Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KIF11 | P52732 | 9/20 | 0.38 |
| ▸ | KCNH2 | Q12809 | 3/20 | 0.37 |
| ▸ | CHRM2 | P08172 | 3/20 | 0.34 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.34 |
| ▸ | CHRM3 | P20309 | 3/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | MLNR | O43193 | 1/20 | 0.34 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.34 |
| ▸ | ESR1 | P03372 | 1/20 | 0.34 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.34 |
| ▸ | PGR | P06401 | 1/20 | 0.34 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.34 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.34 |
| ▸ | HTR1A | P08908 | 1/20 | 0.34 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.34 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.34 |
| ▸ | DRD2 | P14416 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetrabuthylammonium SCHEMBL124956 | 0.95 | KIF11 (0.36) | KIF11KCNH2CHRM2CHRM1CHRM3 | |
| Tetrylammonium SCHEMBL3297055 | 0.87 | KIF11 (0.41) | KIF11KCNH2CHRM2CHRM1CHRM3 | |
| Tetrabuthylammonium SCHEMBL30897332 | 0.87 | PSMD14 (0.33) | SLC22A1 | |
| Tetrabuthylammonium SCHEMBL3403042 | 0.86 | KIF11 (0.38) | KIF11KCNH2CHRM2CHRM1CHRM3 | |
| Tetramethylammonium Ion SCHEMBL2428731 | 0.86 | KIF11 (0.44) | KIF11KCNH2CHRM2CHRM1CHRM3 | |
| Tetrabuthylammonium SCHEMBL30897334 | 0.85 | CHRNB4 (0.33) | KIF11KCNH2CHRM2CHRM1CHRM3 | |
| Lithium Ion SCHEMBL3623447 | 0.84 | KIF11 (0.48) | KIF11KCNH2CYP3A4CYP2D6CYP2C9 | |
| Miristalkonium Ion SCHEMBL9686847 | 0.83 | DNM1 (0.58) | KIF11KCNH2CHRM2CHRM1CHRM3 | |
| SCHEMBL8365371 | 0.83 | PPARA (0.37) | KIF11ALDH1A1HTTSMN1; SMN2SCN1A | |
| SCHEMBL8398587 | 0.83 | CHRM2 (0.39) | KIF11KCNH2CHRM2CHRM1CHRM3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114316403-A | Ultraviolet light crosslinking heat-shrinkable tube material and preparation method thereof | 中广核高新核材科技（苏州）有限公司 | 2022-04-12 | — | — | CN | claimed |
| JP-8217813-A | — | — | None | — | — | JP | disclosed |
| JP-10182767-A | — | — | None | — | — | JP | disclosed |
| CN-118388721-A | Back diffusion holographic recording medium, photopolymerized holographic plastic, preparation method and application thereof | 华中科技大学 | 2024-07-26 | — | — | CN | disclosed |
| CN-110914755-B | Protective layer for photopolymers | 科思创德国股份有限公司 | 2023-09-29 | — | — | CN | disclosed |
| WO-2023156485-A1 | TRIARYLALKYL BORATE SALTS AS COINITIATORS IN NIR PHOTOPOLYMER COMPOSITIONS | COVESTRO DEUTSCHLAND AG (DE) | 2023-08-24 | — | — | WO | disclosed |
| EP-3622511-B1 | HOLOGRAPHIC MEDIUM CONTAINING A PHOTOPOLYMERIC COATING FOR HOLOGRAPHIC EXPOSURE AND A LACQUER LAYER WITH HIGH RESISTANCE | COVESTRO INTELLECTUAL PROPERTY GMBH & CO KG (DE) | 2022-04-27 | — | — | EP | disclosed |
| EP-3622512-B1 | FILM STRUCTURE COMPRISING A PHOTOPOLYMER COATING FOR HOLOGRAPHIC EXPOSURE AND A LACQUER LAYER WITH HIGH RESISTANCE | COVESTRO INTELLECTUAL PROPERTY GMBH & CO KG (DE) | 2022-04-27 | — | — | EP | disclosed |
| CN-114316403-A | Ultraviolet light crosslinking heat-shrinkable tube material and preparation method thereof | 中广核高新核材科技（苏州）有限公司 | 2022-04-12 | — | — | CN | disclosed |
| CN-107922360-B | Substituted triazines and process for their preparation | 科思创德国股份有限公司 | 2021-05-25 | — | — | CN | disclosed |
| US-5998496-A | ABSORBING RADIATION | SPECTRA GROUP LIMITED, INC. (US) | 1999-12-07 | — | — | US | disclosed |
| EP-0871607-A4 | PHOTOSENSITIVE INTRAMOLECULAR ELECTRON TRANSFER COMPOUNDS | SPECTRA GROUP LTD INC (US) | 1999-09-29 | — | — | EP | disclosed |
| EP-0871607-A1 | PHOTOSENSITIVE INTRAMOLECULAR ELECTRON TRANSFER COMPOUNDS | SPECTRA GROUP LIMITED INC (US) | 1998-10-21 | — | — | EP | disclosed |
| JP-H10182767-A | FILAMENT WINDING PROCESS | SHOWA HIGHPOLYMER CO LTD | 1998-07-07 | — | — | JP | disclosed |
| US-5681685-A | HIGH SENSITIVITY TO VISIBLE LIGHT | KYOWA HAKKO KOGYO CO., LTD. (JP) | 1997-10-28 | — | — | US | disclosed |
| WO-1997016406-A1 | PHOTOSENSITIVE INTRAMOLECULAR ELECTRON TRANSFER COMPOUNDS | SPECTRA GROUP LIMITED, INC. (US) | 1997-05-09 | — | — | WO | disclosed |
| EP-0729945-A1 | PHOTOPOLYMERIZABLE COMPOSITION CONTAINING SQUARYLIUM COMPOUND | KYOWA HAKKO KOGYO CO., LTD. (JP) | 1996-09-04 | — | — | EP | disclosed |
| JP-H08217813-A | PHOTOINITIATOR COMPOSITION, PHOTOPOLYMERIZABLE COMPOSITION AND PHOTOPOLYMERIZATION METHOD | TOYO INK MFG CO LTD | 1996-08-27 | — | — | JP | disclosed |
| US-5153100-A | Hexaarylbisimidazole and-or p-dialkylaminophenyl carbonyl compound | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-10-06 | — | — | US | disclosed |
| EP-0475153-A1 | Borate coinitiators for photopolymerizable compositions | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-03-18 | — | — | EP | disclosed |