Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 1/20 | 0.54 |
| ▸ | CA1 | P00915 | 1/20 | 0.54 |
| ▸ | CA2 | P00918 | 1/20 | 0.54 |
| ▸ | CA6 | P23280 | 1/20 | 0.54 |
| ▸ | CA9 | Q16790 | 1/20 | 0.54 |
| ▸ | FOLH1 | Q04609 | 1/20 | 0.52 |
| ▸ | KMO | O15229 | 1/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.50 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.49 |
| ▸ | UNG | P13051 | 1/20 | 0.48 |
| ▸ | DAO | P14920 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.48 |
| ▸ | APEX1 | P27695 | 1/20 | 0.47 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.47 |
| ▸ | ATM | Q13315 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Isophthalic Acid SCHEMBL4651781 | 0.98 | CA12 (0.56) | CA12CA1CA2CA6CA9 | |
| Terephthalic Acid SCHEMBL6898217 | 0.96 | TSHR (0.50) | CA12CA1CA2CA6CA9 | |
| Terephthalic Acid SCHEMBL5631843 | 0.94 | TSHR (0.52) | CA12CA1CA2CA6CA9 | |
| Isophthalic Acid SCHEMBL29100400 | 0.91 | GPR84 (0.57) | CA12CA1CA2CA6CA9 | |
| Isophthalic Acid SCHEMBL2380785 | 0.91 | GPR84 (0.57) | CA12CA1CA2CA6CA9 | |
| Azelaic Acid SCHEMBL11389879 | 0.91 | GPR84 (0.57) | CA12CA1CA2CA6CA9 | |
| Isophthalic Acid SCHEMBL27325481 | 0.91 | PLA2G4B (0.54) | TSHR | |
| Isophthalic Acid SCHEMBL28550985 | 0.89 | CYP2C19 (0.49) | CA12CA1CA2CA6CA9 | |
| Isophthalic Acid SCHEMBL3867184 | 0.89 | CA12 (0.60) | CA12CA1CA2CA6CA9 | |
| Isophthalic Acid SCHEMBL28864205 | 0.88 | GPR84 (0.54) | CA12CA1CA2CA6CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1971427-A1 | VISIBLE LIGHT CURING SYSTEMS, METHODS FOR REDUCING HEALTH RISKS TO INDIVIDUALS EXPOSED TO SYSTEMS DESIGNED TO CURE CURABLE COMPOSITIONS BY EXPOSURE TO RADIATION, METHODS FOR BONDING SUBSTRATES AND VISIBLE LIGHT CURING COMPOSITIONS | Henkel Corporation (US) | 2008-09-24 | — | — | EP | claimed |
| WO-2007078851-A1 | VISIBLE LIGHT CURING SYSTEMS, METHODS FOR REDUCING HEALTH RISKS TO INDIVIDUALS EXPOSED TO SYSTEMS DESIGNED TO CURE CURABLE COMPOSITIONS BY EXPOSURE TO RADIATION, METHODS FOR BONDING SUBSTRATES AND VISIBLE LIGHT CURING COMPOSITIONS | HENKEL CORPORATION (US) | 2007-07-12 | — | — | WO | claimed |
| EP-0884960-B1 | INFLATED CLOSED CONTAINERS MADE OF POLYESTERURETHANE BASED MEMBRANES AND THEIR MANUFACTURING METHOD | NIKE INTERNATIONAL LTD (US) | 2004-08-18 | — | — | EP | claimed |
| CN-114131923-B | Method for producing polyurethane three-dimensional objects from materials having multiple hardening mechanisms | 卡本有限公司 | 2024-05-24 | — | — | CN | disclosed |
| CN-115195104-B | Dual precursor resin system for additive manufacturing with dual cure resins | 卡本有限公司 | 2023-12-05 | — | — | CN | disclosed |
| CN-112041360-B | Photocurable resin composition and adhesive using same | ＵＢＥ株式会社 | 2023-08-04 | — | — | CN | disclosed |
| CN-109791381-B | Electrophotographic photoreceptor, and electrophotographic process cartridge and image forming apparatus containing the same | 三菱化学株式会社 | 2023-03-10 | — | — | CN | disclosed |
| EP-3418444-B1 | ACID DYEING OF POLYURETHANE MATERIALS | NIKE INNOVATE CV (US) | 2022-08-17 | — | — | EP | disclosed |
| CN-107531863-B | Method for producing a multi-layer paint system | 巴斯夫涂料有限公司 | 2022-02-08 | — | — | CN | disclosed |
| CN-110023348-B | Method for producing an object from a precursor and use of a radically crosslinkable resin in an additive manufacturing process | 科思创德国股份有限公司 | 2021-12-28 | — | — | CN | disclosed |
| CN-107548322-B | Method for producing a multi-layer paint system on a plastic substrate | 巴斯夫涂料有限公司 | 2021-09-17 | — | — | CN | disclosed |
| EP-1971427-A1 | VISIBLE LIGHT CURING SYSTEMS, METHODS FOR REDUCING HEALTH RISKS TO INDIVIDUALS EXPOSED TO SYSTEMS DESIGNED TO CURE CURABLE COMPOSITIONS BY EXPOSURE TO RADIATION, METHODS FOR BONDING SUBSTRATES AND VISIBLE LIGHT CURING COMPOSITIONS | Henkel Corporation (US) | 2008-09-24 | — | — | EP | disclosed |
| WO-2007078851-A1 | VISIBLE LIGHT CURING SYSTEMS, METHODS FOR REDUCING HEALTH RISKS TO INDIVIDUALS EXPOSED TO SYSTEMS DESIGNED TO CURE CURABLE COMPOSITIONS BY EXPOSURE TO RADIATION, METHODS FOR BONDING SUBSTRATES AND VISIBLE LIGHT CURING COMPOSITIONS | HENKEL CORPORATION (US) | 2007-07-12 | — | — | WO | disclosed |
| EP-1687384-A2 | COATINGS WITH IMPROVED CHIP RESISTANCE AND METHODS OF MAKING THE SAME | PPG Industries Ohio, Inc. (US) | 2006-08-09 | — | — | EP | disclosed |
| US-20050123684-A1 | Coatings with improved chip resistance and methods of making the same | PPG INDUSTRIES OHIO, INC. | 2005-06-09 | — | — | US | disclosed |
| WO-2005052077-A2 | COATINGS WITH IMPROVED CHIP RESISTANCE AND METHODS OF MAKING THE SAME | PPG INDUSTRIES OHIO, INC. (US) | 2005-06-09 | — | — | WO | disclosed |
| CN-1169885-C | Water-based metal surface treatment composition forming lubricating film with excellent maring resistance | 日本巴卡莱近估股份有限公司 | 2004-10-06 | — | — | CN | disclosed |
| CN-1329645-A | Water-based metal surface treatment composition forming lubricating film with excellent maring resistance | NIHON PARKERIZING (JP) | 2002-01-02 | — | — | CN | disclosed |
| US-6004669-A | ELECTROSTATIC CHARGING MEMBER, UNIFORMLY DISPERSED IN A MODIFIED RESIN AS A BASE POLYMER BEING MODIFIED BY AN AMINE GROUP WHICH HAS AN ACID-BASE INTERACTION WITH THE OXIDATION-PROCESSED ELECTRICALLY-CONDUCTING AGENT, | FUJI XEROX CO., LTD. (JP) | 1999-12-21 | — | — | US | disclosed |
| US-5571861-A | FOR USE IN BASE COATINGS, AQUEOUS COATINGS, ADHESIVES AND PRINTING INKS | HOECHST AKTIENGESELLSCHAFT (DE) | 1996-11-05 | — | — | US | disclosed |