-101087766-A | Pyridazine compounds, compositions, and methods | UNIV NORTHWESTERN (US) | 2007-12-12 | — | — | CN | disclosed |
| WO-2007002072-A1 | FLUORO-SILICONE COPOLYMERS | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2007-01-04 | — | — | WO | disclosed |
| WO-2007002767-A1 | METHODS OF MAKING HIGH FLUORINE CONTENT FLUORO-SILICONE COPOLYMERS | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2007-01-04 | — | — | WO | disclosed |
| US-20060293483-A1 | Fluoro-silicone copolymers | GENERAL ELECTRIC CO,MPMANY | 2006-12-28 | — | — | US | disclosed |
| US-20060293479-A1 | Methods of making high fluorine content fluoro-silicone copolymers | GENERAL ELECTRIC COMPANY | 2006-12-28 | — | — | US | disclosed |
| US-20050181607-A1 | Method of manufacturing a semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-08-18 | — | — | US | disclosed |
| US-6909156-B2 | Semiconductor device and manufacturing method therefor | ABUSHIKI KAISHA TOSHIBA (JP) | 2005-06-21 | — | — | US | disclosed |
| US-20040188778-A1 | Semiconductor device and manufacturing method therefor | SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) | 2004-09-30 | — | — | US | disclosed |