Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.40 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | VDR | P11473 | 1/20 | 0.38 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.38 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | XBP1 | P17861 | 1/20 | 0.38 |
| ▸ | MPI | P34949 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL35980 | 1.00 | LMNA (0.42) | LMNAMEN1KMT2ARECQLKDM4E | |
| SCHEMBL1227015 | 1.00 | LMNA (0.42) | LMNAMEN1KMT2ARECQLKDM4E | |
| SCHEMBL10097225 | 0.94 | MAPT (0.44) | LMNAMEN1KMT2ARECQLKDM4E | |
| SCHEMBL28408422 | 0.94 | MAPT (0.44) | LMNAMEN1KMT2ARECQLKDM4E | |
| SCHEMBL10097224 | 0.93 | ALDH1A1 (0.40) | LMNAMEN1KMT2AMAPTALDH1A1 | |
| SCHEMBL18957974 | 0.93 | ALDH1A1 (0.40) | LMNAMEN1KMT2AMAPTALDH1A1 | |
| SCHEMBL10083959 | 0.93 | ALDH1A1 (0.40) | LMNAMEN1KMT2AMAPTALDH1A1 | |
| SCHEMBL6304419 | 0.93 | ALDH1A1 (0.47) | LMNAMEN1KMT2AMAPTALDH1A1 | |
| SCHEMBL6304421 | 0.93 | ALDH1A1 (0.47) | LMNAMEN1KMT2AMAPTALDH1A1 | |
| SCHEMBL10083960 | 0.90 | TCF4 (0.38) | LMNAMEN1KMT2ARECQLKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120065622-A | Photosensitive resin composition and method for producing microlens | 东京应化工业株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-114600045-B | Photosensitive resin composition, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2025-05-09 | — | — | CN | disclosed |
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| CN-112136081-B | Photosensitive transfer material, method for manufacturing circuit wiring, and method for manufacturing touch panel | 富士胶片株式会社 | 2024-11-19 | — | — | CN | disclosed |
| CN-110317174-B | Hydrogen barrier agent, composition for forming hydrogen barrier film, method for producing hydrogen barrier film, and electronic device | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-118829948-A | Method for manufacturing plating shaped article | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-118742854-A | Chemically amplified positive photosensitive composition, method for producing molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2024-10-01 | — | — | CN | disclosed |
| US-20240199854-A1 | COMPOSITION, CURED FILM, STRUCTURAL BODY, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND MANUFACTURING METHOD OF CURED FILM | FUJIFLIM CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| CN-113946103-B | Dry film resist, method for manufacturing circuit wiring, input device, and display device | 富士胶片株式会社 | 2024-05-07 | — | — | CN | disclosed |
| CN-117590696-A | Photosensitive resin composition | 东京应化工业株式会社 | 2024-02-23 | — | — | CN | disclosed |
| US-5714625-A | Cyanooxime sulfonate compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-02-03 | — | — | US | disclosed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | disclosed |
| EP-0780729-A1 | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-06-25 | — | — | EP | disclosed |
| EP-0768572-A1 | Photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-04-16 | — | — | EP | disclosed |
| EP-0241423-B1 | PROCESS FOR THE PRODUCTION OF POSITIVE IMAGES | CIBA-GEIGY AG (CH) | 1993-09-15 | — | — | EP | disclosed |
| EP-0199672-B1 | OXIME SULPHONATES CONTAINING REACTIVE GROUPS | CIBA-GEIGY AG (CH) | 1988-06-01 | — | — | EP | disclosed |
| US-4736055-A | STARING MATERIAL FOR PHOTORESIST POLYMERS | CIBA-GEIGY CORPORATION (US) | 1988-04-05 | — | — | US | disclosed |
| EP-0241423-A2 | Process for the production of positive images | CIBA-GEIGY AG (CH) | 1987-10-14 | — | — | EP | disclosed |
| US-4540598-A | LATENT OXIME SULFONATE CATALYSTS | CIBA-GEIGY CORPORATION (US) | 1985-09-10 | — | — | US | disclosed |
| EP-0139609-A1 | Process for curing acid-curable lacquers | CIBA-GEIGY AG (CH) | 1985-05-02 | — | — | EP | disclosed |