⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3568605 | 0.77 | TET2 (0.31) | — | |
| SCHEMBL1761243 | 0.72 | — | — | |
| SCHEMBL3569066 | 0.72 | — | — | |
| SCHEMBL6813789 | 0.70 | — | — | |
| SCHEMBL27502235 | 0.62 | — | — | |
| SCHEMBL9875452 | 0.61 | GRM2 (0.43) | — | |
| SCHEMBL3561399 | 0.59 | — | — | |
| SCHEMBL564581 | 0.58 | TET2 (0.35) | — | |
| SCHEMBL2536716 | 0.58 | — | — | |
| SCHEMBL1088566 | 0.57 | ALDH1A1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7781602-B2 | Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-08-24 | — | — | US | disclosed |
| US-20080194764-A1 | Fluorinated Cyclic Compound, Polymerizable Fluoromonomer, Fluoropolymer, Resist Material Comprising the Same, and Method of Forming Pattern with the Same | CENTRAL GLASS COMPANY LIMITED (JP) | 2008-08-14 | — | — | US | disclosed |
| EP-1790645-A1 | LACTONE COMPOUND, LACTONE-CONTAINING MONOMER, POLYMER OF THOSE, RESIST COMPOSITION USING SAME, METHOD FOR FORMING PATTERN USING SAME | Central Glass Company, Limited (JP) | 2007-05-30 | — | — | EP | disclosed |
| US-7122292-B2 | Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-10-17 | — | — | US | disclosed |
| US-20060135744-A1 | Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same | CENTRAL GLASS COMPANY LIMITED (JP) | 2006-06-22 | — | — | US | disclosed |
| US-20060057489-A1 | Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-03-16 | — | — | US | disclosed |