SCHEMBL3673939

SCHEMBL3673939

O=S(=O)(O)C(F)(Cl)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CA2 P00918 3/20 0.41
CA1 P00915 2/20 0.41
MMP1 P03956 2/20 0.41
MMP2 P08253 2/20 0.41
MMP9 P14780 2/20 0.41
MMP8 P22894 2/20 0.41
MMP13 P45452 2/20 0.41
F2 P00734 3/20 0.38
PRSS1 P07477 3/20 0.38
PRSS2 P07478 3/20 0.38
PRSS3 P35030 3/20 0.38
THRB P10828 1/20 0.37
ALDH1A1 P00352 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3681571 0.97 CA2 (0.39) CA2CA1MMP1MMP2MMP9
SCHEMBL25422254 0.79 CA2 (0.34) CA2CA1MMP1MMP2MMP9
Trifluoromethanesulfonic Acid SCHEMBL6067738 0.78 CA2 (0.48) CA2CA1MMP1MMP2MMP9
SCHEMBL4376440 0.78 ALDH1A1 (0.39) CA2CA1ALDH1A1L3MBTL1
Sulfuric Acid SCHEMBL2819379 0.78 CA2 (0.52) CA2CA1MMP1MMP2MMP9
Sulfuric Acid SCHEMBL19348238 0.78 CA2 (0.52) CA2CA1MMP1MMP2MMP9
Sulfuric Acid SCHEMBL1303190 0.75 CA2 (0.50) CA2CA1MMP1MMP2MMP9
SCHEMBL11563004 0.75 TSHR (0.53) CA2CA1MMP1MMP2MMP9
Sulfuric Acid SCHEMBL19690369 0.75 CA2 (0.50) CA2CA1MMP1MMP2MMP9
SCHEMBL27502448 0.75 CA2 (0.50) CA2CA1MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7700800-B2 Method for producing fluorine-containing alkyl (meth)acrylate TOKUYAMA CORPORATION (JP) 2010-04-20 US disclosed
US-20090023948-A1 Method for Producing Fluorine-Containing Alkyl (Meth)Acrylate TOKUYAMA CORPORATION (JP) 2009-01-22 US disclosed