SCHEMBL3667293

SCHEMBL3667293

Cc1c(CN)cc(Cl)cc1CN

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PNMT P11086 3/20 0.37
CYP2A6 P11509 1/20 0.35
TSHR P16473 1/20 0.35
SCN4A P35499 2/20 0.34
CYP3A4 P08684 3/20 0.33
TP53 P04637 1/20 0.33
DPP4 P27487 1/20 0.32
KRAS P01116 1/20 0.32
GABRA1 P14867 1/20 0.31
GABRB2 P47870 1/20 0.31
IDO1 P14902 2/20 0.31
CYP2C9 P11712 2/20 0.31
CYP1A2 P05177 1/20 0.31
NOTUM Q6P988 1/20 0.31
HIF1A Q16665 2/20 0.30
CYP2C19 P33261 1/20 0.30
TAAR1 Q96RJ0 1/20 0.30
MEN1 O00255 1/20 0.30
SLC22A1 O15245 1/20 0.30
USP2 O75604 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL63046 0.76 LOXL2 (0.33) PNMT
SCHEMBL11436471 0.76 ALDH1A1 (0.43) TSHRCYP1A2HIF1AMEN1ALOX15
SCHEMBL21586425 0.76 ALDH1A1 (0.37) TSHRCYP3A4IDO1CYP2C9HIF1A
SCHEMBL23201145 0.75 CYP2C9 (0.39) TSHRSCN4ACYP3A4GABRA1IDO1
SCHEMBL10039690 0.75 SCN4A (0.37) PNMTCYP2A6SCN4ACYP3A4
SCHEMBL3673507 0.74 CYP2A6 (0.35) CYP2A6IDO1CYP1A2HIF1AALOX15
SCHEMBL3676581 0.74 MPO (0.35) IDO1TAAR1
Hydrochloric Acid SCHEMBL30387703 0.73 CYP2C9 (0.38) TSHRSCN4ACYP3A4GABRA1IDO1
SCHEMBL1640771 0.73 CYP3A4 (0.52) PNMTCYP2A6CYP3A4IDO1HIF1A
SCHEMBL1764819 0.72 ALDH1A1 (0.52) PNMTCYP2A6TSHRCYP3A4DPP4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1426392-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2010-02-24 EP disclosed
US-6960640-B2 Composition for optical material MITSUBISHI GAS CHEMICAL CO., LTD. (JP) 2005-11-01 US disclosed
US-20040147708-A1 Composition for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-07-29 US disclosed
EP-1426392-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-06-09 EP disclosed