Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CCNB2 | O95067 | 1/20 | 0.31 |
| ▸ | CCNE2 | O96020 | 1/20 | 0.31 |
| ▸ | CDK1 | P06493 | 1/20 | 0.31 |
| ▸ | CDK4 | P11802 | 1/20 | 0.31 |
| ▸ | CCNB1 | P14635 | 1/20 | 0.31 |
| ▸ | CCNA2 | P20248 | 1/20 | 0.31 |
| ▸ | CCND1 | P24385 | 1/20 | 0.31 |
| ▸ | CCNE1 | P24864 | 1/20 | 0.31 |
| ▸ | CDK2 | P24941 | 1/20 | 0.31 |
| ▸ | CCNA1 | P78396 | 1/20 | 0.31 |
| ▸ | CCNB3 | Q8WWL7 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10711472 | 0.86 | ALDH1A1 (0.44) | — | |
| SCHEMBL25253103 | 0.83 | — | — | |
| SCHEMBL9156108 | 0.83 | — | — | |
| SCHEMBL1617690 | 0.83 | KDM4E (0.32) | KDM4E | |
| SCHEMBL9076886 | 0.83 | CASP1 (0.33) | KDM4E | |
| SCHEMBL15492885 | 0.83 | — | — | |
| SCHEMBL14911105 | 0.80 | — | — | |
| SCHEMBL80161 | 0.78 | — | — | |
| SCHEMBL11815688 | 0.76 | — | — | |
| SCHEMBL1080809 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4648 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122070479-A | Ultrasonic indicating device and method for monitoring ultrasonic treatment | JP实验室股份有限公司 | 2026-05-19 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| WO-2025090061-A1 | ULTRASONIC INDICATOR DEVICE AND METHOD FOR MONITORING ULTRASONICATION | JP LABORATORIES, INC. (US) | 2025-05-01 | — | — | WO | claimed |
| CN-119668028-A | Negative photoresist composition, application thereof and imaging method | 福建泓光半导体材料有限公司 | 2025-03-21 | — | — | CN | claimed |
| CN-115368494-B | Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | claimed |
| US-20230350293-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2023-11-02 | — | — | US | claimed |
| EP-4220301-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | Young Chang Chemical Co., Ltd. (KR) | 2023-08-02 | — | — | EP | claimed |
| CN-116194842-A | Negative photoresist composition for I-line for improving step difference and LER between center and edge, and negative photoresist composition for I-line for improving process margin | 荣昌化学制品株式会社 | 2023-05-30 | — | — | CN | claimed |
| US-11635688-B2 | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates | KAYAKU ADVANCED MATERIALS, INC. (US) | 2023-04-25 | — | — | US | claimed |
| EP-0211615-A2 | Photopolymerisable composition | Nippon Paint Co., Ltd. (JP) | 1987-02-25 | — | — | EP | claimed |
| US-4636459-A | PHOTOINITIATOR AND UNSATURATED MONOMER; PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 1987-01-13 | — | — | US | claimed |
| US-4528059-A | Anaerobically-cuting compositions | MINNESOTA MINING & MANUFACTURING COMPANY (US) | 1985-07-09 | — | — | US | claimed |
| EP-0137228-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1985-04-17 | — | — | EP | claimed |
| US-4500608-A | ACRYLIC ESTER, HALOGEN INITIATOR, SECOND INITIATOR, AND POLYMERIZATION INHIBITOR | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1985-02-19 | — | — | US | claimed |
| US-4447588-A | ACRYLATE, HALOTRIAZINE OR HALOCARBONYL COMPOUND, FREE RADICAL POLYMERIZATION INHIBITOR | MINNESOTA MINING & MANUFACTURING COMPANY (US) | 1984-05-08 | — | — | US | claimed |
| US-4413108-A | HALOGEN COMPOUND AS FIRST INITIATOR, THIOL AS SECOND INITIATOR | MINNESOTA MINING & MANUFACTURING COMPANY (US) | 1983-11-01 | — | — | US | claimed |
| US-4404345-A | UNSATURATED CARBOXYL MONOMER, HALOGENATED PROMOTER, POLYMERIZATION INHIBITOR WITH REALTION PRODUCT OF ALDEHYDE AND AMINE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1983-09-13 | — | — | US | claimed |
| US-4359524-A | ANTIHALATION LAYER OF HALOGEN COMPOUND AND MEROCYANIN DYE | FUJI PHOTO FILM CO., LTD. (JP) | 1982-11-16 | — | — | US | claimed |
| US-4239850-A | PHOTOINITIATOR OF AN UNSATURATED KETONE AND A TRIHALOMETHYL TRIAZINE | FUJI PHOTO FILM CO., LTD. (JP) | 1980-12-16 | — | — | US | claimed |