SCHEMBL357250

SCHEMBL357250

COc1cccc(-c2ccccc2)c1OC

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NFE2L2 Q16236 1/20 0.49
CA12 O43570 1/20 0.48
CA1 P00915 1/20 0.48
CA2 P00918 1/20 0.48
CA4 P22748 1/20 0.48
CA7 P43166 1/20 0.48
CA9 Q16790 1/20 0.48
CA14 Q9ULX7 1/20 0.48
GAA P10253 2/20 0.47
MGAM O43451 1/20 0.47
SI P14410 1/20 0.47
MGAM2 Q2M2H8 1/20 0.47
KDM4E B2RXH2 3/20 0.47
ALDH1A1 P00352 2/20 0.47
LMNA P02545 1/20 0.47
BACE1 P56817 1/20 0.47
FFAR4 Q5NUL3 1/20 0.47
STIM1 Q13586 1/20 0.46
ORAI1 Q96D31 1/20 0.46
ADORA3 P0DMS8 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29788121 1.00 NFE2L2 (0.49) NFE2L2CA12CA1CA2CA4
Iodide SCHEMBL29162112 0.98 NFE2L2 (0.47) NFE2L2CA12CA1CA2CA4
SCHEMBL10595717 0.96 STIM1 (0.47) NFE2L2CA12CA1CA2CA4
Methyl Alcohol SCHEMBL28815313 0.96 FFAR4 (0.48) NFE2L2CA12CA1CA2CA4
SCHEMBL8124287 0.96 STIM1 (0.47) NFE2L2CA12CA1CA2CA4
Toluene SCHEMBL27771682 0.93 NFE2L2 (0.45) NFE2L2CA12CA1CA2CA4
SCHEMBL3643542 0.92 NFE2L2 (0.46) NFE2L2CA12CA1CA2CA4
SCHEMBL434622 0.89 BACE1 (0.44) NFE2L2GAAMGAMSIMGAM2
SCHEMBL16673937 0.88 CYP1A1 (0.53) GAAMGAMSIMGAM2KDM4E
SCHEMBL13385087 0.87 PDE4B (0.48) CA4KDM4EALDH1A1SMN1; SMN2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3440 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118027834-B Ultraviolet-resistant card protection film and preparation process thereof 惠州艺都文化用品有限公司 2025-03-07 CN claimed
CN-118268030-A Solid sulfonic acid catalyst and preparation method and application thereof 华东理工大学 2024-07-02 CN claimed
CN-118169963-A Fluorine-free positive photosensitive polyimide resin composition 万华化学集团股份有限公司 2024-06-11 CN claimed
CN-117806124-A Positive photosensitive polyimide resin composition 万华化学集团股份有限公司 2024-04-02 CN claimed
CN-117143348-A Metal-MOF composite material and preparation method and application thereof 浙江大学杭州国际科创中心 2023-12-01 CN claimed
CN-114773175-B Preparation method of chiral tertiary alcohol benzo-fused bicyclo [ m.3.0] alkanone compound 上海毕得医药科技股份有限公司 2023-11-03 CN claimed
CN-115052855-A Preparation method of amide compound, crystal form and salt thereof 昊运股份有限公司 2022-09-13 CN claimed
CN-114874591-A Conductive super-crosslinked conjugated polymer electromagnetic wave absorption material and preparation method thereof 中国船舶重工集团公司第七二五研究所 2022-08-09 CN claimed
CN-111621135-B Application of carbamate compound as polyurethane lubricant 万华化学集团股份有限公司 2022-08-05 CN claimed
CN-114773175-A Preparation method of chiral tertiary alcohol benzo-fused bicyclo [ m.3.0] alkanone compound 上海毕得医药科技股份有限公司 2022-07-22 CN claimed
CN-1568309-A 4'-methanesulfonyl-biphenyl derivatives as a highly selective cyclooxygenase-2 inhibitor CHEIL JEDANG CORP (KR) 2005-01-19 CN claimed
US-6645939-B1 Very late antigen-4 (VLA) integrin antagonists; antiallergens, antiasthmatics, and antiinflammatory agents; multiple sclerosis, autoimmune disease treatment MERCK & CO., INC. 2003-11-11 US claimed
EP-1233991-A2 PROCESS FOR THE PREPARATION OF A COATING, A COATED SUBSTRATE, AN ADHESIVE, A FILM OR SHEET, FOR THE THUS OBTAINED PRODUCTS AND THE COATING MIXTURE TO BE USED IN THE PROCESS STAHL INTERNATIONAL B.V. (NL) 2002-08-28 EP claimed
CN-1314880-A Novel method for preparing optically active alpha-aminonitriles AVENTIS CROP SCIENCE SA (FR) 2001-09-26 CN claimed
WO-2001023451-A2 PROCESS FOR THE PREPARATION OF A COATING, A COATED SUBSTRATE, AN ADHESIVE, A FILM OR SHEET, FOR THE THUS OBTAINED PRODUCTS AND THE COATING MIXTURE TO BE USED IN THE PROCESS STAHL INTERNATIONAL B.V. (NL) 2001-04-05 WO claimed
EP-0864927-B1 Water-developable photosensitive resin composition JSR CORP (JP) 2000-12-27 EP claimed
US-6140017-A LIGHT SENSITIVE POLYMERS FROM ALIPHATIC CONJUGATED DIENES WITH UNSATURATED MONOMER AND BLOCK COPOLYMERS WITH SULFONATE GROUPS PARTICULATE COPOLYMER (1) HAS AT LEAST ONE FUNCTIONAL GROUP SELECTED FROM THE GROUP CONSISTING OF CARBOXYL JSR CORPORATION (JP) 2000-10-31 US claimed
WO-2000011063-A1 A POLYESTER RESIN AND A PROCESS FOR PREPARING THE SAME IRE CHEMICAL LTD. (KR) 2000-03-02 WO claimed
EP-0864927-A1 Water-developable photosensitive resin composition JSR Corporation (JP) 1998-09-16 EP claimed
EP-0095066-A2 2-Keto-diazacycloalkane-urethane oligomers and UV light stabilized compositions The B.F. GOODRICH Company (US) 1983-11-30 EP claimed