⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6675485 | 0.55 | — | — | |
| SCHEMBL21873182 | 0.55 | — | — | |
| SCHEMBL9184129 | 0.54 | — | — | |
| SCHEMBL1503459 | 0.53 | — | — | |
| SCHEMBL377532 | 0.53 | — | — | |
| SCHEMBL1200901 | 0.53 | — | — | |
| SCHEMBL1448891 | 0.52 | ALDH1A1 (0.39) | — | |
| SCHEMBL21873191 | 0.50 | — | — | |
| SCHEMBL21905684 | 0.50 | — | — | |
| SCHEMBL21873098 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20050089632-A1 | Process for producing oxide films | ASM INTERNATIONAL N.V. (NL) | 2005-04-28 | — | — | US | claimed |
| EP-1030855-A4 | BISMUTH AMIDE COMPOUNDS AND COMPOSITIONS, AND METHOD OF FORMING BISMUTH-CONTAINING FILMS THEREWITH | ADVANCED TECH MATERIALS (US) | 2001-03-21 | — | — | EP | claimed |
| EP-1030855-A1 | BISMUTH AMIDE COMPOUNDS AND COMPOSITIONS, AND METHOD OF FORMING BISMUTH-CONTAINING FILMS THEREWITH | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2000-08-30 | — | — | EP | claimed |
| US-5902639-A | LIQUID DELIVERY VAPORIZATION OF A BISMUTH AMIDE SOURCE REAGENT TO FORM A BISMUTH-CONTAINING SOURCE VAPOR, AND DEPOSITION ON THE SUBSTRATE OF BISMUTH FROM THE BISMUTH-CONTAINING SOURCE VAPOR TO FORM THE BISMUTH LAYERBISMUTH-CONTAINING MATERIAL | ADVANCED TECHNOLOGY MATERIALS, INC (US) | 1999-05-11 | — | — | US | claimed |
| WO-1998043988-A1 | BISMUTH AMIDE COMPOUNDS AND COMPOSITIONS, AND METHOD OF FORMING BISMUTH-CONTAINING FILMS THEREWITH | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 1998-10-08 | — | — | WO | claimed |
| US-20240231224-A9 | HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS THEREOF | LAM RESEARCH CORPORATION | 2024-07-11 | — | — | US | disclosed |
| US-20240192590-A1 | APPARATUS AND PROCESS FOR EUV DRY RESIST SENSITIZATION BY GAS PHASE INFUSION OF A SENSITIZER | LAM RESEARCH CORPORATION | 2024-06-13 | — | — | US | disclosed |
| US-11988965-B2 | Underlayer for photoresist adhesion and dose reduction | LAM RESEARCH CORPORATION (US) | 2024-05-21 | — | — | US | disclosed |
| US-20240134274-A1 | HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS THEREOF | LAM RES CORP (US) | 2024-04-25 | — | — | US | disclosed |
| WO-2024064071-A1 | BAKE-SENSITIVE UNDERLAYERS TO REDUCE DOSE TO SIZE OF EUV PHOTORESIST | LAM RESEARCH CORPORATION (US) | 2024-03-28 | — | — | WO | disclosed |
| WO-2023215136-A1 | POST-DEVELOPMENT TREATMENT OF METAL-CONTAINING PHOTORESIST | LAM RESEARCH CORPORATION (US) | 2023-11-09 | — | — | WO | disclosed |
| US-20230314946-A1 | METHOD OF FORMING PHOTO-SENSITIVE HYBRID FILMS | LAM RESEARCH CORPORATION | 2023-10-05 | — | — | US | disclosed |
| US-20130206232-A1 | NANOWIRES AND METHODS OF MAKING AND USING | BOARD OF REGENTS OF THE UNIVERSITY OF TEXAS SYSTEM (US) | 2013-08-15 | — | — | US | disclosed |
| WO-2012009212-A2 | NANOWIRES AND METHODS OF MAKING AND USING | BOARD OF REGENTS OF THE UNIVERSITY OF TEXAS SYSTEM (US) | 2012-01-19 | — | — | WO | disclosed |
| US-7618681-B2 | Producing bismuth-containing ferroelectric or superconducting films by the Atomic Layer Deposition where a silylamido ligand is used as a source material for the bismuth; e.g. tris(bis(trimethylsilyl)amido)bismuth(III) | ASM INTERNATIONAL N.V. (NL) | 2009-11-17 | — | — | US | disclosed |
| US-20050089632-A1 | Process for producing oxide films | ASM INTERNATIONAL N.V. (NL) | 2005-04-28 | — | — | US | disclosed |
| EP-1030855-A4 | BISMUTH AMIDE COMPOUNDS AND COMPOSITIONS, AND METHOD OF FORMING BISMUTH-CONTAINING FILMS THEREWITH | ADVANCED TECH MATERIALS (US) | 2001-03-21 | — | — | EP | disclosed |
| EP-1030855-A1 | BISMUTH AMIDE COMPOUNDS AND COMPOSITIONS, AND METHOD OF FORMING BISMUTH-CONTAINING FILMS THEREWITH | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2000-08-30 | — | — | EP | disclosed |
| US-5902639-A | LIQUID DELIVERY VAPORIZATION OF A BISMUTH AMIDE SOURCE REAGENT TO FORM A BISMUTH-CONTAINING SOURCE VAPOR, AND DEPOSITION ON THE SUBSTRATE OF BISMUTH FROM THE BISMUTH-CONTAINING SOURCE VAPOR TO FORM THE BISMUTH LAYERBISMUTH-CONTAINING MATERIAL | ADVANCED TECHNOLOGY MATERIALS, INC (US) | 1999-05-11 | — | — | US | disclosed |
| WO-1998043988-A1 | BISMUTH AMIDE COMPOUNDS AND COMPOSITIONS, AND METHOD OF FORMING BISMUTH-CONTAINING FILMS THEREWITH | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 1998-10-08 | — | — | WO | disclosed |