SCHEMBL3671037

SCHEMBL3671037

COc1cccc(C2=CC(=O)NC2=O)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.50
CHEK1 O14757 1/20 0.49
NCOA1 Q15788 1/20 0.48
NCOA3 Q9Y6Q9 1/20 0.48
BRD4 O60885 1/20 0.48
HDAC4 P56524 1/20 0.47
HDAC8 Q9BY41 1/20 0.47
PGR P06401 2/20 0.47
ALDH1A1 P00352 2/20 0.46
NOTUM Q6P988 1/20 0.46
LMNA P02545 1/20 0.46
GSK3B P49841 5/20 0.44
STK10 O94804 3/20 0.44
SLK Q9H2G2 3/20 0.44
DYRK1A Q13627 1/20 0.44
CLK4 Q9HAZ1 1/20 0.44
SERPINE1 P05121 1/20 0.43
KDM4E B2RXH2 1/20 0.43
GLA P06280 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL27959157 0.98 GAA (0.49) GAACHEK1NCOA1NCOA3BRD4
SCHEMBL14677439 0.85 MAOA (0.39) GAACHEK1ALDH1A1LMNA
SCHEMBL11335125 0.83 ALDH1A1 (0.41) GAAALDH1A1KDM4E
SCHEMBL9852640 0.83 CYP1A1 (0.38) GAACHEK1NCOA1NCOA3ALDH1A1
SCHEMBL167921 0.82 PTP4A3 (0.33) GSK3BPRKCA
SCHEMBL30932199 0.81 MAOA (0.34) CHEK1HDAC4HDAC8NOTUMPRKCA
SCHEMBL3676452 0.80 BACE1 (0.58) LMNAGSK3BKDM4E
SCHEMBL3748315 0.78 FYN (0.43) PGRALDH1A1NOTUMCLK4KDM4E
Ammonia Solution, Strong SCHEMBL27959172 0.78 BACE1 (0.56) LMNAGSK3BKDM4E
Ammonia Solution, Strong SCHEMBL27993535 0.77 FYN (0.42) PGRALDH1A1NOTUMCLK4KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110724154-A Polysubstituted pyrrolo [3,4-d ] isoxazole derivative and synthetic method thereof 湖北科技学院 2020-01-24 CN claimed
US-7825188-B2 Thermoplastic elastomer with acyloxyphenyl hard block segment DESIGNER MOLECULES, INC. (US) 2010-11-02 US claimed
WO-2008077141-A1 RUBBER EPOXY CURATIVES AND METHODS FOR USE THEREOF DESIGNER MOLECULES, INC. (US) 2008-06-26 WO claimed
US-20080146738-A1 RUBBER EPOXY CURATIVES AND METHODS FOR USE THEREOF DESIGNER MOLECULES, INC. 2008-06-19 US claimed
JP-2007501270-A 2007-01-25 JP claimed
EP-1633401-A1 A PHARMACEUTICAL COMPOSITION COMPRISING A P2X7-RECEPTOR ANTAGONIST AND A TUMOUR NECROSIS FACTOR ALPHA AstraZeneca AB (SE) 2006-03-15 EP claimed
WO-2004105798-A1 A PHARMACEUTICAL COMPOSITION COMPRISING A P2X7-RECEPTOR ANTAGONIST AND A TUMOUR NECROSIS FACTOR α ASTRAZENECA AB (SE) 2004-12-09 WO claimed
CN-119902413-A Photosensitive coloring resin composition, color filter, manufacturing method thereof and liquid crystal display device 奇美实业股份有限公司 2025-04-29 CN disclosed
CN-119126285-A Method for manufacturing color filter, and liquid crystal display device 奇美实业股份有限公司 2024-12-13 CN disclosed
CN-119126423-A Method for manufacturing color filter, and liquid crystal display device 奇美实业股份有限公司 2024-12-13 CN disclosed
CN-110724154-B Polysubstituted pyrrolo [3,4-d ] isoxazole derivative and synthetic method thereof 湖北科技学院 2020-08-04 CN disclosed
CN-110724154-A Polysubstituted pyrrolo [3,4-d ] isoxazole derivative and synthetic method thereof 湖北科技学院 2020-01-24 CN disclosed
CN-106483766-B Photosensitive polymer combination and the photocuring pattern formed by it 东友精细化工有限公司 2019-10-25 CN disclosed
US-20070155869-A1 Mono-functional monomers and methods for use thereof DESIGNER MOLECULES, INC. 2007-07-05 US disclosed
US-4529736-A Antidepressant AMERICAN CYANAMID COMPANY (US) 1985-07-16 US disclosed
EP-0100426-A1 3a-(substituted-phenyl)-hexaloctahydro-4,7-alkanoisoindoles AMERICAN CYANAMID COMPANY (US) 1984-02-15 EP disclosed
US-4431661-A 5-Aryl-3-azabicyclo[3.2.0]heptan-6-one acetals, and analgesic use therefor AMERICAN CYANAMID COMPANY (US) 1984-02-14 US disclosed
EP-0001997-B1 ELECTRON BEAM-CURABLE PHOTORESIST LACQUERS BAYER AG (DE) 1981-02-11 EP disclosed
EP-0001997-A1 Electron beam-curable photoresist lacquers BAYER AG (DE) 1979-05-30 EP disclosed
US-4042707-A ANALGESICS, NARCOTIC ANTAGONISTS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-08-16 US disclosed