Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 6/20 | 1.00 |
| ▸ | RAB9A | P51151 | 6/20 | 1.00 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 1.00 |
| ▸ | CASP3 | P42574 | 2/20 | 1.00 |
| ▸ | SENP8 | Q96LD8 | 2/20 | 1.00 |
| ▸ | SENP7 | Q9BQF6 | 2/20 | 1.00 |
| ▸ | SENP6 | Q9GZR1 | 2/20 | 1.00 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 1.00 |
| ▸ | PLA2G1B | P04054 | 2/20 | 1.00 |
| ▸ | ATG4B | Q9Y4P1 | 2/20 | 1.00 |
| ▸ | NFKB1 | P19838 | 1/20 | 1.00 |
| ▸ | NFKB2 | Q00653 | 1/20 | 1.00 |
| ▸ | RELA | Q04206 | 1/20 | 1.00 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.68 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.68 |
| ▸ | LMNA | P02545 | 3/20 | 0.68 |
| ▸ | ATM | Q13315 | 1/20 | 0.68 |
| ▸ | ELANE | P08246 | 1/20 | 0.55 |
| ▸ | MEN1 | O00255 | 3/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29402468 | 1.00 | NPC1 (1.00) | NPC1RAB9AALDH1A1CASP3SENP8 | |
| SCHEMBL867392 | 0.98 | NPC1 (0.96) | NPC1RAB9AALDH1A1CASP3SENP8 | |
| SCHEMBL13439536 | 0.94 | NPC1 (0.89) | NPC1RAB9AALDH1A1CASP3SENP8 | |
| SCHEMBL5724160 | 0.94 | NPC1 (0.88) | NPC1RAB9AALDH1A1CASP3SENP8 | |
| SCHEMBL13433263 | 0.94 | NPC1 (0.88) | NPC1RAB9AALDH1A1CASP3SENP8 | |
| Tectoquinone SCHEMBL27872640 | 0.91 | RAB9A (0.83) | NPC1RAB9AALDH1A1CASP3SENP8 | |
| Dichlon SCHEMBL18227115 | 0.91 | NPC1 (0.83) | NPC1RAB9AALDH1A1CASP3SENP8 | |
| SCHEMBL15383586 | 0.90 | NPC1 (0.81) | NPC1RAB9AALDH1A1CASP3SENP8 | |
| SCHEMBL4344332 | 0.89 | NPC1 (0.80) | NPC1RAB9AALDH1A1CASP3SENP8 | |
| SCHEMBL28207608 | 0.89 | NPC1 (0.80) | NPC1RAB9AALDH1A1CASP3SENP8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 9364 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122059817-A | Preparation method of 2-alkyl tetrahydroanthraquinone and application of 2-alkyl tetrahydroanthraquinone in hydrogen peroxide process | 黎明化工研究设计院有限责任公司 | 2026-05-19 | — | — | CN | claimed |
| US-20250387524-A1 | METHOD AND SYSTEM FOR THE PRODUCTION OF DISINFECTION AND/OR STERILISATION SOLUTIONS | ESTEVEZ COMPANY CARLOS (ES) | 2025-12-25 | — | — | US | claimed |
| US-20250237947-A1 | Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate | HANGZHOU FIRST ELECTRONIC MATERIAL CO., LTD (CN) | 2025-07-24 | — | — | US | claimed |
| CN-120157993-A | High-temperature-resistant PP bar and preparation method thereof | 赣州恒信塑业有限公司 | 2025-06-17 | — | — | CN | claimed |
| US-20250179316-A1 | PHOTORESIN AND METHOD FOR SURFACE PATTERNING OF A SOLID OBJECT | NATIONAL RESEARCH COUNCIL OF CANADA (CA) | 2025-06-05 | — | — | US | claimed |
| US-20250171566-A1 | LIQUID, HYBRID UV/VIS RADIATION CURABLE RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | STRATASYS INC (US) | 2025-05-29 | — | — | US | claimed |
| EP-4549429-A1 | METHOD AND SYSTEM FOR THE PRODUCTION OF DISINFECTION AND/OR STERILISATION SOLUTIONS | Universitat Jaume I (ES) | 2025-05-07 | — | — | EP | claimed |
| CN-119165729-A | Photosensitive resist ink and preparation method of metal grid line | 杭州福斯特电子材料有限公司 | 2024-12-20 | — | — | CN | claimed |
| US-20240384064-A1 | 3D PRINTING RESIN WITH SEPARATION EFFECT | Pro3dure Medical GmbH (DE) | 2024-11-21 | — | — | US | claimed |
| US-12134670-B2 | Composition used in 3D printing system, its application thereof | BASF SE (DE) | 2024-11-05 | — | — | US | claimed |
| US-4152230-A | PHOTOOXIDATION PROCESS | IMPERIAL CHEMICAL INDUSTRIES LIMITED (GB) | 1979-05-01 | — | — | US | claimed |
| US-4108666-A | USED AS ETCHING RESIST AND METAL PLATING RESIST | HITACHI CHEMICAL CO., LTD. (JP) | 1978-08-22 | — | — | US | claimed |
| US-4076537-A | Light-sensitive materials containing organo tellurium or selenium compounds and sensitizers | FUJI PHOTO FILM CO., LTD. (JA) | 1978-02-28 | — | — | US | claimed |
| US-4056665-A | Composition and process | OWENS-ILLINOIS, INC. (US) | 1977-11-01 | — | — | US | claimed |
| US-4046868-A | FROM AN ANTHRAQUINONE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-09-06 | — | — | US | claimed |
| US-4038227-A | BIODEGRADABLE | BIO-DEGRADABLE PLASTICS, INC. (US) | 1977-07-26 | — | — | US | claimed |
| US-4025348-A | DI-UNSATURATED COMPOUND, POLYMER WITH TETRAHYDROFURFURYL OR N-ALKOXYMETHYLCARBAMOYL GROUPS, DIEPOXIDE, SENSITIZER, CURING AGENT | HITACHI CHEMICAL COMPANY, LTD. (JA) | 1977-05-24 | — | — | US | claimed |
| US-3989610-A | ADHESIVES, PAINTS, PRINTED CIRCUITS, PLASTIC RELIEFS | HITACHI CHEMICAL COMPANY, LTD. (JA) | 1976-11-02 | — | — | US | claimed |
| US-3980483-A | Photocurable composition | NIPPON OIL SEAL INDUSTRY CO., LTD. (JA) | 1976-09-14 | — | — | US | claimed |
| US-3941759-A | A QUINONE PHOTOSENSITIZER AND A TRANSITION METAL DIALKYL-DITHIOCARBAMATE | OWENS-ILLINOIS, INC. (US) | 1976-03-02 | — | — | US | claimed |