SCHEMBL36030

SCHEMBL36030

CCC1(COc2ccccc2)COC1

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
LTA4H P09960 3/20 0.40
TSHR P16473 1/20 0.40
TDP1 Q9NUW8 1/20 0.38
KCNA3 P22001 1/20 0.38
CTSK P43235 1/20 0.37
CHRNB2 P17787 2/20 0.37
CHRNB4 P30926 2/20 0.37
CHRNA3 P32297 2/20 0.37
CHRNA7 P36544 2/20 0.37
CHRNA4 P43681 2/20 0.37
HTR1A P08908 1/20 0.37
POLB P06746 1/20 0.36
HSD17B10 Q99714 1/20 0.36
CA4 P22748 1/20 0.35
LMNA P02545 1/20 0.35
HTR1D P28221 1/20 0.35
HTR1B P28222 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13301302 0.94 LTA4H (0.51) MEN1KMT2ALTA4HTSHR
SCHEMBL36226 0.91 TSHR (0.40) MEN1KMT2ALTA4HTSHRTDP1
SCHEMBL14087660 0.89 LTA4H (0.37) MEN1KMT2ALTA4HTSHRTDP1
SCHEMBL2850237 0.89 KCNA3 (0.43) LTA4HTDP1KCNA3HTR1A
SCHEMBL3054832 0.88 MEN1 (0.39) MEN1KMT2ALTA4HTSHRTDP1
SCHEMBL36036 0.88 TSHR (0.45) MEN1KMT2ATSHRPOLBHSD17B10
SCHEMBL14075160 0.87 HDAC3 (0.45) LTA4HKCNA3CHRNB2CHRNB4CHRNA3
SCHEMBL27763916 0.87 HTR1A (0.39) MEN1KMT2ALTA4HTDP1KCNA3
SCHEMBL21028469 0.86 LTA4H (0.43) LTA4HTSHRHTR1A
SCHEMBL21089712 0.86 LTA4H (0.40) MEN1KMT2ALTA4HTSHRPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3802 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260064002-A1 PHOTOSENSITIVE COMPOSITION AND FILM PREPARED FROM THE SAME INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2026-03-05 US claimed
US-20250382486-A1 CATIONIC PHOTOCURABLE COMPOSITION AND USE THEREOF CHANGZHOU ZHENGJIE INTELLIGENT MANUFACTURE TECH CO LTD (CN) 2025-12-18 US claimed
CN-120082236-A Photo-curing epoxy ink and preparation method and application thereof 万华化学集团股份有限公司 2025-06-03 CN claimed
EP-4545600-A1 CATIONIC PHOTOCURABLE COMPOSITION, PAINT, ARTICLE OF MANUFACTURE WITH PHOTOCURABLE COATING, AND INK Changzhou Zhengjie Intelligent Manufacture Technology Co., Ltd. (CN) 2025-04-30 EP claimed
EP-4545607-A1 CATIONIC PHOTOCURABLE COMPOSITION AND USE THEREOF Changzhou Zhengjie Intelligent Manufacture Technology Co., Ltd. (CN) 2025-04-30 EP claimed
CN-119320613-A UV-thermal dual-curing adhesive and preparation method and application thereof 杭州之江有机硅化工有限公司 2025-01-17 CN claimed
CN-114868051-B Laminate body 住友化学株式会社 2024-12-31 CN claimed
CN-119144122-A Light-heat dual-curing high-temperature-resistant resin system with long storage period at room temperature for fiber prepreg tape and preparation method thereof 北京化工大学 2024-12-17 CN claimed
CN-117820897-A Color conversion film ink and application thereof 北京航空航天大学合肥创新研究院(北京航空航天大学合肥研究生院) 2024-04-05 CN claimed
CN-117511183-A Polyurethane-epoxy photo-thermal dual-cured photosensitive resin composition and preparation method thereof 上海信斯帝克新材料有限公司 2024-02-06 CN claimed
US-20050064333-A1 Thianthrenium salt cationic photoinitiators RENSSELAER POLYTECHNIC INSTITUTE (US) 2005-03-24 US claimed
US-6866376-B2 Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink BROTHER KOGYO KABUSHIKI KAISHA (JP) 2005-03-15 US claimed
EP-1504306-A1 PHOTOPOLYMERIZABLE COMPOSITIONS COMPRISING THIANTHRENIUM SALTS AS CATIONIC PHOTOINITIATORS RENSSELAER POLYTECHNIC INSTITUTE (US) 2005-02-09 EP claimed
EP-1502155-A1 RADIATION CURABLE RESIN COMPOSITION AND RAPID PROTOTYPING PROCESS USING THE SAME DSM IP Assets B.V. (NL) 2005-02-02 EP claimed
US-20040142274-A1 Radiation curable resin composition and rapid prototyping process using the same STRATASYS INC. 2004-07-22 US claimed
EP-1371695-A1 Jetable compositions Vantico AG (CH) 2003-12-17 EP claimed
WO-2003098347-A1 PHOTOPOLYMERIZABLE COMPOSITIONS COMPRISING THIANTHRENIUM SALT CATIONIC PHOTOINITIATORS RENSSELAER POLYTECHNIC INSTITUTE (US) 2003-11-27 WO claimed
WO-2003093901-A1 RADIATION CURABLE RESIN COMPOSITION AND RAPID PROTOTYPING PROCESS USING THE SAME DSM IP ASSETS B.V. (NL) 2003-11-13 WO claimed
US-20030094738-A1 Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink BROTHER KOGYO KABUSHIKI KAISHA (JP) 2003-05-22 US claimed
EP-1302499-A2 Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink BROTHER KOGYO KABUSHIKI KAISHA (JP) 2003-04-16 EP claimed