Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.35 |
| ▸ | ATM | Q13315 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
| ▸ | PRNP | P04156 | 1/20 | 0.30 |
| ▸ | HRH4 | Q9H3N8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL483080 | 0.86 | GAA (0.37) | MEN1KMT2AATMMAPTTSHR | |
| SCHEMBL4219605 | 0.77 | MEN1 (0.31) | MEN1KMT2AATMMAPTTSHR | |
| SCHEMBL35173 | 0.74 | CYP1A2 (0.33) | MEN1KMT2AATMMAPTTSHR | |
| SCHEMBL11929988 | 0.70 | HRH4 (0.34) | MEN1KMT2AATMMAPTTSHR | |
| SCHEMBL33145 | 0.69 | ALDH1A1 (0.43) | MEN1KMT2AATMMAPTTSHR | |
| SCHEMBL1044951 | 0.68 | CLK4 (0.50) | MEN1KMT2AMAPT | |
| SCHEMBL4219607 | 0.64 | MEN1 (0.32) | MEN1KMT2AATMMAPTTSHR | |
| SCHEMBL11779440 | 0.63 | ALDH1A1 (0.35) | MEN1KMT2AATMMAPTTSHR | |
| SCHEMBL3393748 | 0.63 | MEN1 (0.34) | MEN1KMT2AATMMAPTTSHR | |
| SCHEMBL8943512 | 0.63 | ALDH1A1 (0.35) | MEN1KMT2AATMMAPTTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 552 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12422750-B2 | Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device | FUJIFILM CORPORATION (JP) | 2025-09-23 | — | — | US | disclosed |
| CN-116648313-B | Resin composition, cured product, laminate, method for producing cured product, and semiconductor device | 富士胶片株式会社 | 2025-05-16 | — | — | CN | disclosed |
| CN-119937247-A | Curable resin composition, resin film, cured film, laminate, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2025-05-06 | — | — | CN | disclosed |
| CN-115190891-B | Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2024-10-15 | — | — | CN | disclosed |
| CN-111566560-B | Photosensitive resin composition, partition wall, organic electroluminescent element, image display device, and illumination | 三菱化学株式会社 | 2024-09-17 | — | — | CN | disclosed |
| CN-114981360-B | Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2024-09-10 | — | — | CN | disclosed |
| CN-115667404-B | Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2024-05-03 | — | — | CN | disclosed |
| CN-117378044-A | Polyimide-containing part forming composition, method for producing bonded body, method for producing device, and device | 富士胶片株式会社 | 2024-01-09 | — | — | CN | disclosed |
| CN-117203746-A | Method for manufacturing bonded body, method for manufacturing semiconductor device, and resin composition | 富士胶片株式会社 | 2023-12-08 | — | — | CN | disclosed |
| CN-117120550-A | Resin composition, cured product, laminate, method for producing cured product, and semiconductor device | 富士胶片株式会社 | 2023-11-24 | — | — | CN | disclosed |
| US-6153356-A | MIXTURE OF UNSATURATED COMPOUND, CYANINE DYE AND PHOTOINITIATOR | MITSUBISHI CHEMICAL CORPORATION (JP) | 2000-11-28 | — | — | US | disclosed |
| EP-0704765-B1 | A photoresist composition comprising a polyfunctional vinyl ether compound | SUMITOMO CHEMICAL CO (JP) | 1999-04-21 | — | — | EP | disclosed |
| US-5719008-A | PHOTOLITHOGRAPHY, COLOR FILTERS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-02-17 | — | — | US | disclosed |
| EP-0704765-A1 | A photoresist composition comprising a polyfunctional vinyl ether compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1996-04-03 | — | — | EP | disclosed |
| EP-0557555-B1 | Photopolymerizable composition | MITSUBISHI CHEM CORP (JP) | 1995-09-20 | — | — | EP | disclosed |
| EP-0557555-A1 | Photopolymerizable composition | Mitsubishi Chemical Corporation (JP) | 1993-09-01 | — | — | EP | disclosed |
| US-5219709-A | Addition polymerizable unsaturated compound, photoinitiator system of squarylium dye and halomethyl-s-triazine compound | MITSUBISHI KASEI CORPORATION (JP) | 1993-06-15 | — | — | US | disclosed |
| EP-0458325-A1 | Negative photosensitive composition and method for forming a resist pattern | Mitsubishi Chemical Corporation (JP) | 1991-11-27 | — | — | EP | disclosed |
| EP-0379200-A2 | Photopolymerizable composition | MITSUBISHI KASEI CORPORATION (JP) | 1990-07-25 | — | — | EP | disclosed |
| US-4101323-A | Radiation-sensitive copying composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1978-07-18 | — | — | US | disclosed |