SCHEMBL3628533

SCHEMBL3628533

CCCCCCCCCCCCCCCCN1CC(=O)NC1=O

nearest known ligand 0.45

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 2/20 0.45
CRBN Q96SW2 1/20 0.43
GBA1 P04062 1/20 0.42
PTGS1 P23219 3/20 0.41
PTGS2 P35354 3/20 0.41
MGLL Q99685 3/20 0.41
FAAH O00519 3/20 0.41
CYP4F2 P78329 1/20 0.39
CYP4A11 Q02928 1/20 0.39
ALDH1A1 P00352 2/20 0.38
DUT P33316 1/20 0.37
CYP1A2 P05177 1/20 0.37
CYP2D6 P10635 1/20 0.37
CYP2C19 P33261 1/20 0.37
KDM4E B2RXH2 1/20 0.37
LMNA P02545 1/20 0.37
NAAA Q02083 1/20 0.37
PLA2G2A P14555 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6233785 1.00 ALOX5 (0.45) ALOX5CRBNGBA1PTGS1PTGS2
SCHEMBL20376257 1.00 ALOX5 (0.45) ALOX5CRBNGBA1PTGS1PTGS2
SCHEMBL20441211 1.00 ALOX5 (0.45) ALOX5CRBNGBA1PTGS1PTGS2
SCHEMBL6228568 1.00 ALOX5 (0.45) ALOX5CRBNGBA1PTGS1PTGS2
SCHEMBL6233217 1.00 ALOX5 (0.45) ALOX5CRBNGBA1PTGS1PTGS2
SCHEMBL8716131 1.00 ALOX5 (0.45) ALOX5CRBNGBA1PTGS1PTGS2
SCHEMBL162839 1.00 ALOX5 (0.45) ALOX5CRBNGBA1PTGS1PTGS2
SCHEMBL461664 0.98 CRBN (0.45) ALOX5CRBNGBA1PTGS1PTGS2
SCHEMBL194067 0.92 CRBN (0.46) ALOX5CRBNGBA1CYP4F2CYP4A11
SCHEMBL4190795 0.90 CRBN (0.46) ALOX5CRBNPTGS1MGLLFAAH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10144849-B2 Polishing composition and polishing method using the same FUJIMI INCORPORATED (JP) 2018-12-04 US disclosed
CN-103131330-B Composition for polishing and use its Ginding process FUJIMI INC. (JP) 2015-09-23 CN disclosed
CN-103131330-A Polishing composition and polishing method using the same FUJIMI INC 2013-06-05 CN disclosed
US-20100301014-A1 Polishing Composition and Polishing Method Using the Same FUJIMI INCORPORATED (JP) 2010-12-02 US disclosed
EP-2237311-A1 POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME FUJIMI INCORPORATED (JP) 2010-10-06 EP disclosed