Methacrylic Acid

Methacrylic Acid

SCHEMBL35272

C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O.OCCC(CO)C(CO)CO

nearest known ligand 0.38

Full drug profile on Sugi Atlas →

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TGFBR1 P36897 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL35548 1.00 TGFBR1 (0.38) TGFBR1
Methacrylic Acid SCHEMBL27853218 0.90 LMNA (0.36) TGFBR1
Methacrylic Acid SCHEMBL10565942 0.89 TGFBR1 (0.45) TGFBR1
Methacrylic Acid SCHEMBL6437286 0.89 TGFBR1 (0.45) TGFBR1
Methacrylic Acid SCHEMBL10779267 0.88 TGFBR1 (0.36) TGFBR1
Methacrylic Acid SCHEMBL10783061 0.88 TGFBR1 (0.36) TGFBR1
Methacrylic Acid SCHEMBL23012601 0.86 TGFBR1 (0.35) TGFBR1
Methacrylic Acid SCHEMBL7745845 0.84 TGFBR1 (0.34) TGFBR1
Methacrylic Acid SCHEMBL51594 0.80 TGFBR1 (0.39) TGFBR1
Methacrylic Acid SCHEMBL8383578 0.80 TGFBR1 (0.39) TGFBR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 236 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140340891-A1 LED COLOR CONVERSION FILTER, METHOD OF MANUFACTURING SAME, AND LED MODULE INCLUDING SAME SOL COMPONENT CO., LTD. (KR) 2014-11-20 US claimed
EP-2770252-A1 LED COLOR CONVERSION FILTER, METHOD OF MANUFACTURING SAME, AND LED MODULE INCLUDING SAME Cho, Shim Hyun (KR) 2014-08-27 EP claimed
EP-0720053-B1 Photosensitive resin composition, photosensitive printing plate and method of manufacturing printing master plate TOKYO OHKA KOGYO CO LTD (JP) 2002-09-04 EP claimed
US-5885746-A COMPRISING A POLYMER BINDER, A MONOMER, A PHOTOINITIATOR ACTIVATED BY VISIBLE LASER LIGHT, A PHOTOSENSITIVE ACID-GENERATING AGENT AND A CHROMOGEN; OFFSET PRINTING; STORAGE STABILITY; RESOLUTION; MATERIALS HANDLING; EFFICIENCY TOKYO OHKA KOGYO CO., LTD. (JP) 1999-03-23 US claimed
EP-0283990-B1 A heat-resistant photosensitive resin composition TOKYO OHKA KOGYO CO LTD (JP) 1994-01-26 EP claimed
US-5087552-A Photosensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1992-02-11 US claimed
US-4996132-A Heat-resistant photosensitive resin composition TOYKO OHKA KOGYO CO. LTD. (JP) 1991-02-26 US claimed
EP-0283990-A2 A heat-resistant photosensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1988-09-28 EP claimed
EP-0280295-A2 A heat-resistant photosensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1988-08-31 EP claimed
US-4526920-A Contains poly(meth)acrylic ester of oxy or polyoxyalkane polyol, polymerization initiator, filler MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1985-07-02 US claimed
US-20260104641-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-16 US disclosed
EP-4660704-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT Shin-Etsu Chemical Co., Ltd. (JP) 2025-12-10 EP disclosed
US-20250355350-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-11-20 US disclosed
EP-4650874-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-11-19 EP disclosed
EP-4636011-A1 POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-10-22 EP disclosed
US-5087552-A Photosensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1992-02-11 US disclosed
EP-0100688-B1 CURABLE COATING COMPOSITION MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1987-04-22 EP disclosed
US-4526920-A Contains poly(meth)acrylic ester of oxy or polyoxyalkane polyol, polymerization initiator, filler MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1985-07-02 US disclosed
EP-0100688-A2 Curable coating composition MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1984-02-15 EP disclosed
US-4426243-A Room-temperature-curable, quick-setting acrylic/epoxy adhesives and methods of bonding ILLINOIS TOOL WORKS INC. (US) 1984-01-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260104641-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT ARCN1, PRDM9, LBR TGFBR1 1229/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.