SCHEMBL36335

SCHEMBL36335

CCC1(COc2ccc(-c3ccc(OCC4(CC)COC4)cc3)cc2)COC1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.37
CYP3A4 P08684 3/20 0.36
CYP2D6 P10635 3/20 0.36
NQO1 P15559 1/20 0.35
CYP1A2 P05177 2/20 0.34
CYP19A1 P11511 2/20 0.34
CYP2C9 P11712 2/20 0.34
CYP2C19 P33261 2/20 0.34
ALDH1A1 P00352 2/20 0.33
HPGD P15428 2/20 0.33
POLB P06746 1/20 0.33
HSD17B10 Q99714 1/20 0.33
USP2 O75604 1/20 0.33
FKBP1A P62942 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
HRH2 P25021 1/20 0.33
HRH1 P35367 1/20 0.33
RAB9A P51151 3/20 0.33
NPC1 O15118 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL36226 0.94 TSHR (0.40) TSHRNQO1CYP1A2ALDH1A1POLB
SCHEMBL14087672 0.92 TSHR (0.36) TSHRCYP3A4CYP2D6CYP2C9ALDH1A1
SCHEMBL2623388 0.92 TSHR (0.34) TSHRCYP3A4CYP2D6NQO1CYP1A2
SCHEMBL14087660 0.89 LTA4H (0.37) TSHRALDH1A1HPGDMEN1KMT2A
SCHEMBL14087616 0.89 USP2 (0.39) TSHRCYP3A4CYP1A2CYP2C9CYP2C19
SCHEMBL21089712 0.89 LTA4H (0.40) TSHRNQO1CYP1A2ALDH1A1POLB
SCHEMBL11917939 0.88 TSHR (0.35) TSHRCYP3A4CYP2D6NQO1CYP1A2
SCHEMBL14087659 0.88 ESR2 (0.41) TSHR
SCHEMBL1127852 0.88 TSHR (0.39) TSHRCYP3A4NQO1CYP1A2CYP2C9
SCHEMBL14075165 0.87 RARB (0.39) CYP3A4CYP2D6CYP1A2CYP19A1CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 254 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260099093-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND METHOD FOR PRODUCING POLYIMIDE FILM USING SAME ASAHI KASEI KABUSHIKI KAISHA (JP) 2026-04-09 US disclosed
US-20260063999-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM ASAHI KASEI KABUSHIKI KAISHA (JP) 2026-03-05 US disclosed
EP-4692937-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER Toray Industries, Inc. (JP) 2026-02-11 EP disclosed
EP-4691764-A1 HEAT-ADHESIVE LAMINATE Toagosei Co., Ltd. (JP) 2026-02-11 EP disclosed
US-20260035592-A1 CATIONICALLY POLYMERIZABLE RESIN COMPOSITION FOR THREE-DIMENSIONAL PHOTOFABRICATION AND METHOD FOR PRODUCING THREE-DIMENSIONAL PHOTOFABRICATED PRODUCT TOKUYAMA DENTAL CORPORATION (JP) 2026-02-05 US disclosed
EP-3593390-B1 FILM ELECTRODE, RESIN LAYER FORMING INK AND ELECTRODE PRINTING METHOD RICOH CO LTD (JP) 2025-09-17 EP disclosed
US-20250251663-A1 PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM ASAHI KASEI KABUSHIKI KAISHA (JP) 2025-08-07 US disclosed
US-20250206970-A1 INK COMPOSITION, LIGHT-BLOCKING MEMBER AND IMAGE DISPLAY DEVICE NATOCO CO., LTD. (JP) 2025-06-26 US disclosed
EP-4567936-A2 FILM ELECTRODE, RESIN LAYER FORMING INK AND ELECTRODE PRINTING METHOD Ricoh Company, Ltd. (JP) 2025-06-11 EP disclosed
WO-2025100302-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND SEMICONDUCTOR DEVICE 旭化成株式会社 2025-05-15 WO disclosed
EP-1528088-A1 Inkjet ink Toshiba Tec Kabushiki Kaisha (JP) 2005-05-04 EP disclosed
US-20050090580-A1 Ink for ink jet recording KABUSHIKI KAISHA TOSHIBA 2005-04-28 US disclosed
US-20050090582-A1 Pigment dispersion, precursor of ink for UV-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion RISO TECHNOLOGIES CORPORATION (JP) 2005-04-28 US disclosed
US-20050068593-A1 Holographic optical recording medium, manufacturing method thereof and holographic optical recording method KABUSHIKI KAISHA TOSHIBA 2005-03-31 US disclosed
US-20050057630-A1 Ink for ink jet and ink jet recording apparatus TOSHIBA TEC KABUSHIKI KAISHA (JP) 2005-03-17 US disclosed
EP-1514911-A1 Ink for ink jet and ink jet recording apparatus Toshiba Tec Kabushiki Kaisha (JP) 2005-03-16 EP disclosed
US-20040186195-A1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORPORATION (JP) 2004-09-23 US disclosed
US-20040132853-A1 Photocationic polymerization initiator and photocationically polymerizable composition TOKUYAMA CORPORATION (JP) 2004-07-08 US disclosed
EP-1431315-A2 Photopolymerization initiator and photopolymerizable composition Tokuyama Corporation (JP) 2004-06-23 EP disclosed
EP-1422254-A2 Photocationic polymerization initiator and photocationically polymerizable composition Tokuyama Corporation (JP) 2004-05-26 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260099093-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND METHOD FOR PRODUCING POLYIMIDE FILM USING SAME CD79B, ITGA1, PTK2 TSHR 2388/4885CYP3A4 4196/4885CYP2D6 4544/4885
US-20260035592-A1 CATIONICALLY POLYMERIZABLE RESIN COMPOSITION FOR THREE-DIMENSIONAL PHOTOFABRICATION AND METHOD FOR PRODUCING THREE-DIMENSIONAL PHOTOFABRICATED PRODUCT TERB1, CAD, C9 TSHR 2090/4885CYP3A4 1790/4885CYP2D6 2932/4885
US-20260063999-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM ARCN1, PBRM1, LCP1 TSHR 4458/4885CYP3A4 4411/4885CYP2D6 4522/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.