SCHEMBL3625571

SCHEMBL3625571

Cc1c(C(c2cc(O)c(O)c(O)c2C)c2cc(O)c(O)c(O)c2C)cc(O)c(O)c1O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SELL P14151 1/20 0.42
SELP P16109 1/20 0.42
SELE P16581 1/20 0.42
GABRA1 P14867 1/20 0.37
GABRB2 P47870 1/20 0.37
ACHE P22303 1/20 0.36
ADRA1A P35348 3/20 0.32
TRPA1 O75762 1/20 0.32
LMNA P02545 1/20 0.32
CHRM1 P11229 1/20 0.32
SLC6A2 P23975 1/20 0.32
HTR2B P41595 1/20 0.32
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
ALDH1A1 P00352 2/20 0.31
MAPT P10636 2/20 0.31
APEX1 P27695 2/20 0.31
RECQL P46063 2/20 0.31
KMT2A Q03164 2/20 0.31
KDM4E B2RXH2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5523844 0.83 GABRA1 (0.50) SELLSELPSELEGABRA1GABRB2
SCHEMBL5521906 0.76 TSHR (0.48) SELLSELPSELEGABRA1GABRB2
SCHEMBL4061848 0.73 TRPA1 (0.36) SELLSELPSELEGABRA1GABRB2
SCHEMBL2220478 0.73 SELL (0.50) SELLSELPSELEACHETRPA1
SCHEMBL5950381 0.72 ESR1 (0.43) GABRA1GABRB2ADRA1ATRPA1LMNA
SCHEMBL145247 0.70 SELL (0.48) SELLSELPSELEACHETRPA1
Methane SCHEMBL2219191 0.70 SELL (0.48) SELLSELPSELEACHETRPA1
SCHEMBL24451040 0.70 CA1 (0.42) SELLSELPSELEACHELMNA
SCHEMBL28849208 0.68 CA1 (0.46) SELLSELPSELEGABRA1GABRB2
SCHEMBL634558 0.67 SELL (0.50) SELLSELPSELEGABRA1GABRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2228400-B1 NOVEL POLYIMIDE SILICONE, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE NOVEL POLYIMIDE SILICONE, AND METHOD FOR PATTERN FORMATION SHINETSU CHEMICAL CO (JP) 2016-04-27 EP disclosed
EP-2228400-A1 Novel polyimide silicone, photosensitive resin composition containing the novel polyimide silicone, and method for pattern formation Shin-Etsu Chemical Co., Ltd. (JP) 2010-09-15 EP disclosed