Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | ATM | Q13315 | 2/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL821298 | 0.86 | GAA (0.37) | KDM4ELMNAPKM | |
| SCHEMBL5695550 | 0.81 | KDM4E (0.31) | CYP1A2KDM4ELMNAPKM | |
| SCHEMBL10601414 | 0.78 | PDE10A (0.37) | — | |
| SCHEMBL79695 | 0.76 | CCNB2 (0.31) | KDM4E | |
| SCHEMBL8608222 | 0.75 | — | — | |
| SCHEMBL9615303 | 0.75 | ALDH1A1 (0.64) | CYP1A2MEN1KMT2AMAPTTSHR | |
| SCHEMBL29267401 | 0.75 | — | — | |
| SCHEMBL9184999 | 0.74 | KDM4E (0.30) | KDM4ELMNAPKM | |
| SCHEMBL82113 | 0.74 | MEN1 (0.35) | MEN1KMT2AATMMAPTTSHR | |
| SCHEMBL13578705 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 132 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5496903-A | PHOTPOLYMERIZABLE COATING | NIPPON PAINT COMPANY, LTD. (JP) | 1996-03-05 | — | — | US | claimed |
| US-12416860-B2 | Photoresist film and application thereof | CHANG CHUN PLASTICS CO., LTD. (TW) | 2025-09-16 | — | — | US | disclosed |
| US-20250224674-A1 | PHOTOSENSITIVE RESIN FILM AND APPLICATION THEREOF | CHANG CHUN PLASTICS CO., LTD. (TW) | 2025-07-10 | — | — | US | disclosed |
| US-20250076763-A1 | PHOTOSENSITIVE RESIN LAMINATE AND APPLICATION THEREOF | CHANG CHUN PLASTICS CO., LTD. (TW) | 2025-03-06 | — | — | US | disclosed |
| CN-119556523-A | Photosensitive resin laminate and use thereof | 长春人造树脂厂股份有限公司 | 2025-03-04 | — | — | CN | disclosed |
| CN-118591770-A | UV curable quantum dot formulations | 昭荣化学工业株式会社 | 2024-09-03 | — | — | CN | disclosed |
| CN-117631439-A | Photoresist film and application thereof | 长春人造树脂厂股份有限公司 | 2024-03-01 | — | — | CN | disclosed |
| US-20240069440-A1 | PHOTORESIST FILM AND APPLICATION THEREOF | CHANG CHUN PLASTICS CO., LTD. (TW) | 2024-02-29 | — | — | US | disclosed |
| CN-110032042-B | Negative photoresist composition for laser ablation and method of use thereof | 默克专利有限公司 | 2022-05-27 | — | — | CN | disclosed |
| EP-2016464-B1 | NEGATIVE PHOTORESIST COMPOSITIONS | MERCK PATENT GMBH (DE) | 2021-04-28 | — | — | EP | disclosed |
| EP-1035124-A1 | Borate compound, and photopolymerizable composition and recording material which contain the same | FUJI PHOTO FILM CO., LTD. (JP) | 2000-09-13 | — | — | EP | disclosed |
| EP-0422686-B1 | Image-forming material containing an aluminate complex | FUJI PHOTO FILM CO LTD (JP) | 1997-04-16 | — | — | EP | disclosed |
| US-5532373-A | Aluminate complex and use thereof in photopolymerizable composition and image-forming material | FUJI PHOTO FILM CO., LTD. (JP) | 1996-07-02 | — | — | US | disclosed |
| US-5496903-A | PHOTPOLYMERIZABLE COATING | NIPPON PAINT COMPANY, LTD. (JP) | 1996-03-05 | — | — | US | disclosed |
| EP-0461651-B1 | Recording medium | FUJI PHOTO FILM CO LTD (JP) | 1994-02-16 | — | — | EP | disclosed |
| US-5250384-A | Light-sensitive heat-sensitive composition and recording material comprising same and image formation process using same | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-05 | — | — | US | disclosed |
| US-5202304-A | RECORDING MEDIUM | FUJI PHOTO FILM CO., LTD. (JP) | 1993-04-13 | — | — | US | disclosed |
| US-5180652-A | LIGHT- AND HEAT-SENSITIVE COMPOSITION, AND RECORDING MATERIAL | FUJI PHOTO FILM CO., LTD. (JP) | 1993-01-19 | — | — | US | disclosed |
| EP-0461651-A1 | Recording medium | FUJI PHOTO FILM CO., LTD. (JP) | 1991-12-18 | — | — | EP | disclosed |
| EP-0422686-A2 | Aluminate complex and use thereof in photopolymerizable composition and image-forming material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-04-17 | — | — | EP | disclosed |