SCHEMBL3610880

SCHEMBL3610880

O=C(O)NC1(c2cccc([N+](=O)[O-])c2)CCCCC1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
NPSR1 Q6W5P4 2/20 0.46
CYP1A2 P05177 1/20 0.46
CYP2C9 P11712 1/20 0.46
CYP2C19 P33261 1/20 0.46
KDM1A O60341 1/20 0.45
TP53 P04637 1/20 0.44
RAB9A P51151 4/20 0.44
CHRNA1 P02708 1/20 0.43
CHRNG P07510 1/20 0.43
CHRNB1 P11230 1/20 0.43
CHRNB2 P17787 1/20 0.43
SLC6A2 P23975 1/20 0.43
CHRNB4 P30926 1/20 0.43
CHRNA3 P32297 1/20 0.43
CHRNA4 P43681 1/20 0.43
SLC6A3 Q01959 1/20 0.43
CHRND Q07001 1/20 0.43
POLB P06746 3/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10155681 0.84 LMNA (0.44) MEN1KMT2ANPSR1CYP1A2CYP2C9
SCHEMBL10155680 0.83 KDM1A (0.47) MEN1KMT2ANPSR1CYP1A2CYP2C9
SCHEMBL6677984 0.82 RAB9A (0.49) MEN1KMT2ANPSR1CYP1A2CYP2C9
SCHEMBL10155677 0.81 MEN1 (0.60) MEN1KMT2ARAB9APOLBMAPT
SCHEMBL6678010 0.80 RAB9A (0.50) MEN1KMT2ANPSR1CYP1A2CYP2C9
SCHEMBL6674979 0.79 AKR1C1 (0.56) MEN1KMT2ANPSR1CYP1A2CYP2C9
SCHEMBL20898458 0.79 NPSR1 (0.48) MEN1KMT2ANPSR1CYP1A2CYP2C9
SCHEMBL7245271 0.78 MAPT (0.50) MEN1KMT2ANPSR1CYP1A2CYP2C9
SCHEMBL6620132 0.77 SSTR4 (0.59) MEN1KMT2APOLB
Hydrochloric Acid SCHEMBL10669381 0.77 KDM1A (0.44) MEN1KMT2ANPSR1CYP1A2CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8367190-B2 At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same LG CHEM, LTD. (KR) 2013-02-05 US claimed
US-20100080973-A1 LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-04-01 US claimed
WO-2008035890-A9 AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME LG CHEMICAL LTD (KR) 2009-04-23 WO claimed
WO-2008035890-A1 AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME LG CHEM, LTD. (KR) 2008-03-27 WO claimed
CN-109661855-B Photosensitive resin composition for forming organic electroluminescent element spacer, organic electroluminescent element, image display device, and lighting 三菱化学株式会社 2022-07-08 CN disclosed
EP-3374467-B1 COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS ROLIC TECH AG (CH) 2020-04-15 EP disclosed
US-20180320072-A1 COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS Rolic Technologies AG (CH) 2018-11-08 US disclosed
EP-3374467-A1 COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS ROLIC Technologies AG (CH) 2018-09-19 EP disclosed
WO-2017080977-A1 COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS ROLIC AG (CH) 2017-05-18 WO disclosed
US-8367190-B2 At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same LG CHEM, LTD. (KR) 2013-02-05 US disclosed
US-20100080973-A1 LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-04-01 US disclosed
WO-2008035890-A9 AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME LG CHEMICAL LTD (KR) 2009-04-23 WO disclosed
WO-2008035890-A1 AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME LG CHEM, LTD. (KR) 2008-03-27 WO disclosed