SCHEMBL36464

SCHEMBL36464

O=[La]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4650616 0.87
SCHEMBL643892 0.87
SCHEMBL1260731 0.87
SCHEMBL2022399 0.87
SCHEMBL22076973 0.87
SCHEMBL17866181 0.87
SCHEMBL1889452 0.87
SCHEMBL484009 0.87
SCHEMBL492830 0.87
SCHEMBL407672 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 103039 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260148904-A1 CAPACITOR STRUCTURE AND MANUFACTURING METHOD THEREOF NANYA TECHNOLOGY CORPORATION (TW) 2026-05-28 US claimed
US-20260150291-A1 VERTICAL NON-VOLATILE MEMORY DEVICE, ELECTRONIC APPARATUS INCLUDING THE SAME, AND METHOD OF MANUFACTURING VERTICAL NON-VOLATILE MEMORY DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2026-05-28 US claimed
EP-3501646-B1 CATALYTICALLY ACTIVE PARTICLE FILTER UMICORE AG & CO KG (DE) 2026-05-27 EP claimed
US-12642021-B2 Methods for patterning substrates to adjust voltage properties APPLIED MATERIALS, INC. (US) 2026-05-26 US claimed
US-12637764-B2 Multilayer ALD coating for critical components in process chamber TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-05-26 US claimed
CN-121204457-B Preparation method of high-density cobalt-free nano tungsten carbide hard alloy Suzhou haten Technology Co.,Ltd. (CN) 2026-05-26 CN claimed
CN-116902917-B Electrification method for catalyzing dry reforming reaction and system applying same NINGBO INSTITUTE OF MATERIALS TECHNOLOGY & ENGINEERING, CHINESE ACADEMY OF SCIENCES (CN) 2026-05-26 CN claimed
CN-122075394-A Ionizing radiation protective adhesive and preparation method thereof 2026-05-26 CN claimed
US-12641802-B2 Liner to form composite high-K dielectric APPLIED MATERIALS, INC. (US) 2026-05-26 US claimed
CN-122094103-A Capacitor structure and manufacturing method thereof 2026-05-26 CN claimed
US-3970591-A LANTHANUM, CUPROUS AND FERRIC OXIDES THE BENDIX CORPORATION (US) 1976-07-20 US claimed
US-3969125-A Heat resistive and reinforced composite material TOKYO SHIBAURA ELECTRIC CO., LTD. (JA) 1976-07-13 US claimed
US-3968412-A Thick film capacitor GENERAL ELECTRIC COMPANY (US) 1976-07-06 US claimed
US-3968303-A BERYLLIUM OXIDE THE BENDIX CORPORATION (US) 1976-07-06 US claimed
US-3962406-A Method of manufacturing silicon carbide crystals U.S. PHILIPS CORPORATION (US) 1976-06-08 US claimed
US-3953579-A LANTHANUM SILICIDE, REDUCING LANTHANUM OXIDE AND METAL SILICIDE CABOT CORPORATION (US) 1976-04-27 US claimed
US-3948798-A Titanium-activated lanthanum oxysulfide phosphor and method of preparing same GTE SYLVANIA INCORPORATED (US) 1976-04-06 US claimed
US-3935457-A Dielectric material for dosimeters WISCONSIN ALUMNI RESEARCH FOUNDATION (US) 1976-01-27 US claimed
US-3934061-A Method of forming planar optical waveguides CORNING GLASS WORKS (US) 1976-01-20 US claimed
US-3931050-A PLATINUM-METAL OXIDE NIPPON SOKEN, INC. (JA) 1976-01-06 US claimed