Iriflophenone

Iriflophenone

SCHEMBL9148205

O=C(c1ccc(O)cc1)c1c(O)cc(O)cc1O

nearest known ligand 0.67

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FASN P49327 1/20 0.67
MAPT P10636 5/20 0.64
HPGD P15428 4/20 0.64
LMNA P02545 3/20 0.64
ESR1 P03372 2/20 0.64
HTT P42858 2/20 0.64
ESR2 Q92731 1/20 0.64
PKM P14618 1/20 0.64
SRD5A2 P31213 1/20 0.54
MAPK1 P28482 2/20 0.52
LIG1 P18858 1/20 0.52
MEN1 O00255 6/20 0.50
KMT2A Q03164 6/20 0.50
CYP3A4 P08684 3/20 0.50
POLB P06746 2/20 0.50
GAA P10253 2/20 0.50
TDP1 Q9NUW8 2/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
ALDH1A1 P00352 2/20 0.50
TP53 P04637 2/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3656921 0.95 FASN (0.73) FASNMAPTHPGDLMNAESR1
SCHEMBL30396659 0.85 MAPK1 (0.63) FASNMAPTHPGDLMNAESR1
SCHEMBL8999258 0.85 FASN (0.59) FASNMAPTHPGDLMNAESR1
SCHEMBL7484630 0.85 LMNA (0.56) FASNMAPTHPGDLMNAESR1
SCHEMBL353943 0.84 FASN (0.64) FASNMAPTHPGDLMNAHTT
SCHEMBL21178163 0.82 MEN1 (0.81) FASNMAPTHPGDLMNAESR1
Maclurin SCHEMBL758337 0.82 SYNJ2 (0.69) FASNMAPTHPGDMEN1KMT2A
Maclurin SCHEMBL29523046 0.82 SYNJ2 (0.69) FASNMAPTHPGDMEN1KMT2A
SCHEMBL6272879 0.82 FASN (0.75) FASNMAPTHPGDLMNAESR1
SCHEMBL12221631 0.81 LMNA (0.52) FASNMAPTHPGDLMNAESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4606437-A1 COSMETIC COMPOSITIONS TO INHIBIT THE ACTIVITY OF KLF4, TO REDUCE SKIN, HAIR, MUCOUS MEMBRANES AGING LABORATOIRE NATIVE (FR) 2025-08-27 EP claimed
CN-118105431-A Application of aquilaria sinensis leaf extract with benzophenone parent nucleus structure in anti-inflammatory aspect 西安市中医医院 2024-05-31 CN claimed
EP-4236912-A1 IMPROVEMENTS IN OR RELATING TO EXTRACTS Givaudan SA (CH) 2023-09-06 EP claimed
WO-2022090322-A1 IMPROVEMENTS IN OR RELATING TO EXTRACTS GIVAUDAN SA (CH) 2022-05-05 WO claimed
CN-101355056-B Method for manufacturing thin film transistor substrate and photosensitive composition used in the substrate SAMSUNG DISPLAY CO LTD 2014-02-26 CN claimed
US-20250352458-A1 IMPROVEMENTS IN OR RELATING TO EXTRACTS GIVAUDAN SA (CH) 2025-11-20 US disclosed
EP-4606437-A1 COSMETIC COMPOSITIONS TO INHIBIT THE ACTIVITY OF KLF4, TO REDUCE SKIN, HAIR, MUCOUS MEMBRANES AGING LABORATOIRE NATIVE (FR) 2025-08-27 EP disclosed
WO-2025137586-A2 COMPOSITIONS, METHODS, AND SYSTEMS FOR PROMOTING PHOSPHATE SOLUBILIZATION IN PLANTS Tenfold Technologies, LLC (US) 2025-06-26 WO disclosed
CN-118105431-A Application of aquilaria sinensis leaf extract with benzophenone parent nucleus structure in anti-inflammatory aspect 西安市中医医院 2024-05-31 CN disclosed
EP-4236912-A1 IMPROVEMENTS IN OR RELATING TO EXTRACTS Givaudan SA (CH) 2023-09-06 EP disclosed
CN-116472030-A Improvements in or relating to extracts 奇华顿股份有限公司 2023-07-21 CN disclosed
US-20230023818-A1 Hepatoprotective Effects of Palauan Folk Medicine KITALONG CHRISTOPHER (PW) 2023-01-26 US disclosed
US-4892801-A PHOTORESISTS HOECHST CELANESE CORPORATION (US) 1990-01-09 US disclosed
US-4863827-A O-QUINONE DIAZIDE AMERICAN HOECHST CORPORATION (US) 1989-09-05 US disclosed
EP-0264845-A2 Multilayer positive-registration material HOECHST CELANESE CORPORATION (US) 1988-04-27 EP disclosed
US-4732836-A SOLUTION STABILITY PHENOLIC COMPOUNDS CONDENSED WITH QUINONES HOECHST CELANESE CORPORATION (US) 1988-03-22 US disclosed
US-4732837-A Novel mixed ester O-quinone photosensitizers HOECHST CELANESE CORPORATION (US) 1988-03-22 US disclosed
EP-0244762-A2 Photosensitive positive composition and photosensitive registration material prepared therefrom HOECHST CELANESE CORPORATION (US) 1987-11-11 EP disclosed
EP-0244763-A2 Positive-working photosensitive composition and photosensitive recording material prepared therefrom HOECHST CELANESE CORPORATION (US) 1987-11-11 EP disclosed
EP-0243964-A2 Photosensitive positive composition and photosensitive registration material prepared therefrom HOECHST CELANESE CORPORATION (US) 1987-11-04 EP disclosed