SCHEMBL3667065

SCHEMBL3667065

Cc1nc(CO)c(CO)[nH]1

nearest known ligand 0.39

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.39
ALDH1A1 P00352 1/20 0.39
CSNK2A1 P68400 1/20 0.31
CDK4 P11802 1/20 0.31
CCND1 P24385 1/20 0.31
ADORA3 P0DMS8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26937741 0.86 SMPD3 (0.36) KDM4EALDH1A1CDK4CCND1ADORA3
SCHEMBL11268737 0.86 KDM4E (0.36) KDM4EALDH1A1ADORA3
SCHEMBL5674014 0.78
SCHEMBL5267992 0.78
Hydrochloric Acid SCHEMBL11307967 0.76 ALDH1A1 (0.34) KDM4EALDH1A1CSNK2A1CDK4CCND1
Hydrochloric Acid SCHEMBL11466216 0.76 ALDH1A1 (0.39) ALDH1A1ADORA3
SCHEMBL3028139 0.74
SCHEMBL7558596 0.73 KDM4E (0.38) KDM4EALDH1A1
SCHEMBL14289963 0.73 CSNK2A1 (0.33) KDM4EALDH1A1CSNK2A1CDK4CCND1
SCHEMBL4353447 0.73 ADORA1 (0.39) KDM4EALDH1A1ADORA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-5239187-A None JP disclosed
JP-7224042-A None JP disclosed
US-7714080-B2 comprising alkoxysilyl-containing polyamide-imide resin, epoxy resin, curing promoter, and organic solvent; forms cured coating having heat resistance and water resistance through brief low-temperature heating and helps bonding of epoxy resin molding compound to semiconductor SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-05-11 US disclosed
US-7614145-B2 Method for manufacturing multilayer circuit board and resin base material ZEON CORPORATION (JP) 2009-11-10 US disclosed
US-20080217617-A1 Thin Film Transistor, Wiring Board and Methods of Manufacturing the Same ZEON CORPORATION (JP) 2008-09-11 US disclosed
US-20060199923-A1 comprising alkoxysilyl-containing polyamide-imide resin, epoxy resin, curing promoter, and organic solvent; forms cured coating having heat resistance and water resistance through brief low-temperature heating and helps bonding of epoxy resin molding compound to semiconductor SHIN-ETSU CHEMICAL CO., LTD. 2006-09-07 US disclosed
US-20050153059-A1 Partial plating method, partially-plated resin base, method for manufacturing multilayered circuit board ZEON CORPORATION (JP) 2005-07-14 US disclosed
US-20040237295-A1 Multilayer circuit board and resin base material, and its production method ZEON CORPORATION (JP) 2004-12-02 US disclosed
US-6007966-A POLYMERIC BINDER CONTAINING STYRENE-MALEIC ANHYDRIDE COPOLYMER, UNSATURATED COMPOUND CONTAINING AT LEAST ONE HYDROXYL GROUP AND AT LEAST THREE ACRYLIC GROUPS AND A SATURATED ALCOHOL INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 1999-12-28 US disclosed
EP-0590420-B1 Impact-resistant polyoxymethylene molding compositions BASF AG (DE) 1997-01-29 EP disclosed
US-5310822-A Chemical resistance BASF AKTIENGESELLSCHAFT (DE) 1994-05-10 US disclosed
EP-0590420-A1 Impact-resistant polyoxymethylene molding compositions BASF Aktiengesellschaft (DE) 1994-04-06 EP disclosed
JP-H05239187-A METHOD FOR CURING EPOXY RESIN SHIKOKU CHEM CORP 1993-09-17 JP disclosed
US-5173543-A Polyurethanes, polyesterethers, polyamideethers from polycarbonateether diols BASF AKTIENGESELLSCHAFT (DE) 1992-12-22 US disclosed
EP-0442359-A2 Thermoplastic polyurethanes BASF Aktiengesellschaft (DE) 1991-08-21 EP disclosed
EP-0313724-A2 Bis (acyloxymethyl) imidazole Derivative THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 1989-05-03 EP disclosed
US-4658035-A REACTING 2-ALKYLIMIDAZOLE WITH FORMALDEHYDE BASF AKTIENGESELLSCHAFT (DE) 1987-04-14 US disclosed
EP-0073008-B1 CATIONIC DYESTUFFS BASF Aktiengesellschaft (DE) 1984-11-07 EP disclosed
US-4472581-A Imidazomethylene dyes BASF AKTIENGESELLSCHAFT (DE) 1984-09-18 US disclosed
EP-0073008-A2 Cationic dyestuffs BASF Aktiengesellschaft (DE) 1983-03-02 EP disclosed