⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36464 | 0.87 | — | — | |
| SCHEMBL643892 | 0.75 | — | — | |
| SCHEMBL1889452 | 0.75 | — | — | |
| SCHEMBL17866181 | 0.75 | — | — | |
| SCHEMBL22076973 | 0.75 | — | — | |
| SCHEMBL4650616 | 0.75 | — | — | |
| SCHEMBL492830 | 0.75 | — | — | |
| SCHEMBL407672 | 0.75 | — | — | |
| SCHEMBL1260731 | 0.75 | — | — | |
| SCHEMBL2022399 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2415899-A1 | LANTHANUM TARGET FOR SPUTTERING | JX Nippon Mining & Metals Corporation (JP) | 2012-02-08 | — | — | EP | disclosed |
| EP-2412843-A1 | LANTHANUM TARGET FOR SPUTTERING | JX Nippon Mining & Metals Corporation (JP) | 2012-02-01 | — | — | EP | disclosed |
| US-20110114481-A1 | Lanthanum Oxide-based Sintered Compact, Sputtering Target Composed of said Sintered Compact, Method of Producing Lanthanum Oxide-based Sintered Compact, and Method of Producing Sputtering Target based on said Production Method | JX NIPPON MINING & METALS CORPORATION (JP) | 2011-05-19 | — | — | US | disclosed |
| US-20110114482-A1 | Oxide Sintered Compact, Sputtering Target Composed of the Sintered Compact, and Method of Producing the Sintered Compact and the Sintered Compact Sputtering Target | JX NIPPON MINING & METALS CORPORATION (JP) | 2011-05-19 | — | — | US | disclosed |
| EP-2298715-A1 | LANTHANUM OXIDE-BASED SINTERED OBJECT, SPUTTERING TARGET COMPRISING THE SINTERED OBJECT, PROCESS FOR PRODUCING LANTHANUM OXIDE-BASED SINTERED OBJECT, AND PROCESS FOR SPUTTERING TARGET PRODUCTION USING THE PROCESS | JX Nippon Mining & Metals Corporation (JP) | 2011-03-23 | — | — | EP | disclosed |
| EP-2298712-A1 | OXIDE SINTERED OBJECT, SPUTTERING TARGET COMPRISING THE SINTERED OBJECT, PROCESS FOR PRODUCING THE SINTERED OBJECT, AND PROCESS FOR PRODUCING SPUTTERING TARGET COMPRISING THE SINTERED OBJECT | JX Nippon Mining & Metals Corporation (JP) | 2011-03-23 | — | — | EP | disclosed |