Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | ELANE | P08246 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3182587 | 0.84 | SCN1A (0.32) | ALDH1A1 | |
| SCHEMBL3856231 | 0.83 | GLA (0.32) | ALDH1A1 | |
| SCHEMBL15205966 | 0.80 | TSHR (0.31) | ALDH1A1 | |
| SCHEMBL5668031 | 0.80 | TGM2 (0.34) | — | |
| SCHEMBL18823007 | 0.79 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL15205287 | 0.79 | EPHX2 (0.31) | ALDH1A1EPHX2 | |
| SCHEMBL13244778 | 0.78 | ALDH1A1 (0.34) | ALDH1A1EPHX2 | |
| SCHEMBL1069286 | 0.77 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL15206176 | 0.77 | MEN1 (0.32) | ALDH1A1EPHX2 | |
| SCHEMBL5693012 | 0.76 | SCN1A (0.31) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12386265-B2 | Pattern forming method and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2025-08-12 | — | — | US | disclosed |
| US-12264073-B2 | Composite material | ADEKA CORPORATION (JP) | 2025-04-01 | — | — | US | disclosed |
| US-20240295822-A1 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-09-05 | — | — | US | disclosed |
| US-12013644-B2 | Method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-06-18 | — | — | US | disclosed |
| US-11584810-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method of manufacturing electronic device, compound, and resin | FUJIFILM CORPORATION (JP) | 2023-02-21 | — | — | US | disclosed |
| EP-3537217-B1 | POSITIVE RESIST COMPOSITION, RESIN USED FOR THE POSITIVE RESIST COMPOSITION, COMPOUND USED FOR SYNTHESIS OF THE RESIN AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM CORP (JP) | 2022-08-31 | — | — | EP | disclosed |
| CN-109643064-B | Photosensitive or radiation-sensitive resin composition, film thereof, pattern forming method, electronic device manufacturing method, compound, and resin | 富士胶片株式会社 | 2022-07-26 | — | — | CN | disclosed |
| CN-114706271-A | Processing liquid for semiconductor manufacturing and pattern forming method | 富士胶片株式会社 | 2022-07-05 | — | — | CN | disclosed |
| US-20220121123-A1 | METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2022-04-21 | — | — | US | disclosed |
| CN-108885412-B | Processing liquid for semiconductor manufacturing and pattern forming method | 富士胶片株式会社 | 2022-04-05 | — | — | CN | disclosed |
| US-20070224539-A1 | Resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2007-09-27 | — | — | US | disclosed |
| EP-1837704-A2 | Resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2007-09-26 | — | — | EP | disclosed |
| US-20070178405-A1 | Positive resist composition and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2007-08-02 | — | — | US | disclosed |
| US-20070134588-A1 | Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-14 | — | — | US | disclosed |
| EP-1795960-A2 | Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition | Fujifilm Corporation (JP) | 2007-06-13 | — | — | EP | disclosed |
| EP-1754999-A2 | Positive resist composition and method of pattern formation with the same | Fuji Photo Film Co., Ltd. (JP) | 2007-02-21 | — | — | EP | disclosed |
| US-6824956-B2 | ADDITION POLYMER CONTAINING UNITS OF AN ADAMANTYL ESTER HAVING HYDROXY GROUPS | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-30 | — | — | US | disclosed |
| US-20040191676-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2004-09-30 | — | — | US | disclosed |
| US-20030194640-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-10-16 | — | — | US | disclosed |
| EP-1338922-A2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-08-27 | — | — | EP | disclosed |