Phosphoric Acid

Phosphoric Acid

SCHEMBL3520541

CCO.O=P(O)(O)O.[KH]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Phosphoric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114075784-B Secondary oiling agent treatment method for heterocyclic aramid fiber 中蓝晨光化工有限公司 2023-08-08 CN disclosed
CN-114150334-B Nanorod self-assembly catalyst and preparation method and application thereof 华东理工大学 2023-04-07 CN disclosed
CN-114150334-A Nanorod self-assembly catalyst and preparation method and application thereof 华东理工大学 2022-03-08 CN disclosed
US-7850837-B2 electrochemical graining treatment in hydrochloric acid solution and an alkali etching treatment; aluminum electrodeposition; excellent in press life and scum resistance; recording layer is formed on the grained surface of the support is excellent in all of sensitivity, press life, mechanical strength FUJIFILM CORPORATION (JP) 2010-12-14 US disclosed
US-20060201819-A1 electrochemical graining treatment in hydrochloric acid solution and an alkali etching treatment; aluminum electrodeposition; excellent in press life and scum resistance; recording layer is formed on the grained surface of the support is excellent in all of sensitivity, press life, mechanical strength FUJI PHOTO FILM CO., LTD. 2006-09-14 US disclosed
EP-1338436-A2 Aluminum support for lithographic printing plate, method of preparing the same and presensitized plate using the same FUJI PHOTO FILM CO., LTD. (JP) 2003-08-27 EP disclosed
US-4169061-A Fiber treating compositions EASTMAN KODAK COMPANY (US) 1979-09-25 US disclosed