Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29723519 | 0.90 | ALDH1A1 (0.44) | ALDH1A1THRBTSHRTP53CYP3A4 | |
| SCHEMBL354160 | 0.87 | ALDH1A1 (0.44) | ALDH1A1TSHR | |
| SCHEMBL20269205 | 0.87 | ALDH1A1 (0.44) | ALDH1A1THRBTSHRTP53CYP3A4 | |
| SCHEMBL8439320 | 0.84 | ALDH1A1 (0.41) | ALDH1A1TSHRSMN1; SMN2 | |
| SCHEMBL156678 | 0.82 | ALDH1A1 (0.68) | ALDH1A1TP53CYP3A4SMN1; SMN2 | |
| SCHEMBL20505422 | 0.82 | ALDH1A1 (0.68) | ALDH1A1THRBTSHRTP53CYP3A4 | |
| SCHEMBL352927 | 0.82 | ALDH1A1 (0.68) | ALDH1A1THRBTSHRTP53CYP3A4 | |
| SCHEMBL8007275 | 0.82 | ALDH1A1 (0.40) | ALDH1A1THRB | |
| Ethylene SCHEMBL28874023 | 0.81 | ALDH1A1 (0.66) | ALDH1A1TSHRTP53CYP3A4SMN1; SMN2 | |
| SCHEMBL10681047 | 0.80 | ALDH1A1 (0.44) | ALDH1A1THRBTSHRTP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117089014-B | Acrylate copolymer, adhesive and protective film | 江苏皇冠新材料科技有限公司 | 2024-01-26 | — | — | CN | claimed |
| CN-117089014-B | Acrylate copolymer, adhesive and protective film | 江苏皇冠新材料科技有限公司 | 2024-01-26 | — | — | CN | disclosed |
| WO-2024019707-A1 | PHOTOVOLTAIC CELLS | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2024-01-25 | — | — | WO | disclosed |
| CN-117089014-A | Acrylate copolymer, adhesive and protective film | 江苏皇冠新材料科技有限公司 | 2023-11-21 | — | — | CN | disclosed |
| US-11130913-B2 | Liquid crystal alignment agent, liquid crystal alignment film, liquid crystal element, and polymer | JSR CORPORATION (JP) | 2021-09-28 | — | — | US | disclosed |
| US-20210198577-A1 | LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, LIQUID CRYSTAL ELEMENT, AND POLYMER | JSR CORPORATION (JP) | 2021-07-01 | — | — | US | disclosed |
| WO-2021070515-A1 | LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL ELEMENT | JSR株式会社 | 2021-04-15 | — | — | WO | disclosed |
| WO-2021049255-A1 | LIQUID CRYSTAL ORIENTATION AGENT, LIQUID CRYSTAL ORIENTATION FILM, AND LIQUID CRYSTAL ELEMENT | JSR株式会社 | 2021-03-18 | — | — | WO | disclosed |
| US-9488911-B2 | Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device | FUJIFILM CORPORATION (JP) | 2016-11-08 | — | — | US | disclosed |
| CN-102243386-B | Liquid crystal display cells, positive radiation line sensitive compositions, interlayer dielectric used for liquid crystal display element and forming method thereof | JSR株式会社 | 2016-08-10 | — | — | CN | disclosed |
| US-9260554-B2 | Copolymer, monomer composition, resin solution, and resin film | SHOWA DENKO K.K. (JP) | 2016-02-16 | — | — | US | disclosed |
| US-20150362836-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-12-17 | — | — | US | disclosed |
| CN-103003722-B | Light directivity control unit, manufacturing method thereof and display module | JSR CORP. (JP) | 2015-08-26 | — | — | CN | disclosed |
| US-20150175729-A1 | COPOLYMER, MONOMER COMPOSITION, RESIN SOLUTION, AND RESIN FILM | RESONAC CORPORATION (JP) | 2015-06-25 | — | — | US | disclosed |
| US-8535873-B2 | Photosensitive resin composition | SHOWA DENKO K.K. (JP) | 2013-09-17 | — | — | US | disclosed |
| US-20120015300-A1 | PHOTOSENSITIVE RESIN COMPOSITION | RESONAC CORPORATION (JP) | 2012-01-19 | — | — | US | disclosed |
| US-20110281040-A1 | LIQUID CRYSTAL DISPLAY ELEMENT, POSITIVE TYPE RADIATION SENSITIVE COMPOSITION, INTERLAYER INSULATING FILM FOR LIQUID CRYSTAL DISPLAY ELEMENT, AND FORMATION METHOD THEREOF | JSR CORPORATION (JP) | 2011-11-17 | — | — | US | disclosed |
| US-7713680-B2 | Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device | JSR CORPORATION (JP) | 2010-05-11 | — | — | US | disclosed |
| US-20080233515-A1 | RADIATION SENSITIVE RESIN COMPOSITION FOR FORMING A PROTECTIVE FILM, METHOD OF FORMING A PROTECTIVE FILM FROM THE COMPOSITION, LIQUID CRYSTAL DISPLAY DEVICE AND SOLID-STATE IMAGE SENSING DEVICE | JSR CORPORATION (JP) | 2008-09-25 | — | — | US | disclosed |
| EP-1972673-A1 | Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device | JSR Corporation (JP) | 2008-09-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150362836-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE | POLQ, POLR1A, POLI | ALDH1A1 743/4885THRB 3517/4885TSHR 3172/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.