Lithium Ion

Lithium Ion

SCHEMBL3623447

[Li+].[Li+].[O-]B([O-])OCCCC(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GSK3AGSK3BIMPA1

The experimentally established mechanism targets of Lithium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 18/20 0.48
KCNH2 Q12809 2/20 0.41
CYP3A4 P08684 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
CYP11B1 P15538 1/20 0.33
CYP11B2 P19099 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetramethylammonium Ion SCHEMBL2428731 0.92 KIF11 (0.44) KIF11KCNH2CYP3A4CYP2D6CYP2C9
Tetrylammonium SCHEMBL3297055 0.88 KIF11 (0.41) KIF11KCNH2CYP3A4CYP2D6CYP2C9
SCHEMBL9686702 0.84 KDM4E (0.45) KIF11KCNH2CYP3A4CYP2D6CYP2C9
Tetrabuthylammonium SCHEMBL125284 0.84 KIF11 (0.38) KIF11KCNH2CYP3A4CYP2D6CYP2C9
Lithium Ion SCHEMBL7100736 0.83 KIF11 (0.46) KIF11KCNH2CYP3A4CYP2D6CYP2C9
Choline SCHEMBL9015240 0.83 CHRM2 (0.38) KIF11KCNH2CYP3A4CYP2D6CYP2C9
SCHEMBL9685834 0.82 KIF11 (0.36) KIF11KCNH2CYP3A4CYP2D6CYP2C9
SCHEMBL532733 0.80 KIF11 (0.50) KIF11KCNH2CYP3A4CYP2D6CYP2C9
SCHEMBL8652182 0.80 KIF11 (0.50) KIF11KCNH2CYP3A4CYP2D6CYP2C9
Tetrabuthylammonium SCHEMBL124956 0.79 KIF11 (0.36) KIF11KCNH2CYP3A4CYP2D6CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115873224-B Catalyst composition for polyester, hydrolysis-resistant polyester film and preparation method 中国石油化工股份有限公司 2025-03-07 CN claimed
CN-114447427-B Nonaqueous electrolyte and lithium battery 张家港市国泰华荣化工新材料有限公司 2024-04-05 CN claimed
CN-115772257-B Modifier for high-heat-resistance polyester, preparation method of modifier, preparation method of polyester by using modifier and obtained polyester 中国石油化工股份有限公司 2024-03-26 CN claimed
CN-116154281-A Nonaqueous electrolyte and high-voltage lithium battery containing same 张家港市国泰华荣化工新材料有限公司 2023-05-23 CN claimed
CN-113583220-B Environment-friendly polyester polycondensation catalyst and preparation method and application thereof 中国石油化工股份有限公司 2023-05-02 CN claimed
WO-2026100697-A1 PHOTOCURABLE EPISULFIDE COMPOSITION, CURED PRODUCT, LAMINATE, AND METHOD FOR PRODUCING CURED PRODUCT 三井化学株式会社 2026-05-15 WO disclosed
CN-115873224-B Catalyst composition for polyester, hydrolysis-resistant polyester film and preparation method 中国石油化工股份有限公司 2025-03-07 CN disclosed
CN-114447427-B Nonaqueous electrolyte and lithium battery 张家港市国泰华荣化工新材料有限公司 2024-04-05 CN disclosed
CN-115772257-B Modifier for high-heat-resistance polyester, preparation method of modifier, preparation method of polyester by using modifier and obtained polyester 中国石油化工股份有限公司 2024-03-26 CN disclosed
CN-116154281-A Nonaqueous electrolyte and high-voltage lithium battery containing same 张家港市国泰华荣化工新材料有限公司 2023-05-23 CN disclosed
CN-113583220-B Environment-friendly polyester polycondensation catalyst and preparation method and application thereof 中国石油化工股份有限公司 2023-05-02 CN disclosed
US-20230112218-A1 THREE-COMPONENT PHOTO INITIATING SYSTEMS FOR THE RED AND NEAR INFRARED CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) 2023-04-13 US disclosed
US-20130165330-A1 PHOTOACTIVATED CHEMICAL BLEACHING OF DYES GENERAL ELECTRIC COMPANY (US) 2013-06-27 US disclosed
WO-2013095896-A1 PHOTOACTIVATED CHEMICAL BLEACHING OF DYES GENERAL ELECTRIC COMPANY (US) 2013-06-27 WO disclosed
US-7700264-B2 Photosensitive resin composition, image forming material and image forming method using thereof NIPPON PAINT CO., LTD. (JP) 2010-04-20 US disclosed
US-20070099115-A1 Photosensitive resin composition, image forming material and image forming method using thereof NIPPON PAINT CO., LTD. (JP) 2007-05-03 US disclosed
US-5998496-A ABSORBING RADIATION SPECTRA GROUP LIMITED, INC. (US) 1999-12-07 US disclosed
EP-0871607-A4 PHOTOSENSITIVE INTRAMOLECULAR ELECTRON TRANSFER COMPOUNDS SPECTRA GROUP LTD INC (US) 1999-09-29 EP disclosed
EP-0871607-A1 PHOTOSENSITIVE INTRAMOLECULAR ELECTRON TRANSFER COMPOUNDS SPECTRA GROUP LIMITED INC (US) 1998-10-21 EP disclosed
WO-1997016406-A1 PHOTOSENSITIVE INTRAMOLECULAR ELECTRON TRANSFER COMPOUNDS SPECTRA GROUP LIMITED, INC. (US) 1997-05-09 WO disclosed