SCHEMBL3628589

SCHEMBL3628589

COc1ccc(O[C@H]2O[C@H](CO)[C@@H](O)[C@H](OCc3ccccc3)[C@@H]2N2C(=O)c3ccccc3C2=O)cc1

nearest known ligand 0.51

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
▸ LGALS3 P17931 3/20 0.51
▸ SLC6A2 P23975 1/20 0.43
▸ NPC1 O15118 4/20 0.43
▸ RAB9A P51151 4/20 0.43
▸ LGALS8 O00214 3/20 0.43
▸ SLC5A1 P13866 1/20 0.43
▸ SLC5A2 P31639 1/20 0.43
▸ IL2 P60568 1/20 0.40
▸ CYP3A4 P08684 1/20 0.39
▸ CYP2D6 P10635 1/20 0.39
▸ TYR P14679 1/20 0.39
▸ GRM5 P41594 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3628586 1.00 LGALS3 (0.51) LGALS3SLC6A2NPC1RAB9ALGALS8
SCHEMBL6553208 0.93 LGALS3 (0.46) LGALS3SLC6A2NPC1RAB9ALGALS8
SCHEMBL3625232 0.91 LGALS3 (0.43) LGALS3SLC6A2RAB9AGRM5
SCHEMBL3625228 0.91 LGALS3 (0.43) LGALS3SLC6A2RAB9AGRM5
SCHEMBL26506298 0.91 LGALS3 (0.43) LGALS3SLC6A2RAB9AGRM5
SCHEMBL8398753 0.88 LGALS8 (0.52) LGALS3SLC6A2LGALS8
SCHEMBL8398761 0.88 LGALS8 (0.52) LGALS3SLC6A2LGALS8
SCHEMBL4169540 0.86 LGALS3 (0.40) LGALS3SLC6A2NPC1RAB9ASLC5A1
SCHEMBL27001596 0.85 LGALS3 (0.46) LGALS3SLC6A2
SCHEMBL6553216 0.84 GRM5 (0.41) LGALS3RAB9AGRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10144849-B2 Polishing composition and polishing method using the same FUJIMI INCORPORATED (JP) 2018-12-04 — — US disclosed
US-20100301014-A1 Polishing Composition and Polishing Method Using the Same FUJIMI INCORPORATED (JP) 2010-12-02 — — US disclosed
EP-2237311-A1 POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME FUJIMI INCORPORATED (JP) 2010-10-06 — — EP disclosed
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