SCHEMBL358635

SCHEMBL358635

Cc1cc(N(Cc2ccccc2)Cc2ccccc2)ccc1C=NN(c1ccccc1)c1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.55
GAA P10253 2/20 0.55
HTT P42858 2/20 0.55
MAPK1 P28482 2/20 0.55
CYP2C19 P33261 1/20 0.46
POLB P06746 2/20 0.44
EIF4H Q15056 1/20 0.44
ALDH1A1 P00352 5/20 0.42
KMT2A Q03164 4/20 0.42
MEN1 O00255 3/20 0.42
KDM4E B2RXH2 3/20 0.42
CRHBP P24387 1/20 0.42
CRHR2 Q13324 1/20 0.42
TSHR P16473 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.40
MCL1 Q07820 1/20 0.40
NR3C1 P04150 1/20 0.39
SLC16A3 O15427 1/20 0.39
SLC16A1 P53985 1/20 0.39
G6PC1 P35575 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL358634 1.00 MAPT (0.55) MAPTGAAHTTMAPK1CYP2C19
SCHEMBL8171068 0.88 MEN1 (0.46) MAPTGAAHTTMAPK1CYP2C19
SCHEMBL8171069 0.88 MEN1 (0.46) MAPTGAAHTTMAPK1CYP2C19
SCHEMBL9437241 0.88 MAPT (0.56) MAPTGAAHTTMAPK1CYP2C19
SCHEMBL9437204 0.88 MAPT (0.56) MAPTGAAHTTMAPK1CYP2C19
SCHEMBL12313273 0.87 MAPT (0.53) MAPTGAAHTTMAPK1CYP2C19
SCHEMBL1702573 0.86 MAPT (0.73) MAPTGAAHTTMAPK1POLB
SCHEMBL1702571 0.86 MAPT (0.73) MAPTGAAHTTMAPK1POLB
SCHEMBL14277977 0.85 MAPT (0.42) MAPTGAAHTTMAPK1CYP2C19
SCHEMBL22422719 0.83 MAPT (0.43) MAPTGAAHTTMAPK1CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 167 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7884245-B2 reacting a diphenylamine with acetic acid and sodium nitrite to obatain a N-nitrosoamine compound, adding thiourea dioxide and NaOH to such reaction solution to reduce nitrosoamine compound to a hydrazine compound, condensing hydrazins with p-diphenylaminobenzaldehyde to form end product hydrazones HODOGAYA CHEMICAL CO., LTD. (JP) 2011-02-08 US claimed
US-20060255322-A1 Methods and compositions for improved electrophoretic display performance WU ZARNG-ARH G 2006-11-16 US claimed
EP-1529242-A2 PROTECTING LAYER WITH ADDITIVES FOR ELECTROPHORETIC DISPLAY, METHOD OF PROVIDING SUCH LAYER, AND ELECTROPHORETIC DISPLAY WITH SUCH A LAYER Sipix Imaging, Inc. (US) 2005-05-11 EP claimed
US-20040085619-A1 Novel Methods and compositions for improved electrophoretic display performance SIPIX IMAGING, INC. 2004-05-06 US claimed
WO-2004010206-A2 PROTECTING LAYER WITH ADDITIVES FOR ELECTROPHORETIC DISPLAY, METHOD OF PROVIDING SUCH LAYER, AND ELECTROPHORETIC DISPLAY WITH SUCH A LAYER SIPIX IMAGING, INC. (US) 2004-01-29 WO claimed
EP-0462406-B1 An electrophotographic photosensitive material NEC CORP (JP) 1994-04-20 EP claimed
US-5061584-A Photosensitive layer contains butadiene, hydrazone and mono-phenol compounds; does not crack when oil drops or fingprints adhere to it SHINDENGEN ELECTRIC MANUFACTURING CO., LTD (JP) 1991-10-29 US claimed
JP-10073940-A None JP disclosed
US-20230288827-A1 PHOTOSENSITIVE BODY INCLUDING PROTECTIVE LAYER HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2023-09-14 US disclosed
WO-2023075748-A1 PHOTOCONDUCTOR DRUM HAVING A LAYER HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2023-05-04 WO disclosed
US-20220214628-A1 ELECTROPHOTOGRAPHIC PHOTORECEPTOR CAPABLE OF SUPPRESSING MICRO-JITTER IMAGE DEFECT HEWLETT- PACKARD DEVELOPMENT COMPANY, L.P. (US) 2022-07-07 US disclosed
EP-1757634-B2 POLYCARBONATE RESIN AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER USING SAME IDEMITSU KOSAN CO (JP) 2022-05-25 EP disclosed
WO-2022025881-A1 PHOTOSENSITIVE BODY INCLUDING PROTECTIVE LAYER HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2022-02-03 WO disclosed
US-5187036-A Semiconductor lasers NEC CORPORATION (JP) 1993-02-16 US disclosed
EP-0462406-A1 An electrophotographic photosensitive material NEC CORPORATION (JP) 1991-12-27 EP disclosed
US-5061584-A Photosensitive layer contains butadiene, hydrazone and mono-phenol compounds; does not crack when oil drops or fingprints adhere to it SHINDENGEN ELECTRIC MANUFACTURING CO., LTD (JP) 1991-10-29 US disclosed
EP-0369721-A2 Electrophotographic photosensitive material and method of preparing same SOMAR CORPORATION (JP) 1990-05-23 EP disclosed
US-4839252-A PHOTOSENSITIVE LAYER OF A BUTADIENE COMPOUND AND HYDRAZONE COMPOUND; SUPRESSING PHOTO DEGRADATION SHINDENGEN ELECTRIC MANUFACTURING CO., LTD (JP) 1989-06-13 US disclosed
US-4800145-A ELECTROGRAPHY IMPERIAL CHEMICAL INDUSTRIES, PLC (GB) 1989-01-24 US disclosed
EP-0262761-A1 Organic photoconductor IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1988-04-06 EP disclosed