Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC1 | Q13547 | 1/20 | 0.62 |
| ▸ | FASN | P49327 | 1/20 | 0.61 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.60 |
| ▸ | MEN1 | O00255 | 2/20 | 0.60 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.60 |
| ▸ | MAPT | P10636 | 2/20 | 0.60 |
| ▸ | HPGD | P15428 | 2/20 | 0.60 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.60 |
| ▸ | RECQL | P46063 | 2/20 | 0.60 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.60 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.60 |
| ▸ | USP2 | O75604 | 1/20 | 0.51 |
| ▸ | GAA | P10253 | 1/20 | 0.51 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.51 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.51 |
| ▸ | HSD17B1 | P14061 | 4/20 | 0.50 |
| ▸ | HSD17B2 | P37059 | 4/20 | 0.50 |
| ▸ | HSD17B14 | Q9BPX1 | 2/20 | 0.50 |
| ▸ | CLK1 | P49759 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29557325 | 1.00 | HDAC1 (0.62) | HDAC1FASNKDM4EMEN1KMT2A | |
| SCHEMBL7720770 | 0.91 | FASN (0.62) | HDAC1FASNKDM4EMEN1KMT2A | |
| SCHEMBL6842062 | 0.91 | HDAC1 (0.69) | HDAC1FASNKDM4EMEN1KMT2A | |
| SCHEMBL30669855 | 0.91 | HDAC1 (0.69) | HDAC1FASNKDM4EMEN1KMT2A | |
| SCHEMBL7781091 | 0.86 | FASN (0.66) | HDAC1FASNKDM4EMEN1KMT2A | |
| SCHEMBL7156512 | 0.83 | HDAC1 (0.75) | HDAC1FASNKDM4EMEN1KMT2A | |
| SCHEMBL8093096 | 0.83 | KMT2A (0.61) | HDAC1KDM4EMEN1KMT2AALDH1A1 | |
| SCHEMBL8535254 | 0.82 | FASN (0.66) | HDAC1FASNKDM4EMEN1KMT2A | |
| SCHEMBL7713698 | 0.81 | FASN (0.59) | FASNKDM4EMEN1KMT2AUSP2 | |
| SCHEMBL7713702 | 0.81 | MEN1 (0.76) | FASNMEN1KMT2AALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 186 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101355056-B | Method for manufacturing thin film transistor substrate and photosensitive composition used in the substrate | SAMSUNG DISPLAY CO LTD | 2014-02-26 | — | — | CN | claimed |
| US-8278021-B2 | Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-10-02 | — | — | US | claimed |
| US-20100009482-A1 | PHOTORESIST COMPOSITION, METHOD OF FORMING A METAL PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-01-14 | — | — | US | claimed |
| US-20090030103-A1 | METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-29 | — | — | US | claimed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | claimed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | claimed |
| US-5362598-A | Compositions for light sensitive elements with styryl dyes | SUMITOMO CHEMICAL CO., LTD. (JP) | 1994-11-08 | — | — | US | claimed |
| US-5283324-A | Reacting phenol compound and quinone diazide sulfonyl halide in solvent mixtures of different dielectric constants | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-02-01 | — | — | US | claimed |
| US-5124228-A | Based on hydroxy-substituted alkylbenzophenones | SUMITOMO CHEMICAL CO., LTD. (JP) | 1992-06-23 | — | — | US | claimed |
| US-5059507-A | Which is sensitive to ultraviolet rays and x-rays | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-10-22 | — | — | US | claimed |
| JP-2222955-A | — | — | None | — | — | JP | disclosed |
| EP-4131622-B1 | SEPARATOR FOR LITHIUM SECONDARY BATTERY, METHOD FOR MANUFACTURING SAME, AND LITHIUM SECONDARY BATTERY COMPRISING SAME | LG ENERGY SOLUTION LTD (KR) | 2026-01-28 | — | — | EP | disclosed |
| US-12424707-B2 | Separator for lithium secondary battery, manufacturing method therefor, and lithium secondary battery comprising same | LG ENERGY SOLUTION, LTD. (KR) | 2025-09-23 | — | — | US | disclosed |
| US-12424705-B2 | Separator for lithium secondary battery, method for manufacturing same, and lithium secondary battery comprising same | LG ENERGY SOLUTION, LTD. (KR) | 2025-09-23 | — | — | US | disclosed |
| CN-115951558-B | Photosensitive resin composition containing polysiloxane | 上海玟昕科技有限公司 | 2023-08-04 | — | — | CN | disclosed |
| EP-0351849-A2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-01-24 | — | — | EP | disclosed |
| EP-0346808-A2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1989-12-20 | — | — | EP | disclosed |
| EP-0341608-A2 | Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1989-11-15 | — | — | EP | disclosed |
| EP-0323631-A2 | Styryl compounds, process for preparing the same and photoresist compositions comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1989-07-12 | — | — | EP | disclosed |
| US-4812551-A | CRESOL OR PHENOL, PRINTED CIRCUITS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1989-03-14 | — | — | US | disclosed |