SCHEMBL3625232

SCHEMBL3625232

COc1ccc(O[C@H]2O[C@H](COCc3ccccc3)[C@@H](O)[C@H](OCc3ccccc3)[C@@H]2N2C(=O)c3ccccc3C2=O)cc1

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ LGALS3 P17931 1/20 0.43
▸ GJB2 P29033 2/20 0.41
▸ GJA1 P17302 1/20 0.41
▸ NT5E P21589 1/20 0.40
▸ SSTR4 P31391 2/20 0.39
▸ PTPN1 P18031 6/20 0.39
▸ PTPN2 P17706 3/20 0.39
▸ SSTR5 P35346 2/20 0.38
▸ CDC25B P30305 5/20 0.38
▸ GRM5 P41594 1/20 0.37
▸ TACR2 P21452 1/20 0.37
▸ PTPN6 P29350 2/20 0.37
▸ PTPN11 Q06124 2/20 0.37
▸ SLC6A2 P23975 1/20 0.36
▸ SSTR1 P30872 1/20 0.36
▸ SSTR2 P30874 1/20 0.36
▸ SSTR3 P32745 1/20 0.36
▸ RAB9A P51151 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3625228 1.00 LGALS3 (0.43) LGALS3GJB2GJA1NT5ESSTR4
SCHEMBL26506298 1.00 LGALS3 (0.43) LGALS3GJB2GJA1NT5ESSTR4
SCHEMBL4178365 0.91 NT5E (0.41) LGALS3GJB2GJA1NT5ESSTR4
SCHEMBL3628589 0.91 LGALS3 (0.51) LGALS3GRM5SLC6A2RAB9A
SCHEMBL3628586 0.91 LGALS3 (0.51) LGALS3GRM5SLC6A2RAB9A
SCHEMBL5011579 0.91 SLC6A2 (0.41) LGALS3GJB2GJA1GRM5SLC6A2
SCHEMBL4169540 0.88 LGALS3 (0.40) LGALS3SSTR4PTPN1PTPN2SSTR5
SCHEMBL3756883 0.88 NT5E (0.43) NT5EPTPN1PTPN2CDC25BPTPN6
SCHEMBL27002581 0.88 NT5E (0.43) NT5EPTPN1PTPN2CDC25BPTPN6
SCHEMBL3756881 0.88 NT5E (0.43) NT5EPTPN1PTPN2CDC25BPTPN6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10144849-B2 Polishing composition and polishing method using the same FUJIMI INCORPORATED (JP) 2018-12-04 — — US disclosed
US-20100301014-A1 Polishing Composition and Polishing Method Using the Same FUJIMI INCORPORATED (JP) 2010-12-02 — — US disclosed
EP-2237311-A1 POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME FUJIMI INCORPORATED (JP) 2010-10-06 — — EP disclosed
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