⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26624 | 0.89 | — | — | |
| Arsenic SCHEMBL9006140 | 0.80 | — | — | |
| SCHEMBL31165841 | 0.80 | — | — | |
| SCHEMBL2933743 | 0.80 | — | — | |
| SCHEMBL7219017 | 0.68 | — | — | |
| SCHEMBL9941130 | 0.68 | — | — | |
| Tetramethylammonium Ion SCHEMBL1520826 | 0.60 | — | — | |
| Tetramethylammonium Ion SCHEMBL22436611 | 0.60 | CHRNB2 (0.80) | — | |
| SCHEMBL7624316 | 0.55 | — | — | |
| Ethane SCHEMBL174047 | 0.52 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106159047-B | Light emitting diode epitaxial structure with PN doped quantum barrier and preparation method thereof | 华南理工大学 | 2020-02-18 | — | — | CN | claimed |
| CN-106356433-A | Light-emitting diode structure with component and thickness gradient stress release layer and preparation method of light-emitting diode structure | 华南理工大学 | 2017-01-25 | — | — | CN | claimed |
| CN-106159047-A | There is the light emitting diode epitaxial structure at PN doping quantum base and preparation method thereof | 华南理工大学 | 2016-11-23 | — | — | CN | claimed |
| CN-104979445-A | Light-emitting diode structure with indium-containing conductive layer and preparation method therefor | UNIV SOUTH CHINA TECH | 2015-10-14 | — | — | CN | claimed |
| US-20210166913-A1 | APPARATUS AND METHOD FOR FILM FORMATION | GALLIUM ENTERPRISES PTY LTD (AU) | 2021-06-03 | — | — | US | disclosed |
| CN-106159047-B | Light emitting diode epitaxial structure with PN doped quantum barrier and preparation method thereof | 华南理工大学 | 2020-02-18 | — | — | CN | disclosed |
| CN-208135100-U | The collection device of trimethyl gallium | 江苏南大光电材料股份有限公司 | 2018-11-23 | — | — | CN | disclosed |
| EP-2872668-B1 | APPARATUS AND METHOD FOR FILM FORMATION | GALLIUM ENTPR PTY LTD (AU) | 2018-09-19 | — | — | EP | disclosed |
| CN-108408261-A | The collection device and its method of trimethyl gallium | 江苏南大光电材料股份有限公司 | 2018-08-17 | — | — | CN | disclosed |
| CN-206225396-U | A kind of light emitting diode construction with gradient composition and thickness stress release layer | 华南理工大学 | 2017-06-06 | — | — | CN | disclosed |
| CN-205985066-U | Emitting diode epitaxial structure with little PN junction quantum is built | 华南理工大学 | 2017-02-22 | — | — | CN | disclosed |
| CN-106356433-A | Light-emitting diode structure with component and thickness gradient stress release layer and preparation method of light-emitting diode structure | 华南理工大学 | 2017-01-25 | — | — | CN | disclosed |
| US-7824628-B2 | Self-regenerative process for contaminant removal from ammonia | ENTEGRIS, INC. (US) | 2010-11-02 | — | — | US | disclosed |
| EP-1654192-B1 | METHOD FOR THE POINT OF USE PRODUCTION OF AMMONIA FROM WATER AND NITROGEN | ENTEGRIS INC (US) | 2006-11-02 | — | — | EP | disclosed |
| US-20060243585-A1 | Method for the point of use production of ammonia from water and nitrogen | JEFFREY J. SPIEGELMAN AND DANIEL ALVAREZ, JR | 2006-11-02 | — | — | US | disclosed |
| EP-1654192-A1 | METHOD FOR THE POINT OF USE PRODUCTION OF AMMONIA FROM WATER AND NITROGEN | Entegris, Inc. (US) | 2006-05-10 | — | — | EP | disclosed |
| WO-2005009894-A1 | METHOD FOR THE POINT OF USE PRODUCTION OF AMMONIA FROM WATER AND NITROGEN | ENTEGRIS INC. (US) | 2005-02-03 | — | — | WO | disclosed |
| US-20050019244-A1 | Method for the point of use production of ammonia from water and nitrogen | ENTEGRIS, INC. | 2005-01-27 | — | — | US | disclosed |
| US-6524544-B1 | Contacting contaminated fluid ammonia with adsorbent in vessel to transfer contaminants from ammonia to adsorbent, regenerating adsorbent by contacting with gaseous hydrogen and nitrogen formed by decomposing portion of purified ammonia | AERONEX, INC. | 2003-02-25 | — | — | US | disclosed |
| US-20020128148-A1 | Self-regenerative process for contaminant removal from ammonia | TRUIST BANK, AS NOTES COLLATERAL AGENT | 2002-09-12 | — | — | US | disclosed |