SCHEMBL3631929

SCHEMBL3631929

COc1ccc(/C=C/c2ncnc(C(Cl)(Cl)Cl)n2)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.46
CYP1A2 P05177 3/20 0.45
KDM4E B2RXH2 3/20 0.45
CYP3A4 P08684 2/20 0.45
NPC1 O15118 1/20 0.45
CYP2D6 P10635 1/20 0.45
CYP2C9 P11712 1/20 0.45
HPGD P15428 1/20 0.45
CYP2C19 P33261 1/20 0.45
RAB9A P51151 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
RELA Q04206 3/20 0.44
TRPA1 O75762 1/20 0.44
NFE2L2 Q16236 2/20 0.43
AHR P35869 2/20 0.43
CYP1A1 P04798 3/20 0.42
CYP1B1 Q16678 3/20 0.42
ESR1 P03372 2/20 0.42
PTGS2 P35354 2/20 0.42
ABL1 P00519 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2176634 1.00 MAPT (0.46) MAPTCYP1A2KDM4ECYP3A4NPC1
SCHEMBL5185776 0.86 CYP1A1 (0.49) MAPTCYP1A2KDM4ENPC1RAB9A
SCHEMBL21940412 0.85 CYP1A2 (0.50) MAPTCYP1A2KDM4ECYP3A4NPC1
SCHEMBL51497 0.85 CYP1A2 (0.50) MAPTCYP1A2KDM4ECYP3A4NPC1
SCHEMBL51498 0.85 CYP1A2 (0.50) MAPTCYP1A2KDM4ECYP3A4NPC1
SCHEMBL28939703 0.84 NFE2L2 (0.38) MAPTCYP1A2KDM4ECYP3A4NPC1
Hydrogen Sulfide SCHEMBL30503988 0.84 CYP1A2 (0.49) MAPTCYP1A2KDM4ECYP3A4NPC1
SCHEMBL21253271 0.82 MAPT (0.48) MAPTCYP1A2HPGDSMN1; SMN2NFE2L2
SCHEMBL8413671 0.81 PPARA (0.37) CYP3A4SMN1; SMN2PTGS2ALDH1A1PTGS1
SCHEMBL940017 0.80 KDM4E (0.44) KDM4ECYP3A4NPC1CYP2D6CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 590 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0003263-B1 A METHOD OF FORMING AN IMAGE, AND AN IMAGING ELEMENT FOR INHIBITING IMAGE FORMATION WITH COBALT (III) COMPLEXES EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1982-09-29 EP claimed
CN-118363263-A Colored photosensitive resin composition, color filter and image display device 东友精细化工有限公司 2024-07-19 CN disclosed
CN-113946102-B Photosensitive resin composition, photosensitive resin film using same, and color filter 三星SDI株式会社 2024-07-09 CN disclosed
CN-115572492-B Core-shell compound, photosensitive resin composition, photosensitive resin layer, color filter and CMOS image sensor 三星SDI株式会社 2024-07-09 CN disclosed
CN-118318193-A Circular polarizing plate with adhesive layer 住友化学株式会社 2024-07-09 CN disclosed
WO-2024144106-A2 COLORED PHOTOSENSITIVE RESIN COMPOSITION FOR SOLID-STATE IMAGING DEVICE, COLOR FILTER, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2024-07-04 WO disclosed
WO-2024143786-A1 OPTICAL LAMINATE, METHOD FOR MANUFACTURING SAME, AND SMART WINDOW COMPRISING SAME 동우 화인켐 주식회사 2024-07-04 WO disclosed
WO-2024143787-A1 RED PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER PREPARED USING SAME, AND SOLID-STATE IMAGING DEVICE OR DISPLAY APPARATUS COMPRISING SAME 동우 화인켐 주식회사 2024-07-04 WO disclosed
CN-118276408-A Photosensitive resin composition, photo-cured pattern formed thereby, and display device including photo-cured pattern 东友精细化工有限公司 2024-07-02 CN disclosed
CN-112280567-B Composition comprising compound functioning as dichromatic pigment 住友化学株式会社 2024-06-25 CN disclosed
WO-2007057413-A1 METHOD OF MAKING A LITHOGRAPHIC PRINTING PLATE AGFA GRAPHICS NV (BE) 2007-05-24 WO disclosed
WO-2007057348-A1 METHOD OF MAKING A LITHOGRAPHIC PRINTING PLATE AGFA GRAPHICS NV (BE) 2007-05-24 WO disclosed
WO-2007057337-A2 METHOD OF MAKING A LITHOGRAPHIC PRINTING PLATE AGFA GRAPHICS NV (BE) 2007-05-24 WO disclosed
WO-2007057333-A1 METHOD OF MAKING A LITHOGRAPHIC PRINTING PLATE AGFA GRAPHICS NV (BE) 2007-05-24 WO disclosed
EP-1765592-A1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR Agfa Graphics N.V. (BE) 2007-03-28 EP disclosed
WO-2006136543-A2 INFRARED ABSORBING DYE AGFA GRAPHICS NV (BE) 2006-12-28 WO disclosed
WO-2006136537-A1 HEAT-SENSITIVE IMAGING ELEMENT AGFA GRAPHICS NV (BE) 2006-12-28 WO disclosed
WO-2006005688-A1 METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR. AGFA-GEVAERT (BE) 2006-01-19 WO disclosed
CN-1612042-A Colouring photosensitive resin composition SUMITOMO CHEMICAL CO (JP) 2005-05-04 CN disclosed
EP-0003263-A1 A method of forming an image, and an imaging element for inhibiting image formation with cobalt (III) complexes EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1979-08-08 EP disclosed