SCHEMBL3666306

SCHEMBL3666306

C=CC(=O)OCCOC(C)OC

nearest known ligand 0.53

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.53
ALDH1A1 P00352 4/20 0.53
TP53 P04637 3/20 0.53
HIF1A Q16665 3/20 0.53
HSD17B10 Q99714 1/20 0.53
HPGD P15428 1/20 0.48
CYP3A4 P08684 2/20 0.48
THRB P10828 3/20 0.45
MAPK1 P28482 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
ATM Q13315 1/20 0.31
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11314768 0.95 TSHR (0.63) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL32689960 0.90 TSHR (0.59) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL15495137 0.85 TSHR (0.70) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL22829484 0.85 TSHR (0.70) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL668385 0.84 TSHR (0.52) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL472194 0.84 TSHR (0.52) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL7771147 0.84 TSHR (0.56) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL29099373 0.83 TSHR (0.55) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL5965104 0.83 TSHR (0.52) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL1171239 0.82 TSHR (0.59) TSHRALDH1A1TP53HIF1AHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8562122-B2 Ink jet inks having improved corrosion resistance for use in ink jet print heads comprising nickel or nickel alloys E I DU PONT DE NEMOURS AND COMPANY (US) 2013-10-22 US claimed
US-20100289858-A1 INK JET INKS HAVING IMPROVED CORROSION RESISTANCE FOR USE IN INK JET PRINT HEADS COMPRISING NICKEL OR NICKEL ALLOYS E. I. DU PONT DE NEMOURS AND COMPANY 2010-11-18 US claimed
EP-2235120-A1 INK JET INKS HAVING IMPROVED CORROSION RESISTANCE E. I. du Pont de Nemours and Company (US) 2010-10-06 EP claimed
EP-2235121-A1 INK JET INKS HAVING IMPROVED CORROSION RESISTANCE FOR USE IN INK JET PRINT HEADS COMPRISING NICKEL OR NICKEL ALLOYS E. I. du Pont de Nemours and Company (US) 2010-10-06 EP claimed
US-20090192261-A1 Ink jet inks having improved corrosion resistance ANTON WAIFONG LIEW 2009-07-30 US claimed
WO-2009094054-A1 INK JET INKS HAVING IMPROVED CORROSION RESISTANCE E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-07-30 WO claimed
WO-2009094053-A1 INK JET INKS HAVING IMPROVED CORROSION RESISTANCE FOR USE IN INK JET PRINT HEADS COMPRISING NICKEL OR NICKEL ALLOYS E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-07-30 WO claimed
EP-3158014-A1 RECIRCULATING INKJET PRINTING FLUID Eastman Kodak Company (US) 2017-04-26 EP disclosed
US-9523011-B2 Recirculating inkjet printing fluid EASTMAN KODAK COMPANY (US) 2016-12-20 US disclosed
WO-2015199983-A1 RECIRCULATING INKJET PRINTING FLUID EASTMAN KODAK COMPANY (US) 2015-12-30 WO disclosed
US-20150368488-A1 RECIRCULATING INKJET PRINTING FLUID BANK OF AMERICA, N.A., AS AGENT 2015-12-24 US disclosed
US-8562122-B2 Ink jet inks having improved corrosion resistance for use in ink jet print heads comprising nickel or nickel alloys E I DU PONT DE NEMOURS AND COMPANY (US) 2013-10-22 US disclosed
EP-1201641-B1 Composition of vinyl ether group containing (meth)acrylic acid ester and production method thereof NIPPON CATALYTIC CHEM IND (JP) 2013-08-14 EP disclosed
US-20070049768-A1 COMPOSITION OF VINYL ETHER GROUP CONTAINING (METH) ACRYLIC ACID ESTER AND PRODUCTION METHOD THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2007-03-01 US disclosed
US-20020143120-A1 Composition of vinyl ether group-containing (meth) acrylic acid ester and production method thereof NIPPON SHOKUBAI CO., LTD. 2002-10-03 US disclosed
EP-1201641-A2 Composition of vinyl ether group containing (meth)acrylic acid ester and production method thereof Nippon Shokubai Co., Ltd. (JP) 2002-05-02 EP disclosed
EP-0343642-B1 Silver halide photographic material FUJI PHOTO FILM CO LTD (JP) 1997-01-22 EP disclosed
US-H1016-H Polyester film support coated with latex shell-core polymers FUJI PHOTO FILM CO., LTD. (JP) 1992-01-07 US disclosed
US-4977071-A CONTAINING VINYLIDENE CHLORIDE FUJI PHOTO FILM CO., LTD. (JP) 1990-12-11 US disclosed
EP-0343642-A2 Silver halide photographic material FUJI PHOTO FILM CO., LTD. (JP) 1989-11-29 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070049768-A1 COMPOSITION OF VINYL ETHER GROUP CONTAINING (METH) ACRYLIC ACID ESTER AND PRODUCTION METHOD THEREOF MMAB, ME1, PRMT1 TSHR 2551/4885ALDH1A1 79/4885TP53 2765/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.