⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3365287 | 0.87 | — | — | |
| SCHEMBL3370821 | 0.84 | — | — | |
| SCHEMBL3369701 | 0.84 | — | — | |
| SCHEMBL4594406 | 0.76 | — | — | |
| SCHEMBL562168 | 0.70 | — | — | |
| SCHEMBL17202842 | 0.69 | — | — | |
| SCHEMBL64665 | 0.67 | — | — | |
| SCHEMBL63969 | 0.64 | — | — | |
| SCHEMBL8679718 | 0.63 | — | — | |
| SCHEMBL28612684 | 0.63 | CA5A (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2106 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | claimed |
| EP-1830228-B1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-08-05 | — | — | EP | claimed |
| US-RE40211-E1 | Diazodisulfones | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2008-04-01 | — | — | US | claimed |
| US-7150956-B2 | Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-12-19 | — | — | US | claimed |
| US-7026497-B2 | Adhesive compound and method for forming photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-04-11 | — | — | US | claimed |
| US-6921621-B2 | Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-07-26 | — | — | US | claimed |
| US-20050158651-A1 | Adhesive compound and method for forming photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-07-21 | — | — | US | claimed |
| US-20050112498-A1 | Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device | TOYKO OHKA KOGYO CO., LTD. | 2005-05-26 | — | — | US | claimed |
| US-6730451-B2 | FLUOROACRYLATE POLYMERS; TRANSPARENCY; PREVENTING NEGATIVE WORKING; LOW ABSORPTION OF FLUORINE EXCIMER LASER LIGHT; HIGH TRANSMITTANCE TO VACUUM ULTRAVIOLET RADITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-05-04 | — | — | US | claimed |
| EP-1400853-A1 | POSITIVE RESIST COMPOSITION OF CHEMICAL AMPLIFICATION TYPE, RESIST COATED MATERIAL, METHOD OF FORMING RESIST PATTERN, AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-03-24 | — | — | EP | claimed |
| US-6660447-B2 | Copolymers of fluorinated vinyl phenol units and acrylonitrile units has high transmittance to VUV radiation | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-09 | — | — | US | claimed |
| US-20030190550-A1 | Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-10-09 | — | — | US | claimed |
| US-6436606-B1 | POLYMERS AND PHOTORESISTS COATING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-20 | — | — | US | claimed |
| US-6033826-A | POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2000-03-07 | — | — | US | claimed |
| EP-0440375-B1 | Diazodisulfones | WAKO PURE CHEM IND LTD (JP) | 1994-07-13 | — | — | EP | claimed |
| EP-0440375-A1 | Diazodisulfones | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1991-08-07 | — | — | EP | claimed |
| JP-11269230-A | — | — | None | — | — | JP | disclosed |
| US-12612500-B2 | Heat labile foam-in-place polyurethane foam | BATTELLE SAVANNAH RIVER ALLIANCE LLC (US) | 2026-04-28 | — | — | US | disclosed |
| EP-0440375-A1 | Diazodisulfones | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1991-08-07 | — | — | EP | disclosed |
| EP-0440374-A2 | Chemical amplified resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1991-08-07 | — | — | EP | disclosed |