Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.38 |
| ▸ | DDAH1 | O94760 | 1/20 | 0.38 |
| ▸ | GAPDH | P04406 | 1/20 | 0.38 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.38 |
| ▸ | SPHK1 | Q9NYA1 | 2/20 | 0.38 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.35 |
| ▸ | GMNN | O75496 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | THPO | P40225 | 1/20 | 0.35 |
| ▸ | MTOR | P42345 | 1/20 | 0.35 |
| ▸ | BLM | P54132 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Vinyl Ether SCHEMBL25176276 | 1.00 | MAPT (0.38) | MAPTTRPA1DDAH1GAPDHGPR84 | |
| Vinyl Ether SCHEMBL755749 | 0.98 | GPR84 (0.41) | MAPTGPR84SPHK1FFAR1LMNA | |
| Vinyl Ether SCHEMBL2130925 | 0.98 | GPR84 (0.41) | MAPTGPR84SPHK1FFAR1LMNA | |
| Vinyl Ether SCHEMBL2453035 | 0.98 | GPR84 (0.41) | MAPTGPR84SPHK1FFAR1LMNA | |
| Vinyl Ether SCHEMBL6025388 | 0.94 | LMNA (0.38) | MAPTTRPA1DDAH1GAPDHGPR84 | |
| Vinyl Ether SCHEMBL2954221 | 0.94 | LMNA (0.38) | MAPTTRPA1DDAH1GAPDHGPR84 | |
| Cyclohexane SCHEMBL6913821 | 0.91 | GPR84 (0.36) | MAPTGPR84SPHK1FFAR1LMNA | |
| Vinyl Ether SCHEMBL6025391 | 0.91 | MAPT (0.33) | MAPTTRPA1DDAH1GAPDHGPR84 | |
| Vinyl Ether SCHEMBL10834012 | 0.89 | CYP3A4 (0.39) | MAPTGPR84SPHK1FFAR1LMNA | |
| Butadiene SCHEMBL8463080 | 0.84 | MAPT (0.42) | MAPTTRPA1DDAH1GAPDHGPR84 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4413 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6372849-B1 | — | — | None | — | — | US | claimed |
| US-12552948-B2 | Radiation curable ink jet ink composition and ink jet method | SEIKO EPSON CORPORATION (JP) | 2026-02-17 | — | — | US | claimed |
| CN-119317680-A | Fast curing flexible conductive one-part (1K) epoxy adhesive compositions | 汉高股份有限及两合公司 | 2025-01-14 | — | — | CN | claimed |
| CN-118879198-A | Organosilicon release agent, release film and preparation method thereof | 国家电投集团氢能科技发展有限公司 | 2024-11-01 | — | — | CN | claimed |
| US-20240278210-A1 | PREPARATION METHOD OF SUPER ABSORBENT POLYMER AND SUPER ABSORBENT POLYMER | LG CHEM, LTD. (KR) | 2024-08-22 | — | — | US | claimed |
| CN-110515270-B | Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device | 信越化学工业株式会社 | 2024-07-12 | — | — | CN | claimed |
| EP-4321561-A1 | PREPARATION METHOD OF SUPER ABSORBENT POLYMER AND SUPER ABSORBENT POLYMER | LG Chem, Ltd. (KR) | 2024-02-14 | — | — | EP | claimed |
| US-11693317-B2 | Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | claimed |
| WO-2022265475-A1 | PREPARATION METHOD OF SUPER ABSORBENT POLYMER AND SUPER ABSORBENT POLYMER | 주식회사 엘지화학 | 2022-12-22 | — | — | WO | claimed |
| CN-110016103-B | Modified carboxymethyl starch polymer and preparation method and application thereof | 福建清源科技有限公司 | 2021-08-31 | — | — | CN | claimed |
| US-5587441-A | Hyperbranched polymers from AB monomers | CORNELL RESEARCH FOUNDATION, INC. (US) | 1996-12-24 | — | — | US | claimed |
| US-5369164-A | Adhesives | BASF AKTIENGESELLSCHAFT (DE) | 1994-11-29 | — | — | US | claimed |
| US-5364738-A | Divinyl ethers, solubility in developers | FUJI PHOTO FILM CO., LTD. (JP) | 1994-11-15 | — | — | US | claimed |
| US-5352712-A | Modified polyurethane | BORDEN, INC. (US) | 1994-10-04 | — | — | US | claimed |
| EP-0565798-A1 | Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith | BORDEN, INC. (US) | 1993-10-20 | — | — | EP | claimed |
| WO-1993002119-A1 | CATIONIC POLYMERIZATION OF VINYL ETHERS WITHOUT COLOR FORMATION | ISP INVESTMENTS INC. (US) | 1993-02-04 | — | — | WO | claimed |
| EP-0402408-A4 | SOLVENT RESISTANT IRRADIATION CURABLE COATINGS | — | 1992-05-13 | — | — | EP | claimed |
| EP-0402408-A1 | SOLVENT RESISTANT IRRADIATION CURABLE COATINGS | GAF CHEMICALS CORPORATION (US) | 1990-12-19 | — | — | EP | claimed |
| US-4885319-A | DIVINYL ETHERS USED AS REACTIVE DILUENT FOR EPOXY RESINS | GAF CORPORATION (US) | 1989-12-05 | — | — | US | claimed |
| WO-1989007986-A1 | SOLVENT RESISTANT IRRADIATION CURABLE COATINGS | GAF CHEMICALS CORPORATION (US) | 1989-09-08 | — | — | WO | claimed |